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Spin Coater AF Series Programmable PLC Touch Screen Vacuum Chuck Thin Film Deposition Lab Research Equipment Semiconductor Lithography

8-Inch Programmable Spin Coater 10000 rpm AF-8pro ATOMFAIR®

$3,937.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

Research-grade AF-8pro spin coater with PLC control, 5-inch touch screen, 20–10000 rpm speed range, and fragment-to-8-inch wafer chuck support. Order now.

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SPIN COATER AF-8PRO 10000 RPM PROGRAMMABLE THIN FILM DEPOSITION

RESEARCH GRADE EQUIPMENT

Product Overview
The AF-8pro series Spin Coater is a high-precision thin film deposition coating instrument purpose-built for research institutes, university laboratories, and small-to-medium batch production environments. Equipped with an advanced 10000 rpm programmable PLC control system and an intuitive 5-inch full-color touch screen interface, this programmable spin coater delivers stable and repeatable processing for substrates ranging from small fragments up to 8-inch standard circular wafers and various irregularly shaped substrates. The instrument supports an 8-inch wafer vacuum chuck configuration and is widely compatible with precision process requirements across semiconductor lithography, optoelectronic display fabrication, MEMS device manufacturing, and functional coating research, making it an ideal choice for laboratory thin film preparation and small-batch production.

Technical Specifications
PARAMETER DETAILS
Model AF-8pro
Chamber Design Transparent Viewing Window Flip Lid with Concentric Dispensing Port
Control System PLC Programmable Logic Controller
User Interface 5-Inch Full-Color Touch Screen
Substrate Size Range Fragments to 8-Inch Round Substrates
Speed Range 20–10000 rpm
Vacuum Display On-Screen Vacuum Level with Manual Pressure Adjustment Knob
Vacuum Chuck Multiple Standard Size Vacuum Chucks Available
Power Supply 220 V / 50 Hz
Instrument Dimensions 650 × 470 × 320 mm (H)
Custom Configurations Other model variants and vacuum chuck specifications are available upon request. Please contact us via email for custom orders.

Key Features & Advantages
  • Transparent Flip Lid with Concentric Dispensing Port: The upward-opening transparent viewing window allows real-time visual monitoring of the coating process, while the concentric dispensing port ensures uniform precursor solution delivery onto the substrate center for optimal film uniformity.
  • PLC Programmable Control with 5-Inch Touch Screen: The PLC-based control architecture combined with a full-color touch screen interface provides precise multi-step recipe programming, enabling reproducible spin speed ramps, dwell times, and acceleration profiles tailored to specific thin film deposition protocols.
  • Wide Substrate Compatibility from Fragments to 8-Inch Wafers: The AF-8pro processes substrates ranging from small irregular fragments up to 8-inch standard circular wafers and various irregularly shaped substrates, accommodating diverse research needs in semiconductor, optoelectronic, and MEMS applications.
  • Real-Time Vacuum Monitoring with Manual Adjustment: On-screen vacuum level display combined with a manual pressure adjustment knob provides precise substrate hold-down force control, preventing substrate warpage on delicate thin glass or flexible substrates.

APPLICATION SCOPE: Semiconductor photoresist spin coating for lithography processes. Organic light-emitting diode and perovskite thin film deposition for optoelectronic display research. MEMS sacrificial layer and structural polymer coating. Functional sol-gel and nanoparticle thin film coating for surface engineering. Polymer dielectric layer deposition for flexible electronics. Anti-reflection and protective hard coat application for optical components. Compatible with standard circular silicon, glass, quartz, and sapphire wafers as well as irregular-shaped substrates.
PACKAGING & DELIVERY: Each AF-8pro spin coater is securely packed in a reinforced instrument crate with custom foam inserts to protect precision mechanical and electronic components during transit. Standard accessories include one vacuum chuck for the specified substrate size, power cable, and user manual. Additional vacuum chuck sizes are available as optional accessories. Installation and operational training support are provided upon request.
IMPORTANT NOTICE: Always verify that the vacuum pump is connected and operational before loading substrates onto the chuck. Ensure the substrate is centered on the vacuum chuck and adequate vacuum hold-down pressure is achieved prior to initiating spin rotation. The maximum speed of 10000 rpm should only be used with appropriately sized substrates and well-balanced loading conditions. Clean the spin bowl and chuck surface after each use to prevent cross-contamination between coating materials. The instrument operates at 220 V / 50 Hz; verify local power supply compatibility before installation. For detailed operational and safety instructions, consult the user manual prior to first use.
TAILORED SOLUTIONS FOR RESEARCH
Contact our engineering team for technical support or official quotations.
EMAIL: inquiry@atomfair.com
Manufacturer: Atomfair LLC
Brand: ATOMFAIR®

