Silicon Nitride Si3N4 Pieces 99.9% 760 nm ATOMFAIR®

Price range: $240.00 through $1,350.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

Research-grade silicon nitride Si3N4 evaporation pieces, 99.9% purity and 760 nm sizing for E-beam thin-film deposition; 25g-1kg packs. Order now.

Silicon Nitride (Si3N4) Evaporation Material, Pieces, 99.9%, 760 nm
Product Type: Compound Evaporation Material
Research-grade laboratory product
Product Overview

Silicon Nitride (Si3N4) Evaporation Material, Pieces, 99.9%, 760 nm is a research-grade compound evaporation material supplied as Pieces with 99.9% material specification and Pieces 760 nm size range for vacuum thin-film deposition workflows.

This evaporation material is prepared for laboratory procurement where material identity, purity, physical form, pack size and deposition hardware must be confirmed before ordering. The listed configuration supports selection for E-beam evaporation preferred; RFQ for thermal feasibility using E-beam hearth with compatible liner; high-temperature crucible by RFQ | Sheet2 hardware: – | – | – | – | -.

Available pack sizes are 25g / 100g / 500g / 1kg. Buyers should confirm deposition source geometry, required quantity, certificate requirements and shipment conditions before quotation.

Performance Features
  • Defined material identity: Silicon Nitride (Si3N4) for clear procurement and deposition-process matching.
  • Specified physical form: Pieces with Pieces 760 nm sizing to support source loading and evaporation review.
  • Purity or composition listed as 99.9%, allowing comparison between standard, high-purity and RFQ-controlled grades.
Technical Specifications
Parameter Specification / Available Values
Atomfair Model AF-SI3N4PCS-3N760NM
Material Silicon Nitride
Formula Si3N4
Product Type Compound Evaporation Material
Form Pieces
Purity / Composition 99.9%
Particle Size / Dimensions Pieces 760 nm
Minimum Order Quantity 25g
Available Pack Sizes 25g / 100g / 500g / 1kg
Indicative Price Tiers 25g: USD 240; 100g: USD 460; 500g: USD 1150; 1kg: USD 1350
Evaporation Source E-beam hearth with compatible liner; high-temperature crucible by RFQ | Sheet2 hardware: – | – | – | – | –
Evaporation Method E-beam evaporation preferred; RFQ for thermal feasibility
Melting Point 1,900
Density 3.44
Z-Ratio **1.00
PROCUREMENT CHECK: Confirm model, purity, form, size range, pack size and deposition-source compatibility before quotation.
DOCUMENTATION REVIEW: Certificate, safety data sheet, shipment condition and export requirements can be reviewed against laboratory use requirements.
APPLICATION MATCHING: Evaporation source hardware and process route should be matched to material behavior, melting point and film requirements.
INQUIRY NOTE: Include the required model, purity, form, size range and quantity when requesting quotation support.
LABORATORY PROCUREMENT SUPPORT
For material selection, deposition-source matching, pack-size confirmation or quotation support, contact our technical sales team.
INQUIRY: inquiry@atomfair.com
Manufacturer: Atomfair LLC
Brand: ATOMFAIR®

These constraints outline the processing requirements and hardware compatibility for silicon nitride evaporation material. Proper adherence ensures consistent thin-film deposition and prevents material degradation.

  • Evaporation Method Preference: E-beam evaporation is the preferred method; thermal evaporation requires RFQ confirmation due to material properties.
  • Hardware Compatibility: Use an E-beam hearth with a compatible liner; a high-temperature crucible is required for thermal evaporation and must be confirmed via RFQ.
  • Source Loading: The material is supplied as pieces of 760 nm size; ensure uniform loading to maintain stable evaporation rate and avoid source contamination.
  • Melting Point Influence: The melting point of 1900°C requires adequate power density in the evaporation source to achieve a stable melt.
  • Z-Ratio Correction: The Z-ratio of 1.00 simplifies thickness monitoring, but the density of 3.44 g/cm³ must be applied for accurate quartz crystal microbalance calibration.

Why is e-beam evaporation preferred over thermal evaporation for this Si3N4 evaporation material?

E-beam evaporation is the preferred method because Si3N4 has a melting point of 1,900°C and a density of 3.44 g/cm³, making it well-suited for an e-beam hearth with a compatible liner. Thermal evaporation requires a separate RFQ to assess feasibility, indicating it is not the standard recommended route for this material.

What deposition source hardware is required for using this Si3N4 evaporation material?

The product is designed for use with an e-beam hearth equipped with a compatible liner. For high-temperature crucible applications, a request for quotation (RFQ) is necessary. The exact liner material is not specified in the product description, so buyers should confirm compatibility with their deposition system.

What documentation should be reviewed before ordering this Si3N4 evaporation material for laboratory use?

The product description advises reviewing the certificate, safety data sheet (SDS), shipment conditions, and export requirements against laboratory use requirements. Additionally, deposition-source compatibility must be confirmed prior to quotation to ensure the material meets the intended application.

Silicon Nitride (Si3N4) evaporation material in pieces form at 99.9% purity and 760 nm size is evaluated for E-beam evaporation deposition, with a high melting point of 1,900°C and density of 3.44 g/cm³, requiring compatible hearth liners and high-temperature crucibles for thermal feasibility.

Positive

  • High purity for consistent films: 99.9% purity specification supports reproducible thin-film stoichiometry and reduces contamination risk in dielectric or passivation layers.
  • Defined piece size for loading: 760 nm pieces facilitate controlled source loading in E-beam hearths, minimizing spitting and improving evaporation rate stability.

Trade-offs

  • E-beam preferred; thermal limited: E-beam evaporation is preferred; thermal evaporation requires RFQ feasibility assessment due to high melting point (1,900°C) and potential crucible compatibility issues.
  • Z-ratio of 1.00 requires calibration: A Z-ratio of 1.00 indicates standard quartz crystal monitor calibration is needed for accurate film thickness control, adding process setup steps.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).

Package

25g, 100g, 500g, 1kg

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