SPIN COATER AF-4PRO 10000 RPM PROGRAMMABLE THIN FILM DEPOSITIONRESEARCH GRADE EQUIPMENT
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TAILORED SOLUTIONS FOR RESEARCH
Contact our engineering team for technical support or official quotations.
EMAIL: inquiry@atomfair.com
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Manufacturer: Atomfair LLC
Brand: ATOMFAIR®
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The instrument requires a connected and operational vacuum pump before substrate loading. Maximum speed of 10000 rpm must only be used with appropriately sized and well-balanced substrates.
- Vacuum Hold-Down Requirement: Adequate vacuum hold-down pressure must be confirmed prior to initiating spin rotation to prevent substrate detachment.
- Substrate Centering Constraint: The substrate must be centered on the vacuum chuck to ensure balanced loading and avoid vibration during high-speed rotation.
- Cross-Contamination Prevention: The spin bowl and chuck surface must be cleaned after each use to prevent cross-contamination between coating materials.
- Power Supply Compatibility: The instrument operates at 220 V / 50 Hz; local power supply compatibility must be verified before installation.
This procedure describes the safe initialization and operation of the AF-4pro spin coater for depositing uniform thin films on substrates up to 4 inches. Follow these steps to ensure reproducible coating results and prevent equipment damage.
Required Equipment: AF-4pro Spin Coater, Vacuum pump, Vacuum chuck (appropriate size for substrate)
- Connect vacuum pump
Connect and power on the vacuum pump, then verify that it is operational before proceeding. - Mount substrate on chuck
Place the substrate centered on the vacuum chuck and confirm adequate hold-down pressure via the on-screen vacuum level display. - Program spin recipe
Use the 5-inch touch screen interface to program the desired multi-step spin recipe including speed, ramp rate, and dwell time. - Dispense coating solution
Deposit the precursor solution through the concentric dispensing port onto the center of the substrate while the lid is closed. - Initiate spin cycle
Start the spin cycle and monitor the coating process through the transparent viewing window. - Remove coated substrate
After the spin cycle completes, release the vacuum and carefully remove the coated substrate from the chuck. - Clean chamber surfaces
Clean the spin bowl and chuck surface immediately after use to prevent cross-contamination between coating materials.
What is the maximum spin speed of the AF-4pro and what substrate sizes can be processed safely?
The AF-4pro operates from 20 to 10000 rpm and accepts substrates ranging from small fragments up to 4-inch round wafers, including irregularly shaped substrates. The 10000 rpm maximum should only be used with appropriately sized substrates and well-balanced loading conditions. The transparent viewing window and concentric dispensing port allow real-time visual monitoring during spin coating.
Which coating materials and substrate types is the AF-4pro compatible with?
The AF-4pro is intended for semiconductor photoresist spin coating, OLED and perovskite thin film deposition, MEMS sacrificial and structural polymer coatings, sol-gel and nanoparticle coatings, polymer dielectric layers, and anti-reflection or protective hard coat applications. It handles standard circular silicon, glass, quartz, and sapphire wafers as well as irregular-shaped substrates. Multiple standard vacuum chuck sizes are available, and custom vacuum chuck configurations can be requested from the manufacturer.
What setup and infrastructure checks are required before operating the AF-4pro spin coater?
Before loading substrates, verify that the vacuum pump is connected and operational, center the substrate on the vacuum chuck, and confirm adequate vacuum hold-down pressure is achieved prior to initiating rotation. The on-screen vacuum level and manual pressure adjustment knob provide precise hold-down force control for delicate thin-glass or flexible substrates. The instrument requires 220 V / 50 Hz power, so local supply compatibility must be confirmed, and the spin bowl and chuck should be cleaned after each use to prevent cross-contamination.
The AF-4pro spin coater provides PLC-controlled spin coating up to 10000 rpm with a 5-inch touch screen interface and a transparent flip lid with concentric dispensing port. Its real-time vacuum monitoring and manual pressure adjustment enable precise substrate hold-down for thin glass or flexible substrates. The unit accommodates fragments to 4-inch wafers, but the 10000 rpm maximum must be used only with well-balanced loads, and the instrument requires a 220 V / 50 Hz power supply.
Positive
- PLC-based programmable multi-step recipes: The PLC control system with 5-inch touch screen provides precise speed ramps, dwell times, and acceleration profiles, enabling reproducible thin film deposition protocols for diverse research applications.
- Real-time vacuum level display and adjustment: On-screen vacuum monitoring with manual pressure adjustment knob prevents substrate warpage on delicate thin glass or flexible substrates, enhancing process control for fragile materials.
Trade-offs
- Maximum speed limited to well-balanced loads: The 10000 rpm maximum speed should only be used with appropriately sized substrates and well-balanced loading conditions; improper loading may cause vibration or damage.
- Requires 220 V / 50 Hz power supply: The instrument operates at 220 V / 50 Hz; local power supply compatibility must be verified before installation, which may require a step-down transformer or frequency converter in regions with different mains standards.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
