Tantalum Nitride TaN Evap Powder 99.9% 150 μm ATOMFAIR®

Price range: $420.00 through $3,900.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

Research-grade TaN evaporation powder, 99.9% purity and 150 μm size, for e-beam thin-film deposition; packs from 25g to 1kg. Order now.

Tantalum Nitride (TaN) Evaporation Material, Powder, 99.9%, 150 µm
Product Type: Compound Evaporation Material
Research-grade laboratory product
Product Overview

Tantalum Nitride (TaN) Evaporation Material, Powder, 99.9%, 150 µm is a research-grade compound evaporation material supplied as Powder with 99.9% material specification and Powder 150 µm size range for vacuum thin-film deposition workflows.

This evaporation material is prepared for laboratory procurement where material identity, purity, physical form, pack size and deposition hardware must be confirmed before ordering. The listed configuration supports selection for E-beam evaporation preferred; RFQ for thermal feasibility using E-beam hearth with compatible liner; high-temperature crucible by RFQ | Sheet2 hardware: – | – | – | – | -.

Available pack sizes are 25g / 100g / 500g / 1kg. Buyers should confirm deposition source geometry, required quantity, certificate requirements and shipment conditions before quotation.

Performance Features
  • Defined material identity: Tantalum Nitride (TaN) for clear procurement and deposition-process matching.
  • Specified physical form: Powder with Powder 150 µm sizing to support source loading and evaporation review.
  • Purity or composition listed as 99.9%, allowing comparison between standard, high-purity and RFQ-controlled grades.
Technical Specifications
Parameter Specification / Available Values
Atomfair Model AF-TANPWD-3N150UM
Material Tantalum Nitride
Formula TaN
Product Type Compound Evaporation Material
Form Powder
Purity / Composition 99.9%
Particle Size / Dimensions Powder 150 µm
Minimum Order Quantity 25g
Available Pack Sizes 25g / 100g / 500g / 1kg
Indicative Price Tiers 25g: USD 420; 100g: USD 1000; 500g: USD 2700; 1kg: USD 3900
Evaporation Source E-beam hearth with compatible liner; high-temperature crucible by RFQ | Sheet2 hardware: – | – | – | – | –
Evaporation Method E-beam evaporation preferred; RFQ for thermal feasibility
Melting Point 3,360
Density 16.3
Z-Ratio **1.00
PROCUREMENT CHECK: Confirm model, purity, form, size range, pack size and deposition-source compatibility before quotation.
DOCUMENTATION REVIEW: Certificate, safety data sheet, shipment condition and export requirements can be reviewed against laboratory use requirements.
APPLICATION MATCHING: Evaporation source hardware and process route should be matched to material behavior, melting point and film requirements.
INQUIRY NOTE: Include the required model, purity, form, size range and quantity when requesting quotation support.
LABORATORY PROCUREMENT SUPPORT
For material selection, deposition-source matching, pack-size confirmation or quotation support, contact our technical sales team.
INQUIRY: inquiry@atomfair.com
Manufacturer: Atomfair LLC
Brand: ATOMFAIR®

This tantalum nitride powder requires e-beam evaporation with a compatible liner or a high-temperature crucible for thermal processing. The deposition source hardware and process parameters must be matched to the material's high melting point and density for consistent film deposition.

  • Deposition Method: E-beam evaporation with a compatible liner is required; high-temperature crucible needed for thermal processes.
  • Source Hardware: The deposition source hardware must be selected to match the material's high melting point and density.
  • Particle Size: The 150 µm powder size affects source loading and requires compatibility verification.
  • Process Matching: Process parameters must be adjusted based on the material's melting point and Z-ratio for consistent film deposition.

What are the advantages of using Tantalum Nitride (TaN) powder with 150 µm particle size for E-beam evaporation compared to other forms?

This TaN powder with 150 µm sizing is specifically prepared for E-beam evaporation, where the particle size facilitates source loading and controlled evaporation. The material has a melting point of 3,360°C, density of 16.3 g/cc, and Z-Ratio of 1.00, all critical for process matching. E-beam evaporation is the preferred method; thermal feasibility requires RFQ.

What deposition source hardware is compatible with this TaN evaporation material?

The TaN powder is intended for use with an E-beam hearth equipped with a compatible liner. For high-temperature applications, a high-temperature crucible is available by RFQ. The evaporation method is E-beam evaporation preferred; thermal feasibility must be confirmed via RFQ. Buyers should confirm deposition source geometry before ordering.

What documentation and safety considerations are required for procuring Tantalum Nitride evaporation powder?

Before procurement, buyers should review the certificate of analysis, safety data sheet (SDS), shipment conditions, and export requirements against laboratory use requirements. The product is a research-grade powder with 99.9% purity, and proper handling according to the SDS is essential.

Tantalum Nitride (TaN) evaporation material in powder form (150 µm, 99.9% purity) is evaluated for E-beam evaporation deposition, with a high melting point of 3,360 °C and density of 16.3 g/cm³, requiring compatible hearth liners and high-temperature crucibles for thermal feasibility.

Positive

  • High purity and defined particle size: 99.9% purity and 150 µm powder form enable consistent evaporation behavior and film stoichiometry for research-grade thin-film deposition.
  • High melting point for robust films: Melting point of 3,360 °C supports deposition of thermally stable tantalum nitride films suitable for diffusion barriers or hard coatings.

Trade-offs

  • E-beam evaporation preferred, thermal limited: Thermal evaporation feasibility requires RFQ confirmation; E-beam with compatible liner is the primary recommended method, restricting process flexibility.
  • High density requires careful source loading: Density of 16.3 g/cm³ may cause powder settling or uneven evaporation rates in standard crucibles, necessitating specialized high-temperature crucibles by RFQ.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).

Package

25g, 100g, 500g, 1kg

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