Gallium Nitride GaN Evaporation Pieces 99.4% 35μm ATOMFAIR®

Price range: $440.00 through $1,600.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

Research-grade GaN evaporation pieces with 99.4% purity, 35 μm size, and 100g-1kg pack options for E-beam deposition using compatible Al2O3 liners. Order now.

Gallium Nitride (GaN) Evaporation Material, Pieces, 99.4%, 35 µm
Product Type: Compound Evaporation Material
Research-grade laboratory product
Product Overview

Gallium Nitride (GaN) Evaporation Material, Pieces, 99.4%, 35 µm is a research-grade compound evaporation material supplied as Pieces with 99.4% material specification and Pieces 35 µm size range for vacuum thin-film deposition workflows.

This evaporation material is prepared for laboratory procurement where material identity, purity, physical form, pack size and deposition hardware must be confirmed before ordering. The listed configuration supports selection for E-beam evaporation preferred; RFQ for thermal feasibility using E-beam hearth with compatible liner; high-temperature crucible by RFQ | Sheet2 hardware: – | – | – | – | Al2O3.

Available pack sizes are 100g / 500g / 1kg. Buyers should confirm deposition source geometry, required quantity, certificate requirements and shipment conditions before quotation.

Performance Features
  • Defined material identity: Gallium Nitride (GaN) for clear procurement and deposition-process matching.
  • Specified physical form: Pieces with Pieces 35 µm sizing to support source loading and evaporation review.
  • Purity or composition listed as 99.4%, allowing comparison between standard, high-purity and RFQ-controlled grades.
Technical Specifications
Parameter Specification / Available Values
Atomfair Model AF-GANPCS-99435UM
Material Gallium Nitride
Formula GaN
Product Type Compound Evaporation Material
Form Pieces
Purity / Composition 99.4%
Particle Size / Dimensions Pieces 35 µm
Minimum Order Quantity 100g
Available Pack Sizes 100g / 500g / 1kg
Indicative Price Tiers 100g: USD 440; 500g: USD 1150; 1kg: USD 1600
Evaporation Source E-beam hearth with compatible liner; high-temperature crucible by RFQ | Sheet2 hardware: – | – | – | – | Al2O3
Evaporation Method E-beam evaporation preferred; RFQ for thermal feasibility
Melting Point 800
Density 6.1
PROCUREMENT CHECK: Confirm model, purity, form, size range, pack size and deposition-source compatibility before quotation.
DOCUMENTATION REVIEW: Certificate, safety data sheet, shipment condition and export requirements can be reviewed against laboratory use requirements.
APPLICATION MATCHING: Evaporation source hardware and process route should be matched to material behavior, melting point and film requirements.
INQUIRY NOTE: Include the required model, purity, form, size range and quantity when requesting quotation support.
LABORATORY PROCUREMENT SUPPORT
For material selection, deposition-source matching, pack-size confirmation or quotation support, contact our technical sales team.
INQUIRY: inquiry@atomfair.com
Manufacturer: Atomfair LLC
Brand: ATOMFAIR®

Gallium Nitride evaporation material requires e-beam deposition with a compatible hearth liner to prevent contamination. The material's melting point of 800°C and density of 6.1 g/cm³ dictate evaporation parameters and source loading.

  • Evaporation Source Compatibility: Use e-beam hearth with compatible liner, preferably Al2O3, and confirm crucible material for high-temperature operation.
  • Process Parameter Guidance: Melting point of 800°C and density of 6.1 g/cm³ require calibration of e-beam power and deposition rate.

Confirm material specifications and deposition source compatibility before processing. Match the evaporation hardware and process parameters to the material's melting point and film requirements.

Required Equipment: E-beam hearth, High-temperature crucible

  1. Confirm Material Specifications
    Confirm the model, purity, form, size range, pack size, and deposition-source compatibility before placing an order.
  2. Review Documentation
    Review the certificate, safety data sheet, shipment conditions, and export requirements against laboratory use requirements.
  3. Match Hardware and Process
    Match the evaporation source hardware and process route to the material's melting point and film requirements.

Why is E-beam evaporation preferred over thermal evaporation for this Gallium Nitride (GaN) material, and under what conditions can thermal evaporation be considered?

E-beam evaporation is preferred due to GaN's high melting point (800 °C) and the need to control decomposition during deposition. Thermal evaporation may be feasible only by RFQ, requiring a high-temperature crucible and compatible liner, as the material's density (6.1 g/cm³) and physical form (pieces, 35 µm) further influence source loading and evaporation behavior.

What liner material is compatible with E-beam evaporation of this GaN evaporation material, and is alumina (Al2O3) a suitable option?

Alumina (Al2O3) is listed as a compatible liner material for E-beam hearth evaporation of GaN. For thermal evaporation via RFQ, a high-temperature crucible is required. The product specification explicitly includes Al2O3 in the hardware compatibility list, making it a recommended liner for this 99.4% purity GaN material.

What safety documentation is provided with this GaN evaporation material, and what handling precautions apply to the 35 µm pieces?

A certificate of analysis and safety data sheet (SDS) are available upon request for review against laboratory use requirements. The material is supplied as pieces with a 35 µm dimension, which can generate fine dust; standard precautions for handling fine particulate solids—such as using gloves, eye protection, and working in a fume hood—should be followed as advised in the SDS.

Gallium Nitride (GaN) evaporation material in pieces (99.4% purity, 35 µm) is optimized for E-beam deposition with a melting point of 800°C and density of 6.1 g/cm³, requiring careful source geometry and crucible compatibility for reliable film formation.

Positive

  • Defined purity and form: Specified 99.4% purity and 35 µm pieces ensure clear procurement and consistent source loading for vacuum deposition processes.
  • E-beam evaporation compatibility: Directly specified for E-beam hearth with compatible liner, with high-temperature crucible options available by RFQ, supporting high-rate deposition of GaN.

Trade-offs

  • Pre-quote compatibility check required: Buyer must confirm deposition source geometry, pack size, certificate requirements, and shipment conditions before quotation to avoid process mismatch.
  • Thermal evaporation feasibility uncertain: E-beam is preferred; thermal evaporation requires RFQ review, and high-temperature crucible handling is needed due to the 800°C melting point and reactive nature of GaN.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).

Package

100g, 500g, 1kg

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