Gallium Nitride GaN Evaporation Powder 99.4%, 10μm ATOMFAIR®

Price range: $340.00 through $2,400.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

Research-grade GaN evaporation powder with 99.4% purity, 10 μm particle size, and 25g-1kg pack options for E-beam thin-film deposition. Order now.

Gallium Nitride (GaN) Evaporation Material, Powder, 99.4%, 10 µm
Product Type: Compound Evaporation Material
Research-grade laboratory product
Product Overview

Gallium Nitride (GaN) Evaporation Material, Powder, 99.4%, 10 µm is a research-grade compound evaporation material supplied as Powder with 99.4% material specification and Powder 10 µm size range for vacuum thin-film deposition workflows.

This evaporation material is prepared for laboratory procurement where material identity, purity, physical form, pack size and deposition hardware must be confirmed before ordering. The listed configuration supports selection for E-beam evaporation preferred; RFQ for thermal feasibility using E-beam hearth with compatible liner; high-temperature crucible by RFQ | Sheet2 hardware: – | – | – | – | Al2O3.

Available pack sizes are 25g / 100g / 500g / 1kg. Buyers should confirm deposition source geometry, required quantity, certificate requirements and shipment conditions before quotation.

Performance Features
  • Defined material identity: Gallium Nitride (GaN) for clear procurement and deposition-process matching.
  • Specified physical form: Powder with Powder 10 µm sizing to support source loading and evaporation review.
  • Purity or composition listed as 99.4%, allowing comparison between standard, high-purity and RFQ-controlled grades.
Technical Specifications
Parameter Specification / Available Values
Atomfair Model AF-GANPWD-99410UM
Material Gallium Nitride
Formula GaN
Product Type Compound Evaporation Material
Form Powder
Purity / Composition 99.4%
Particle Size / Dimensions Powder 10 µm
Minimum Order Quantity 25g
Available Pack Sizes 25g / 100g / 500g / 1kg
Indicative Price Tiers 25g: USD 340; 100g: USD 750; 500g: USD 1850; 1kg: USD 2400
Evaporation Source E-beam hearth with compatible liner; high-temperature crucible by RFQ | Sheet2 hardware: – | – | – | – | Al2O3
Evaporation Method E-beam evaporation preferred; RFQ for thermal feasibility
Melting Point 800
Density 6.1
PROCUREMENT CHECK: Confirm model, purity, form, size range, pack size and deposition-source compatibility before quotation.
DOCUMENTATION REVIEW: Certificate, safety data sheet, shipment condition and export requirements can be reviewed against laboratory use requirements.
APPLICATION MATCHING: Evaporation source hardware and process route should be matched to material behavior, melting point and film requirements.
INQUIRY NOTE: Include the required model, purity, form, size range and quantity when requesting quotation support.
LABORATORY PROCUREMENT SUPPORT
For material selection, deposition-source matching, pack-size confirmation or quotation support, contact our technical sales team.
INQUIRY: inquiry@atomfair.com
Manufacturer: Atomfair LLC
Brand: ATOMFAIR®

This material requires E-beam evaporation with a compatible liner and high-temperature crucible for thermal processing. The powder's 10 µm particle size and 800°C melting point dictate specific handling and processing conditions.

  • Deposition Method Compatibility: E-beam evaporation is the preferred method; thermal evaporation feasibility requires a request for quotation (RFQ) and use of a high-temperature crucible such as Al2O3.
  • Crucible and Liner Requirements: The evaporation source must use an E-beam hearth with a compatible liner and a high-temperature crucible, with Al2O3 specified as a reference liner material.
  • Particle Size and Form Handling: The powder with 10 µm particle size requires careful handling to avoid agglomeration and ensure uniform loading into the evaporation source.
  • Melting Point and Thermal Behavior: The material's melting point of 800°C must be considered for evaporation rate control and to prevent thermal decomposition.
  • Process Matching: Deposition source hardware and process parameters must be matched to the material's behavior, melting point, and target film requirements.

What is the purity grade of this GaN evaporation material, and how does it compare to higher-purity alternatives available for research applications?

This GaN powder is supplied at 99.4% purity, which is a standard research grade. The product description indicates that higher-purity and RFQ-controlled grades are available for comparison, though specific figures are not listed. Buyers requiring higher purity should submit an RFQ to discuss specifications and cost implications.

Is this GaN powder suitable for thermal evaporation, or is e-beam evaporation required?

E-beam evaporation is the preferred method for this GaN powder, as stated in the specification. Thermal evaporation feasibility requires an RFQ, as the material's melting point of 800°C and powder form may demand a high-temperature crucible (e.g., Al2O3) and process optimization.

What crucible or liner material is recommended for e-beam evaporation of this GaN powder?

The recommended liner material for the e-beam hearth is Al2O3 (alumina). For high-temperature crucible applications, an RFQ is required to confirm compatibility with the specific deposition hardware. The density of 6.1 g/cm³ should also be considered when selecting crucible volume.

Gallium Nitride (GaN) evaporation material, 99.4% purity, 10 µm powder, available in 25g to 1kg packs, optimized for E-beam evaporation with RFQ needed for thermal feasibility.

Positive

  • Defined material identity and purity: Gallium Nitride (GaN) with 99.4% purity and 10 µm powder sizing provide clear specification for precise deposition-process matching.
  • Specified physical form for consistent deposition: The powder form with 10 µm particle size supports reliable source loading and evaporation behavior in vacuum thin-film deposition workflows.

Trade-offs

  • E-beam evaporation preferred; thermal feasibility by RFQ: The material is optimized for E-beam evaporation; thermal evaporation is not standard and requires a separate RFQ for feasibility assessment, potentially delaying procurement.
  • Deposition source compatibility must be confirmed: Evaporation hardware must be matched to the material's behavior and melting point; buyers must verify E-beam hearth liner compatibility or request high-temperature crucible via RFQ before ordering.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).

Package

25g, 100g, 500g, 1kg

Related Products