Tantalum Nitride TaN Evaporation Powder 99.9% 35μm ATOMFAIR®

Price range: $420.00 through $3,900.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

Research-grade TaN evaporation powder, 99.9% purity and 35 μm particle size, for E-beam thin-film deposition; packs 25g-1kg. Order now.

Tantalum Nitride (TaN) Evaporation Material, Powder, 99.9%, 35 µm
Product Type: Compound Evaporation Material
Research-grade laboratory product
Product Overview

Tantalum Nitride (TaN) Evaporation Material, Powder, 99.9%, 35 µm is a research-grade compound evaporation material supplied as Powder with 99.9% material specification and Powder 35 µm size range for vacuum thin-film deposition workflows.

This evaporation material is prepared for laboratory procurement where material identity, purity, physical form, pack size and deposition hardware must be confirmed before ordering. The listed configuration supports selection for E-beam evaporation preferred; RFQ for thermal feasibility using E-beam hearth with compatible liner; high-temperature crucible by RFQ | Sheet2 hardware: – | – | – | – | -.

Available pack sizes are 25g / 100g / 500g / 1kg. Buyers should confirm deposition source geometry, required quantity, certificate requirements and shipment conditions before quotation.

Performance Features
  • Defined material identity: Tantalum Nitride (TaN) for clear procurement and deposition-process matching.
  • Specified physical form: Powder with Powder 35 µm sizing to support source loading and evaporation review.
  • Purity or composition listed as 99.9%, allowing comparison between standard, high-purity and RFQ-controlled grades.
Technical Specifications
Parameter Specification / Available Values
Atomfair Model AF-TANPWD-3N35UM
Material Tantalum Nitride
Formula TaN
Product Type Compound Evaporation Material
Form Powder
Purity / Composition 99.9%
Particle Size / Dimensions Powder 35 µm
Minimum Order Quantity 25g
Available Pack Sizes 25g / 100g / 500g / 1kg
Indicative Price Tiers 25g: USD 420; 100g: USD 1000; 500g: USD 2700; 1kg: USD 3900
Evaporation Source E-beam hearth with compatible liner; high-temperature crucible by RFQ | Sheet2 hardware: – | – | – | – | –
Evaporation Method E-beam evaporation preferred; RFQ for thermal feasibility
Melting Point 3,360
Density 16.3
Z-Ratio **1.00
PROCUREMENT CHECK: Confirm model, purity, form, size range, pack size and deposition-source compatibility before quotation.
DOCUMENTATION REVIEW: Certificate, safety data sheet, shipment condition and export requirements can be reviewed against laboratory use requirements.
APPLICATION MATCHING: Evaporation source hardware and process route should be matched to material behavior, melting point and film requirements.
INQUIRY NOTE: Include the required model, purity, form, size range and quantity when requesting quotation support.
LABORATORY PROCUREMENT SUPPORT
For material selection, deposition-source matching, pack-size confirmation or quotation support, contact our technical sales team.
INQUIRY: inquiry@atomfair.com
Manufacturer: Atomfair LLC
Brand: ATOMFAIR®

This tantalum nitride evaporation powder requires E-beam evaporation with a compatible hearth liner; thermal evaporation feasibility requires a quotation. Deposition source geometry and process route must be matched to the material's high melting point (3360°C) and Z-ratio (1.00) to achieve proper film properties.

  • Deposition Method Compatibility: E-beam evaporation is the preferred method; thermal evaporation requires RFQ evaluation due to the high melting point.
  • Crucible Requirements: Use an E-beam hearth with a compatible liner; high-temperature crucible is needed for thermal evaporation, available by RFQ.
  • Material Properties: The material has a melting point of 3360°C, density 16.3 g/cm³, and Z-ratio 1.00, which influence deposition parameters.
  • Procurement Verification: Confirm model, purity, form, particle size, pack size, and deposition-source compatibility before ordering.
  • Process Matching: Match the evaporation source hardware and process route to the material behavior and film requirements.

Why is electron-beam (E-beam) evaporation recommended over thermal evaporation for Tantalum Nitride (TaN) powder?

E-beam evaporation is preferred because TaN has a high melting point of 3,360°C and a density of 16.3 g/cm³, which require high-energy electron bombardment to achieve controlled evaporation. Thermal evaporation may be feasible only after RFQ evaluation using a high-temperature crucible, as standard thermal sources may not reach the necessary temperatures or maintain uniform deposition.

What particle size is specified for TaN evaporation powder and how does it affect source loading?

The TaN evaporation material is supplied as a powder with a 35 µm particle size. This fine particle size is intended to support consistent source loading and controlled evaporation in E-beam hearths, ensuring uniform heat distribution and minimizing spitting or non-uniform film thickness.

What documentation should be reviewed before handling Tantalum Nitride (TaN) powder in a laboratory?

Before handling TaN powder, users should review the Certificate of Analysis, Safety Data Sheet (SDS), and shipment conditions to confirm proper storage, handling precautions, and any export restrictions. The product is supplied as a research-grade material for laboratory use, and all safety protocols should be followed based on the SDS.

This Tantalum Nitride (TaN) evaporation material is supplied as a 99.9% pure powder with a 35 µm particle size, specified for E-beam evaporation with a high melting point of 3360°C and density of 16.3 g/cm³, requiring careful source compatibility and process validation.

Positive

  • High purity and defined particle size: 99.9% purity and 35 µm powder form provide consistent material composition and controlled evaporation behavior for thin-film deposition.
  • E-beam evaporation optimization: Material properties (melting point 3360°C, density 16.3 g/cm³) are well-matched to E-beam hearth with compatible liner, enabling efficient thermal transfer and film uniformity.

Trade-offs

  • Thermal evaporation requires RFQ confirmation: Thermal evaporation feasibility is not guaranteed and requires a request-for-quotation process, indicating potential process limitations beyond E-beam setups.
  • High melting point demands specialized crucibles: The 3360°C melting point necessitates high-temperature crucibles by RFQ and careful compatibility checks with deposition source hardware before use.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).

Package

25g, 100g, 500g, 1kg

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