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High Purity Chromium Sputtering Target, 99.95%
Product Type: Round planar sputtering target
Research-grade laboratory product
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LABORATORY PROCUREMENT SUPPORT
For model selection, accessory matching, platform compatibility or configuration confirmation, contact our technical sales team.
INQUIRY: inquiry@atomfair.com
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Manufacturer: Atomfair LLC
Brand: ATOMFAIR®
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Technical constraints for the Atomfair chromium sputtering target before and during laboratory use. These constraints define configuration, surface condition, bonding, and packaging requirements.
- Configuration Confirmation: Before quotation, confirm model, working range, compatibility, consumables, and required configuration against the intended use.
- Surface Condition: The specified surface state is turning or grinding with typical Ra <=1.6 um, and this condition should be preserved.
- Dimensional Tolerance: Diameter and thickness tolerances are +/-0.10 mm typical, so final dimensions must be confirmed with the agreed configuration.
- Bonding Interface: The target is supplied unbonded, with optional Cu backing plate bonding available, and installation must match the selected configuration.
- Vacuum Packaging and Documentation: The target is vacuum packed with a COA, and final parameters are confirmed by batch inspection and the agreed configuration.
Procedure to confirm and receive the Atomfair chromium sputtering target before installation. The steps cover configuration review, quotation, and receipt verification.
Required Equipment: Agreed configuration documentation, Certificate of Analysis (COA), Batch inspection report
- Confirm configuration requirements
Confirm the required model, working range, compatibility, consumables, and required configuration before requesting quotation support. - Review specifications against laboratory use
Review the product specifications and configuration details against the laboratory use requirements. - Match compatible accessories
Match compatible accessories, replacement parts, and consumables to the selected configuration. - Submit inquiry details
Include the required model, configuration, and quantity when requesting quotation support. - Inspect packaging and documentation
Inspect the received vacuum packaging and Certificate of Analysis against the agreed configuration. - Verify batch parameters
Verify the target model and measured final parameters from batch inspection match the agreed configuration. - Maintain vacuum condition
Keep the target in its vacuum packaging until installation to preserve the specified surface condition.
What does the 99.95% purity and <=500 ppm total critical impurities specification mean for chromium sputtering target performance?
The target is a Cr 3N5 grade material with 99.95% purity and typical total critical impurities <=500 ppm, which supports controlled sputtering workflows for decorative coatings, wear-resistant films, and barrier layers. Its density is 7.19 g/cm3 and electrical resistivity is 12.9 micro-ohm cm, parameters relevant to sputter rate and film uniformity.
Which diameter and thickness configurations are available for this round planar Cr target, and what dimensional tolerances apply?
This round planar target is offered in diameters of 25.4 mm, 50 mm, 50.8 mm, 60 mm, 76.2 mm, 80.0 mm, 101.6 mm, and 100 mm, with thicknesses of 3 mm, 4 mm, 5 mm, 6 mm, or 6.35 mm. Typical dimensional tolerance is diameter +/-0.10 mm and thickness +/-0.10 mm; targets ship unbonded, with optional Cu backing plate bonding available.
How are Atomfair chromium sputtering targets packaged and what must be confirmed before procurement?
Targets are vacuum packed with a certificate of analysis (COA), and final parameters are confirmed by batch inspection and the agreed configuration. Buyers should confirm model, working range, compatibility, consumables, and required configuration before quotation, and include the required model, configuration, and quantity when requesting quotation support.
The 99.95% chromium round planar sputtering target provides a low-resistivity, controlled-purity sputtering surface with broad diameter and thickness configurability, but delivery is unbonded unless Cu backing plate bonding is specified, requiring the user to manage mount/bond decisions for the target source.
Positive
- Controlled 99.95% purity grade: The Cr 3N5 grade with typical total critical impurities <=500 ppm provides a controlled impurity baseline for decorative, wear-resistant, and barrier-layer sputtering workflows.
- Broad round-target size range: Thickness options from 3 mm to 6.35 mm and diameters from 25.4 mm to 101.6 mm allow the same material platform to be fitted to different magnetron sources and coating geometries.
Trade-offs
- Unbonded delivery requires mounting plan: The target is supplied unbonded with Cu backing plate bonding available only as an option, so the user must confirm thermal and electrical contact requirements for the specific sputter source before deployment.
- Typical finish and tolerance limits: Surface roughness Ra<=1.6 um and dimensional tolerance of +/-0.10 mm are listed as typical values; final parameters are confirmed by batch inspection and the agreed configuration, so reproducibility depends on documented batch measurements.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
