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Nickel-Titanium Alloy Sputtering Target (NiTi)
Product Type: Metal alloy sputtering target
Research-grade laboratory product
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LABORATORY PROCUREMENT SUPPORT
INQUIRY: inquiry@atomfair.com
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Manufacturer: Atomfair LLC
Brand: ATOMFAIR®
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This NiTi sputtering target is intended for vacuum deposition use only and must be operated within a compatible DC/RF magnetron sputtering system. Confirm all target specifications, bonding, and backing plate options against the deposition system before ordering or mounting.
- Processing Environment: Use the target exclusively in vacuum coating workflows employing DC or RF magnetron sputtering.
- Deposition System Compatibility: Verify that the selected bonding type and backing plate configuration match the requirements of the deposition system before use.
- Procurement Verification: Confirm target purity, dimensions, composition ratio, and bonding requirements against the deposition system before ordering.
- Substrate Preparation: Prepare substrates properly before deposition to achieve the stated film adhesion strength.
Confirm target compatibility with the intended vacuum deposition process before ordering or mounting. Verify all target specifications and configuration options against the deposition system.
Required Equipment: Magnetron sputtering system
- Confirm Target Specifications
Confirm the selected target composition, dimensions, substrate system, and quantity match the intended coating process. - Verify Bonding and Backing Plate
Verify that the target bonding type and backing plate configuration are compatible with the deposition system before ordering. - Request Quotation
Include the model number, target dimensions, purity grade, and required quantity when submitting a quotation request.
What is the impact of the 99.5% purity (2N5) on the electrical resistivity of NiTi sputtered films?
The 99.5% purity with total metallic impurities <5000 ppm and O+N <1000 ppm minimizes contamination, which improves deposited film resistivity and adhesion. Under optimized sputtering conditions, stoichiometric transfer within ±2 at% is achievable, ensuring consistent film properties.
What are the optimal sputtering parameters for this NiTi target to achieve uniform film thickness?
The target is optimized for DC/RF magnetron sputtering at 3-15 W/cm² (DC) or 1-5 W/cm² (RF) under 0.5-2.0 Pa Ar atmosphere. Under these conditions, deposition rates of 10-80 nm/min with ±5% thickness uniformity across a 100 mm substrate are achievable.
What bonding and backing plate options are available for this NiTi sputtering target, and how do they affect thermal management?
The target offers optional indium bonding or elastomer bonding, with backing plate options of oxygen-free copper or CuCrZr. These options allow for effective thermal management during high-power sputtering, with maximum power densities of 3-15 W/cm² (DC) and 1-5 W/cm² (RF).
This NiTi sputtering target (99.5% purity, 4" diameter x 5 mm) is designed for DC/RF magnetron sputtering with controlled stoichiometric transfer and high film uniformity, but requires careful verification of deposition system compatibility and adherence to specified operating parameters.
Positive
- High purity and stoichiometric control: The 99.5% (2N5) purity with total metallic impurities <5000 ppm and O+N <1000 ppm enables stoichiometric transfer within ±2 at% under optimized conditions, minimizing contamination and improving film resistivity and adhesion.
- Optimized sputtering performance: Designed for DC/RF magnetron sputtering at 3-15 W/cm² (DC) or 1-5 W/cm² (RF) under 0.5-2.0 Pa Ar, achieving deposition rates of 10-80 nm/min with ±5% thickness uniformity across a 100 mm substrate.
Trade-offs
- Deposition system compatibility required: The target's 4-inch diameter and 5 mm thickness, along with optional indium/elastomer bonding and backing plate materials, must be verified against the specific sputter gun and cooling configuration before ordering.
- Narrow operating parameter window: Optimal performance is constrained to DC/RF magnetron sputtering within a specific power density range (3-15 W/cm² DC or 1-5 W/cm² RF) and Ar atmosphere (0.5-2.0 Pa); deviations may reduce deposition rate, uniformity, or stoichiometry.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
