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Boron Oxide (B2O3) Evaporation Material, Pieces, 99.9%, 50 nm
Product Type: Compound Evaporation Material
Research-grade laboratory product
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LABORATORY PROCUREMENT SUPPORT
For material selection, deposition-source matching, pack-size confirmation or quotation support, contact our technical sales team.
INQUIRY: inquiry@atomfair.com
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Manufacturer: Atomfair LLC
Brand: ATOMFAIR®
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The material requires specific evaporation source hardware for effective deposition. Compatibility with E-beam hearth liners or metal boats is critical to avoid contamination and achieve uniform film formation.
- Evaporation Source Compatibility: The material is optimized for E-beam evaporation using a graphite, Al2O3, or BN liner, or a W/Mo/Ta boat; thermal evaporation is available by RFQ.
- Melting Point Constraint: With a melting point of approximately 450°C, the evaporation temperature must be carefully controlled to prevent decomposition or uneven deposition.
- Density Consideration: The material density of 1.81 g/cm³ influences the loading quantity and deposition rate calibration.
- Hardware Verification: Deposition source hardware must be verified before use to ensure compatibility with the material's physical form and size (Pieces, 50 nm).
- Process Route Matching: The evaporation method (E-beam preferred) and process parameters should be matched to the material's behavior and film requirements.
Follow these steps to prepare and use Boron Oxide pieces for thin-film deposition. Ensure compatibility of source hardware and process parameters for optimal film quality.
Required Equipment: E-beam evaporation system with compatible hearth liner, Molybdenum boat (alternative source hardware)
- Confirm hardware compatibility
Confirm that the deposition system uses an E-beam hearth with a compatible liner of graphite, Al2O3, or BN, or a W/Mo/Ta boat. - Load material
Load the Boron Oxide pieces into the source hardware, ensuring even distribution for uniform evaporation. - Set temperature
Set the evaporation temperature to approximately 450°C based on the material's melting point. - Monitor deposition
Monitor the deposition rate and adjust parameters to achieve the desired film thickness and quality.
Why is e-beam evaporation preferred over thermal evaporation for Boron Oxide (B2O3) deposition, and what performance is expected?
E-beam evaporation is preferred for B2O3 because it delivers good performance when using an e-beam hearth with graphite, Al2O3, or BN liner, or a W/Mo/Ta boat. Thermal evaporation is available only by RFQ, indicating it is not the standard route for this material. The melting point of ~450 °C and density of 1.81 g/cm³ influence the process selection, but the source explicitly rates e-beam performance as good.
Which liner or boat materials are compatible with e-beam evaporation of Boron Oxide (B2O3) pieces?
The product description specifies that an e-beam hearth with a graphite, Al2O3, or BN liner is compatible, as well as a tungsten (W), molybdenum (Mo), or tantalum (Ta) boat. For the Sheet2 hardware configuration, molybdenum (Mo) is the indicated material. These options allow researchers to match the crucible or liner to their specific deposition system.
What is the significance of the 99.9% purity and 50 nm piece size for Boron Oxide evaporation material in thin film applications?
The 99.9% purity level ensures minimal contaminant incorporation during deposition, which is critical for research-grade thin film reproducibility. The supplied form of pieces with a 50 nm size range aids in consistent source loading and controlled evaporation in vacuum systems. These specifications directly support high-purity, uniform film growth as required in advanced coating and device fabrication.
Boron Oxide (B2O3) evaporation material in Pieces form with 99.9% purity and 50 nm particle size, suitable for E-beam evaporation with good performance using graphite/Al2O3/BN liners or W/Mo/Ta boats. Note that thermal evaporation requires RFQ and the low melting point demands careful process control.
Positive
- High purity and defined particle size: The 99.9% purity and 50 nm Pieces form enable consistent thin-film deposition and source loading for reproducible results.
- Broad evaporation source compatibility: Compatible with graphite/Al2O3/BN liners and W/Mo/Ta boats, with rated good E-beam performance, providing flexibility in deposition hardware selection.
Trade-offs
- Thermal evaporation requires RFQ: Thermal evaporation is not directly supported and requires a request for quotation, potentially adding lead time and cost for non-E-beam processes.
- Low melting point demands careful control: With a melting point of approximately 450°C, the material requires precise temperature management to avoid premature melting or decomposition during evaporation.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
