Gallium Nitride GaN E-Beam Pieces 99.4% 10 μm ATOMFAIR®

Price range: $440.00 through $1,600.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

Research-grade GaN evaporation pieces, 99.4% purity and 10 μm size, for E-beam thin-film deposition; 100g, 500g, and 1kg packs. Order now. Al2O3 liner review.

Gallium Nitride (GaN) Evaporation Material, Pieces, 99.4%, 10 µm
Product Type: Compound Evaporation Material
Research-grade laboratory product
Product Overview

Gallium Nitride (GaN) Evaporation Material, Pieces, 99.4%, 10 µm is a research-grade compound evaporation material supplied as Pieces with 99.4% material specification and Pieces 10 µm size range for vacuum thin-film deposition workflows.

This evaporation material is prepared for laboratory procurement where material identity, purity, physical form, pack size and deposition hardware must be confirmed before ordering. The listed configuration supports selection for E-beam evaporation preferred; RFQ for thermal feasibility using E-beam hearth with compatible liner; high-temperature crucible by RFQ | Sheet2 hardware: – | – | – | – | Al2O3.

Available pack sizes are 100g / 500g / 1kg. Buyers should confirm deposition source geometry, required quantity, certificate requirements and shipment conditions before quotation.

Performance Features
  • Defined material identity: Gallium Nitride (GaN) for clear procurement and deposition-process matching.
  • Specified physical form: Pieces with Pieces 10 µm sizing to support source loading and evaporation review.
  • Purity or composition listed as 99.4%, allowing comparison between standard, high-purity and RFQ-controlled grades.
Technical Specifications
Parameter Specification / Available Values
Atomfair Model AF-GANPCS-99410UM
Material Gallium Nitride
Formula GaN
Product Type Compound Evaporation Material
Form Pieces
Purity / Composition 99.4%
Particle Size / Dimensions Pieces 10 µm
Minimum Order Quantity 100g
Available Pack Sizes 100g / 500g / 1kg
Indicative Price Tiers 100g: USD 440; 500g: USD 1150; 1kg: USD 1600
Evaporation Source E-beam hearth with compatible liner; high-temperature crucible by RFQ | Sheet2 hardware: – | – | – | – | Al2O3
Evaporation Method E-beam evaporation preferred; RFQ for thermal feasibility
Melting Point 800
Density 6.1
PROCUREMENT CHECK: Confirm model, purity, form, size range, pack size and deposition-source compatibility before quotation.
DOCUMENTATION REVIEW: Certificate, safety data sheet, shipment condition and export requirements can be reviewed against laboratory use requirements.
APPLICATION MATCHING: Evaporation source hardware and process route should be matched to material behavior, melting point and film requirements.
INQUIRY NOTE: Include the required model, purity, form, size range and quantity when requesting quotation support.
LABORATORY PROCUREMENT SUPPORT
For material selection, deposition-source matching, pack-size confirmation or quotation support, contact our technical sales team.
INQUIRY: inquiry@atomfair.com
Manufacturer: Atomfair LLC
Brand: ATOMFAIR®

This Gallium Nitride evaporation material requires specific deposition hardware and process conditions. Users must confirm e-beam evaporation compatibility and crucible liner selection before use.

  • Evaporation Method: E-beam evaporation is the preferred method; thermal evaporation requires feasibility confirmation via RFQ.
  • Crucible and Liner: Use an e-beam hearth with a compatible liner such as Al2O3, or a high-temperature crucible by RFQ.
  • Melting Point: The material melts at 800°C, which must be matched to the deposition source and process parameters.
  • Particle Size: The 10 µm particle size supports source loading in e-beam evaporation systems.

Can Gallium Nitride (GaN) evaporation material be used with thermal evaporation, or is e-beam evaporation required?

E-beam evaporation is the preferred method for this GaN evaporation material, but thermal evaporation feasibility can be evaluated via RFQ. The product specification lists an e-beam hearth with compatible liner as the primary evaporation source, and high-temperature crucible options are available by RFQ. Buyers should confirm deposition method compatibility with the technical sales team before ordering.

What crucible or liner material is compatible with GaN evaporation given its 800°C melting point?

The product specification recommends an e-beam hearth with a compatible liner, and Al2O3 is explicitly listed as a liner material. High-temperature crucible options are available by RFQ for thermal evaporation trials. The melting point of GaN is 800°C, so the crucible must withstand that temperature; Al2O3 is a common choice for such applications.

How does the 10 µm particle size of GaN pieces influence loading and evaporation uniformity in e-beam deposition?

The 10 µm particle size of the GaN pieces is specified to support source loading and evaporation review. Small, uniform pieces allow for consistent packing in the e-beam hearth, reducing void spaces and promoting even evaporation rates. However, the exact loading method and deposition hardware must be matched to the material's behavior and the required film characteristics.

This Gallium Nitride (GaN) evaporation material in pieces form with 99.4% purity and 10 µm particle size is specified for E-beam evaporation in thin-film deposition, with melting point and density requiring compatible crucible and hardware selection.

Positive

  • Defined material identity and purity: Gallium Nitride identity and 99.4% purity specification enable clear procurement matching and direct comparison with standard or high-purity grades for deposition process control.
  • Specified particle size range: Pieces sized at 10 µm support controlled source loading and consistent evaporation behavior in E-beam hearth systems, reducing variability in film thickness.

Trade-offs

  • E-beam evaporation preferred; thermal requires RFQ: This material is optimized for E-beam evaporation; thermal evaporation feasibility is not guaranteed and requires a separate quotation, limiting deposition method flexibility.
  • Melting point and density demand hardware matching: With a melting point of 800°C and density of 6.1 g/cm³, deposition source hardware, crucible materials, and liner compatibility must be confirmed to avoid process failure.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).

Package

100g, 500g, 1kg

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