Chromium Sputtering Target 99.99% Cr 3N5 ATOMFAIR®

Price range: $100.00 through $225.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

Cr 3N5 chromium round planar sputtering target, 99.99% purity, 3-6.35 mm thick and 25.4-101.6 mm diameter, Ra≤1.6 μm. Order now.

SKU: AF-MT-S-CHRO-N40X-0FUB
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High Purity Chromium Sputtering Target, 99.99%
Product Type: Round planar sputtering target
Research-grade laboratory product
Product Overview

High Purity Chromium Sputtering Target, 99.99% is a round planar sputtering target with 99.99% purity, 7.19 g/cm^3 density and 12.9 micro-ohm cm electrical resistivity for decorative coatings, wear-resistant films, barrier layers, magnetron sputtering.

Available configurations cover thicknesses of 3 mm, 4 mm, 5 mm, 6 mm, 6.35 mm and diameters of 25.4 mm, 50 mm, 50.8 mm, 60 mm, 76.2 mm, 80.0 mm, 101.6 mm, 100 mm. The listed surface condition, dimensional tolerance and bonding options support configuration review before quotation.

Performance Features
  • 99.99% purity material grade for controlled sputtering workflows.
  • Round planar sputtering target geometry with the listed thickness and diameter options.
  • Surface preparation: Turning / grinding,Ra<=1.6 um (typical).
  • Typical use areas include decorative coatings, wear-resistant films, barrier layers, magnetron sputtering.
Technical Specifications
Parameter Specification / Available Values
Atomfair Model AF-CR-99N99
Purity 99.99%
Material Grade Cr 3N5
Typical Total Critical Impurities Typical total critical impurities: <=100 ppm
Density 7.19 g/cm^3
Electrical Resistivity 12.9 micro-ohm cm
Surface State Turning / grinding,Ra<=1.6 um (typical)
Dimensional Tolerance Diameter+/-0.10 mm; thickness+/-0.10 mm (typical)
Target Type Round planar sputtering target
Bonding Unbonded; optionalCubacking plate bonding
Typical Applications decorative coatings, wear-resistant films, barrier layers, magnetron sputtering
Packaging / Notes Vacuum packed with COA; final parameters are confirmed by batch inspection and the agreed configuration.
Available Thicknesses 3 mm, 4 mm, 5 mm, 6 mm, 6.35 mm
Available Diameters 25.4 mm, 50 mm, 50.8 mm, 60 mm, 76.2 mm, 80.0 mm, 101.6 mm, 100 mm
PROCUREMENT CHECK: Confirm model, working range, compatibility, consumables and required configuration before quotation.
DOCUMENTATION REVIEW: Product specifications and configuration details are reviewed against laboratory use requirements.
ACCESSORY MATCHING: Compatible accessories, replacement parts and consumables can be matched according to the selected configuration.
INQUIRY NOTE: Include the required model, configuration and quantity when requesting quotation support.
LABORATORY PROCUREMENT SUPPORT
For model selection, accessory matching, platform compatibility or configuration confirmation, contact our technical sales team.
INQUIRY: inquiry@atomfair.com
Manufacturer: Atomfair LLC
Brand: ATOMFAIR®

This sputtering target requires bonding to a backing plate and vacuum packaging to maintain surface integrity. Dimensional tolerances of ±0.10 mm and surface roughness below 1.6 µm must be respected for proper fit and sputtering performance.

  • Bonding Requirement: The target is supplied unbonded and must be bonded to a compatible backing plate before use in a sputtering system.
  • Surface Condition Preservation: Vacuum packaging preserves the as-machined surface; handle with clean gloves and avoid exposure to airborne contaminants.
  • Dimensional Tolerances: The diameter and thickness tolerances of ±0.10 mm ensure compatibility with standard sputtering gun receptacles.
  • Packaging and Storage: Store in the original vacuum packaging until ready for use to prevent oxidation and maintain purity.

What purity, density, and electrical resistivity are specified for the Atomfair 99.99% chromium sputtering target?

The target is specified at 99.99% purity (Cr 3N5 grade) with typical total critical impurities of <=100 ppm, a density of 7.19 g/cm3, and an electrical resistivity of 12.9 micro-ohm cm. These are the controlled material parameters cited for magnetron sputtering and related thin-film applications, with final parameters confirmed by batch inspection and reported on the COA.

Is this chromium target supplied bonded or unbonded, and what must be confirmed for sputtering system compatibility?

The target is supplied unbonded as standard, with optional Cu backing plate bonding available. Because bonding configuration affects compatibility with sputtering equipment, the model, working range, consumables, and required configuration must be confirmed before quotation; include the required model, configuration, and quantity in your inquiry.

What surface finish and dimensional tolerances should be verified before installing this chromium target?

The target surface is turned or ground with Ra <= 1.6 um (typical), and dimensional tolerance is diameter +/-0.10 mm and thickness +/-0.10 mm (typical). Final parameters are confirmed by batch inspection against the agreed configuration, and the target is vacuum packed with a COA.

High purity chromium sputtering target (99.99%, 7.19 g/cm³ density, 12.9 µΩ·cm resistivity) offering controlled impurity levels ≤100 ppm for decorative coatings, wear-resistant films, and barrier layers. Available in unbonded round planar geometry with multiple thickness and diameter options, but requires configuration review for bonding and dimensional tolerance.

Positive

  • High purity with controlled impurities: 99.99% purity grade with typical total critical impurities ≤100 ppm ensures reproducible film properties and reduced contamination in sensitive sputtering processes.
  • Multiple diameter and thickness options: Available in 8 diameters (25.4–101.6 mm) and 5 thicknesses (3–6.35 mm) enables direct integration into diverse magnetron sputtering systems without custom machining.

Trade-offs

  • Unbonded as standard configuration: Target is supplied unbonded; optional backing plate bonding must be specified separately, adding a procurement step and potential thermal interface considerations for high-power sputtering.
  • Surface roughness may limit ultra-smooth films: Typical turned/ground surface finish Ra ≤1.6 µm may require additional polishing for applications demanding sub-micrometer film smoothness or critical optical coatings.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).

Thickness

3 mm, 4 mm, 5 mm, 6 mm, 6.35 mm

Diameter

25.4 mm, 50 mm, 50.8 mm, 60 mm, 76.2 mm, 80.0 mm, 101.6 mm, 100 mm