Gold-Coated Substrate Cr/Au 4 Inch Double-Sided ATOMFAIR®

$191.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

4 inch double-sided gold-coated substrate with Cr 30 nm/Au 100 nm stack, Ra <1 nm roughness and ≥99.999% film purity for glass, quartz or sapphire. Order now.

4 Inch Double-Sided Coating Gold-Coated Substrate

Product Type: Gold-coated substrate

Research-grade laboratory product

Product Overview

4 inch double-sided coating gold-coated substrate is listed with a Cr 30 nm / Au 100 nm film stack. The substrate can be silicon, glass, quartz or sapphire.

The coating specification includes Ra < 1 nm roughness and a listed film purity of at least 99.999%. Electron-beam evaporation and magnetron sputtering are available processing routes.

Performance Features

Double-Sided Coating configuration
Cr 30 nm / Au 100 nm film stack listed
Silicon, glass, quartz and sapphire substrate types listed
Electron-beam evaporation and magnetron sputtering listed

Technical Specifications

Parameter	Specification / Available Values
Atomfair Model	AF-GAU-4IN-D
Size	4 inch
Coating Sides	Double-Sided Coating
Film Stack	Cr 30 nm / Au 100 nm; customizable
Substrate Types	Silicon wafer, glass, quartz or sapphire
Substrate Dimensions	Size, specification and thickness can be customized
Film Roughness	Ra < 1 nm
Film Purity	≥ 99.999%
Coating Processes	Electron-beam evaporation or magnetron sputtering

Quotation Confirmation

4 inch size, double-sided coating, Cr 30 nm / Au 100 nm film stack, substrate type, substrate thickness and coating process should be confirmed before quotation. Custom dimensions and specifications should be included in the request.

MODEL AND SPECIFICATION CONFIRMATION: Confirm the selected size, material system and configuration before quotation.

COMPATIBILITY CONFIRMATION: Confirm the substrate, surface treatment and intended integration requirements for the selected item.

QUANTITY CONFIRMATION: Include the required specification and quantity when requesting quotation support.

LABORATORY PROCUREMENT SUPPORT

For model selection, substrate matching or configuration confirmation, contact our technical sales team.

E-MAIL: inquiry@atomfair.com

Supplier: Atomfair

Brand: ATOMFAIR®

What surface roughness and film purity can be expected from the 4-inch double-sided gold-coated substrate?

The listed coating specification is Ra < 1 nm surface roughness with a film purity of at least 99.999%, applied as a Cr 30 nm / Au 100 nm stack on both sides. Electron-beam evaporation and magnetron sputtering are both listed as available coating processes.

Which substrate materials and dimensional options are available for the AF-GAU-4IN-D gold-coated substrate?

The substrate can be silicon wafer, glass, quartz, or sapphire, and both substrate dimensions and thickness can be customized. Because substrate type and thickness affect the final configuration, they must be confirmed with Atomfair before quotation.

Which deposition processes are available for the 4-inch double-sided gold-coated substrate, and can the Cr/Au film stack be customized?

Electron-beam evaporation and magnetron sputtering are listed as the available processing routes for the Cr 30 nm / Au 100 nm film stack. The film stack itself is listed as customizable, and the coating process, substrate type, and substrate thickness should all be confirmed before quotation.

Assessment

The 4 inch double-sided gold-coated substrate (AF-CO-W-GOLD-04IN-S024) with Cr 30 nm / Au 100 nm film stack provides a sub-nanometer surface roughness of Ra < 1 nm and film purity ≥ 99.999%, making it suitable for high-precision optical and electronic applications requiring low scattering and high conductivity across both faces.

Positive

Ultra-low roughness for precision use: Ra < 1 nm surface roughness minimizes light scattering and interfacial defects, critical for thin-film device fabrication and optical coatings.
High film purity for reliable performance: ≥ 99.999% purity in the gold layer ensures consistent electrical conductivity and reduces contamination risks in sensitive research environments.

Trade-offs

Custom substrate confirmation required: Substrate type, thickness, and dimensions must be confirmed before quotation, adding lead time and requiring precise specification matching for the intended integration.
Two coating processes with trade-offs: Electron-beam evaporation and magnetron sputtering are both offered; each affects film density, adhesion, and stress differently, requiring process evaluation based on application demands.

Quality Standards & Performance Verification

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Shipping & Returns

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).