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Silicon Nitride (Si3N4) Evaporation Material, Pieces, 99.9%, 20-35 nm
Product Type: Compound Evaporation Material
Research-grade laboratory product
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LABORATORY PROCUREMENT SUPPORT
For material selection, deposition-source matching, pack-size confirmation or quotation support, contact our technical sales team.
INQUIRY: inquiry@atomfair.com
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Manufacturer: Atomfair LLC
Brand: ATOMFAIR®
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This material requires E-beam evaporation with a compatible liner or high-temperature crucible for thermal evaporation by RFQ. Deposition parameters must account for the melting point of 1900°C and Z-ratio of 1.00 for accurate thickness monitoring.
- Evaporation Method Compatibility: E-beam evaporation is preferred; thermal evaporation requires RFQ confirmation of feasibility.
- Source Liner Requirement: Use an E-beam hearth with a compatible liner; high-temperature crucible may be required for thermal evaporation.
- Melting Point Consideration: The melting point of 1900°C necessitates high-temperature source components and appropriate power settings.
- Z-Ratio for Thickness Monitoring: A Z-ratio of 1.00 simplifies quartz crystal microbalance calibration for deposition rate control.
- Particle Size Handling: The 20-35 nm piece size requires careful handling to avoid loss and ensure uniform loading into the evaporation source.
What is the significance of the 20-35 nm particle size range for Silicon Nitride evaporation material in e-beam deposition?
The 20-35 nm particle size range is specified to ensure consistent source loading and controlled evaporation rate during e-beam deposition. The small particle size promotes uniform heating and vaporization, which is critical for achieving stoichiometric films with the 99.9% purity material. Buyers should verify that this size range matches their deposition source geometry and desired film thickness uniformity.
What crucible or liner materials are compatible with e-beam evaporation of Silicon Nitride (Si3N4) pieces at 1,900°C?
For e-beam evaporation of Si3N4, a compatible liner is required for the e-beam hearth. The product specification recommends using a high-temperature crucible by RFQ, as the melting point of Si3N4 is 1,900°C. Standard copper crucibles may not be suitable; buyers should request a quotation for appropriate crucible materials that can withstand the high temperature and avoid chemical reaction with the molten Si3N4. The preferred evaporation method is e-beam; thermal evaporation feasibility requires an RFQ.
What handling and safety precautions are required for Silicon Nitride evaporation material in 20-35 nm pieces?
As a nanoscale material (20-35 nm pieces), this Silicon Nitride product requires appropriate laboratory handling procedures. The supplier provides a safety data sheet and certification upon request, and buyers should review all documentation for specific handling, storage, and disposal guidelines. The product is supplied in sealed containers in pack sizes from 25g to 1kg, and shipment conditions should be confirmed to maintain material integrity. Standard nanoparticle safety practices, including fume hood use and personal protective equipment, are recommended.
Silicon Nitride (Si3N4) evaporation material in pieces (20-35 nm, 99.9% purity) is optimized for E-beam evaporation using a compatible hearth liner; its high melting point (1900°C) and density (3.44 g/cm³) require careful source matching and process validation for thermal evaporation feasibility.
Positive
- High-purity compound for thin-film deposition: 99.9% purity and defined Si3N4 composition enable consistent film stoichiometry and reduce contamination risk in vacuum deposition workflows.
- Multiple pack sizes for lab scalability: Available in 25g, 100g, 500g, and 1kg packs, allowing researchers to match procurement to experimental scale without over-ordering.
Trade-offs
- E-beam evaporation preferred; thermal limited: Thermal evaporation requires RFQ feasibility confirmation, and the material is primarily designed for E-beam hearths with compatible liners, restricting process flexibility.
- High melting point demands robust hardware: Melting point of 1900°C necessitates high-temperature crucibles (by RFQ) and may exceed the thermal budget of standard evaporation sources without specialized setup.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
