Deposition & Thin-Film Materials
All materials you need for CVD, ALD, Sputtering, Evaporation, Substrates
Showing 17–32 of 346 results
-
Atomfair High Purity 3N5 Rhodium (Rh) Sputtering Target 99.95%
-
Atomfair High Purity 3N5 Tantalum Chips (99.9% Ta) – Long Shavings
-
Atomfair High Purity 4N Aluminum Oxide (Al2O3) Sputtering Target
-
Atomfair High Purity 4N Aluminum Silicon Copper Alloy Lump (AlSiCu, 99.99%)
-
Atomfair High Purity 4N Aluminum Silicon Yttrium Alloy Sputtering Target (AlSiY, 99.9%)
-
Atomfair High Purity 4N Aluminum Zinc Oxide (AZO) Sputtering Target (ZnO/Al2O3 98/2 wt%)
-
Atomfair High Purity 4N Aluminum-Silicon-Copper Alloy Granules (AlSiCu, 99.99%)
-
Atomfair High Purity 4N Antimony (Sb) Sputtering Target, 99.99% Pure, Various Sizes
-
Atomfair High Purity 4N Antimony Telluride (Sb2Te3) Sputtering Target Bonded to Copper Backing Plate
-
Atomfair High Purity 4N AZO Sputtering Target (ZnO:Al2O3 = 98:2 wt%)
-
Atomfair High Purity 4N Bismuth Ferrite (BiFeO3) Sputtering Target
-
Atomfair High Purity 4N Bismuth Telluride (Bi2Te3) Sputtering Target
-
Atomfair High Purity 4N Bismuth Telluride Sputtering Target (Bi38Te62) – Bi2Te3 Alloy
-
Atomfair High Purity 4N Copper (Cu) Block, 99.99% Pure, 10mm Diameter x 15mm Length
-
Atomfair High Purity 4N Copper (Cu) Sputtering Target – 99.95% Pure
-
Atomfair High Purity 4N Copper Plate (99.95% Cu) – 100x100x10mm