|
Silicon Nitride (Si3N4) Evaporation Material, Pieces, 99.9%, 760 nm
Product Type: Compound Evaporation Material
Research-grade laboratory product
|
|||||||||||||||||||||||||||||||||||||||
|
|||||||||||||||||||||||||||||||||||||||
|
LABORATORY PROCUREMENT SUPPORT
For material selection, deposition-source matching, pack-size confirmation or quotation support, contact our technical sales team.
INQUIRY: inquiry@atomfair.com
|
|||||||||||||||||||||||||||||||||||||||
|
Manufacturer: Atomfair LLC
Brand: ATOMFAIR®
|
These constraints outline the processing requirements and hardware compatibility for silicon nitride evaporation material. Proper adherence ensures consistent thin-film deposition and prevents material degradation.
- Evaporation Method Preference: E-beam evaporation is the preferred method; thermal evaporation requires RFQ confirmation due to material properties.
- Hardware Compatibility: Use an E-beam hearth with a compatible liner; a high-temperature crucible is required for thermal evaporation and must be confirmed via RFQ.
- Source Loading: The material is supplied as pieces of 760 nm size; ensure uniform loading to maintain stable evaporation rate and avoid source contamination.
- Melting Point Influence: The melting point of 1900°C requires adequate power density in the evaporation source to achieve a stable melt.
- Z-Ratio Correction: The Z-ratio of 1.00 simplifies thickness monitoring, but the density of 3.44 g/cm³ must be applied for accurate quartz crystal microbalance calibration.
Why is e-beam evaporation preferred over thermal evaporation for this Si3N4 evaporation material?
E-beam evaporation is the preferred method because Si3N4 has a melting point of 1,900°C and a density of 3.44 g/cm³, making it well-suited for an e-beam hearth with a compatible liner. Thermal evaporation requires a separate RFQ to assess feasibility, indicating it is not the standard recommended route for this material.
What deposition source hardware is required for using this Si3N4 evaporation material?
The product is designed for use with an e-beam hearth equipped with a compatible liner. For high-temperature crucible applications, a request for quotation (RFQ) is necessary. The exact liner material is not specified in the product description, so buyers should confirm compatibility with their deposition system.
What documentation should be reviewed before ordering this Si3N4 evaporation material for laboratory use?
The product description advises reviewing the certificate, safety data sheet (SDS), shipment conditions, and export requirements against laboratory use requirements. Additionally, deposition-source compatibility must be confirmed prior to quotation to ensure the material meets the intended application.
Silicon Nitride (Si3N4) evaporation material in pieces form at 99.9% purity and 760 nm size is evaluated for E-beam evaporation deposition, with a high melting point of 1,900°C and density of 3.44 g/cm³, requiring compatible hearth liners and high-temperature crucibles for thermal feasibility.
Positive
- High purity for consistent films: 99.9% purity specification supports reproducible thin-film stoichiometry and reduces contamination risk in dielectric or passivation layers.
- Defined piece size for loading: 760 nm pieces facilitate controlled source loading in E-beam hearths, minimizing spitting and improving evaporation rate stability.
Trade-offs
- E-beam preferred; thermal limited: E-beam evaporation is preferred; thermal evaporation requires RFQ feasibility assessment due to high melting point (1,900°C) and potential crucible compatibility issues.
- Z-ratio of 1.00 requires calibration: A Z-ratio of 1.00 indicates standard quartz crystal monitor calibration is needed for accurate film thickness control, adding process setup steps.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).