The AF-8pro spin coater requires a functional vacuum system and proper substrate loading before operation. Maximum speed of 10000 rpm must only be used with appropriately sized and balanced substrates to prevent damage or injury.

  • Vacuum system verification: Always verify that the vacuum pump is connected and operational before loading substrates onto the chuck.
  • Substrate loading procedure: Ensure the substrate is centered on the vacuum chuck and adequate vacuum hold-down pressure is achieved prior to initiating spin rotation.
  • Maximum speed limitation: The maximum speed of 10000 rpm should only be used with appropriately sized substrates and well-balanced loading conditions.
  • Post-use cleaning: Clean the spin bowl and chuck surface after each use to prevent cross-contamination between coating materials.
  • Power supply compatibility: The instrument operates at 220 V / 50 Hz; verify local power supply compatibility before installation.

This procedure outlines the safe initialization and operation of the AF-8pro spin coater for thin film deposition. Follow these steps to ensure proper substrate loading, spin processing, and post-use cleaning.

Required Equipment: Vacuum pump, Vacuum chuck, Substrate

  1. Connect vacuum pump
    Verify that the vacuum pump is connected and operational before loading any substrate onto the chuck.
  2. Load substrate
    Center the substrate on the vacuum chuck and confirm adequate vacuum hold-down pressure is achieved prior to initiating spin rotation.
  3. Set spin parameters
    Program the desired spin speed, acceleration, and duration using the PLC control system via the 5-inch touch screen interface.
  4. Start spin cycle
    Initiate the spin cycle only after ensuring the substrate is properly centered and balanced, and never exceed the maximum speed of 10000 rpm with inappropriate substrates.
  5. Clean after use
    Clean the spin bowl and chuck surface after each use to prevent cross-contamination between coating materials.

What should be checked before running the AF-8pro spin coater at 10,000 rpm?

The 10,000 rpm maximum speed should only be used with appropriately sized substrates and well-balanced loading conditions. Verify that the vacuum pump is connected and operational, center the substrate on the vacuum chuck, and confirm adequate vacuum hold-down pressure before initiating spin rotation. Consult the user manual for detailed operational and safety instructions prior to first use.

Can the AF-8pro coat irregular or non-circular substrates, or is it limited to standard wafers?

The AF-8pro is not limited to standard wafers: it processes substrates ranging from small fragments up to 8-inch standard circular wafers and various irregularly shaped substrates. It is compatible with standard circular silicon, glass, quartz, and sapphire wafers, and multiple standard-size vacuum chucks are available to accommodate the substrate format. Intended applications include semiconductor photoresist coating, OLED and perovskite thin films, MEMS coatings, sol-gel and nanoparticle films, polymer dielectric layers, and optical hard coats.

What utility and safety preparations are required before installing the AF-8pro?

The instrument operates at 220 V / 50 Hz, so verify local power supply compatibility before installation. Before loading substrates, confirm that the vacuum pump is connected and operational, center the substrate on the chuck, and ensure adequate vacuum hold-down pressure is achieved prior to spinning. After each use, clean the spin bowl and chuck surface to prevent cross-contamination between coating materials.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).

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