Round Copper Backing Target 99.999%, 1×50.8 mm ATOMFAIR®

$65.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

Research-grade 99.999% round copper backing target, 1 mm × 50.8 mm, Ra≤1.6 μm typical, with COA for sputtering target support. Order now.

SKU: AF-MT-B-BACK-N50X-48HQ
Category:
Brands:

Copper Backing Target
Product Type: Round copper backing target
Research-grade laboratory product
Product Overview

Copper Backing Target is a round copper backing target with 99.999% purity, 8.96 g/cm^3 density and 1.68 micro-ohm cm electrical resistivity for thermal conduction and mechanical support for sputtering targets.

Available configurations cover thicknesses of 1 mm and diameters of 50.8 mm. The listed surface condition, dimensional tolerance and bonding options support configuration review before quotation.

Performance Features
  • 99.999% purity copper backing target for controlled sputtering workflows.
  • Round copper backing target geometry with the listed thickness and diameter options.
  • Surface preparation: Turning / grinding,Ra<=1.6 um (typical).
  • Typical use areas include thermal conduction and mechanical support for sputtering targets.
Technical Specifications
Parameter Specification / Available Values
Atomfair Model AF-CU-BACK
Purity 99.999%
Material Grade Cu backing target grade confirmed by batch COA
Typical Total Critical Impurities Typical total critical impurities: confirmed by batch COA
Density 8.96 g/cm^3
Electrical Resistivity 1.68 micro-ohm cm
Surface State Turning / grinding,Ra<=1.6 um (typical)
Dimensional Tolerance Diameter+/-0.10 mm; thickness+/-0.10 mm (typical)
Target Type Round copper backing target
Bonding Cubacking plate/magnetic shimstructure
Typical Applications thermal conduction and mechanical support for sputtering targets
Packaging / Notes Vacuum packed with COA; final parameters are confirmed by batch inspection and the agreed configuration.
Available Thicknesses 1 mm
Available Diameters 50.8 mm
PROCUREMENT CHECK: Confirm model, working range, compatibility, consumables and required configuration before quotation.
DOCUMENTATION REVIEW: Product specifications and configuration details are reviewed against laboratory use requirements.
ACCESSORY MATCHING: Compatible accessories, replacement parts and consumables can be matched according to the selected configuration.
INQUIRY NOTE: Include the required model, configuration and quantity when requesting quotation support.
LABORATORY PROCUREMENT SUPPORT
For model selection, accessory matching, platform compatibility or configuration confirmation, contact our technical sales team.
INQUIRY: inquiry@atomfair.com
Manufacturer: Atomfair LLC
Brand: ATOMFAIR®

This copper backing target is supplied with a machined surface finish and specified dimensional tolerances. Its use requires protecting the bond interface and confirming compatibility with the intended sputtering target assembly.

  • Surface Protection: Handle the backing plate by its edges and keep the machined surface protected from scratches, abrasion, or contamination.
  • Dimensional Verification: Verify the backing plate dimensions against the target assembly before bonding to prevent mechanical mismatch.
  • Packaging and Storage: Maintain the vacuum-sealed packaging until installation to limit surface oxidation and contamination.
  • Bonding Confirmation: Confirm the specified bonding method before mounting the backing plate with the sputtering target.

What is the significance of the 1.68 micro-ohm cm electrical resistivity in a copper backing target for sputtering applications?

The 1.68 micro-ohm cm electrical resistivity ensures efficient thermal conduction and minimal electrical resistance, which is critical for heat dissipation and stable sputtering conditions. This specification is confirmed by batch COA and is directly tied to the product's role in thermal conduction and mechanical support for sputtering targets.

How does the surface roughness (Ra<=1.6 um) of the copper backing target impact bonding with the sputtering target material?

The specified surface finish, achieved by turning/grinding with Ra<=1.6 um, provides an optimal bonding surface for structures such as the Cu backing plate/magnetic shim. This ensures good thermal and mechanical contact, which is essential for reliable sputtering target support and heat transfer.

What storage conditions are recommended for a 99.999% purity copper backing target to maintain its performance?

The product is shipped vacuum packed with a Certificate of Analysis (COA) to prevent oxidation and contamination. Final parameters are confirmed by batch inspection, and storage in a dry, inert environment is implied by the vacuum packaging to preserve the 99.999% purity and Ra<=1.6 um surface condition.

This 99.999% purity round copper backing target, offered in a 1 mm thickness and 50.8 mm diameter, is specified for thermal conduction and mechanical support of sputtering targets. Its 8.96 g/cm³ density, 1.68 micro-ohm cm electrical resistivity, typical Ra ≤ 1.6 μm surface finish, and ±0.10 mm dimensional tolerances are relevant for controlled sputtering workflows, though batch parameters and bonding configuration must be confirmed before quotation.

Positive

  • High-purity 99.999% copper: The 99.999% purity copper backing target is specified for controlled sputtering workflows, with typical total critical impurities confirmed by batch COA.
  • Thermal and mechanical sputter support: With 8.96 g/cm³ density and 1.68 micro-ohm cm electrical resistivity, the round copper backing target is designed for thermal conduction and mechanical support of sputtering targets.

Trade-offs

  • Limited standard thickness and diameter: The listed available configuration is restricted to 1 mm thickness and 50.8 mm diameter, so other dimensional requirements must be reviewed and agreed before quotation.
  • Pre-quotation compatibility verification required: Model, working range, sputtering system compatibility, consumables, and required configuration must be confirmed before quotation because final parameters are batch-confirmed and configuration-dependent.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).

Thickness

1 mm

Diameter

50.8 mm