|
Silicon Nitride (Si3N4) Evaporation Material, Powder, 99.9%, 760 nm
Product Type: Compound Evaporation Material
Research-grade laboratory product
|
|||||||||||||||||||||||||||||||||||||||
|
|||||||||||||||||||||||||||||||||||||||
|
LABORATORY PROCUREMENT SUPPORT
For material selection, deposition-source matching, pack-size confirmation or quotation support, contact our technical sales team.
INQUIRY: inquiry@atomfair.com
|
|||||||||||||||||||||||||||||||||||||||
|
Manufacturer: Atomfair LLC
Brand: ATOMFAIR®
|
This silicon nitride powder requires e-beam evaporation in a compatible hearth liner to prevent crucible contamination. The material's high melting point and Z-ratio demand precise process parameter matching for consistent film deposition.
- Deposition Source Compatibility: Use e-beam evaporation with a compatible liner; thermal evaporation requires RFQ confirmation for high-temperature crucible feasibility.
- Melting Point Consideration: The melting point of 1900°C necessitates a high-temperature crucible and proper thermal management during deposition.
- Density and Z-Ratio Monitoring: The density of 3.44 g/cm³ and Z-ratio of 1.00 influence the deposition rate sensor calibration and film thickness control.
- Particle Size Handling: The 760 nm powder size requires careful loading to avoid clumping and ensure uniform evaporation in the source.
What is the significance of the 760 nm particle size specification for Silicon Nitride powder in e-beam evaporation, and how does it affect source loading and film uniformity?
The 760 nm particle size is specified to ensure consistent powder flow and minimize clogging in e-beam hearths. The narrow size distribution supports predictable evaporation rates and film thickness uniformity. For this 99.9% pure Si3N4 powder, the 760 nm size is optimized for e-beam evaporation with a compatible liner.
Can Silicon Nitride powder be evaporated using thermal evaporation, or is e-beam evaporation strictly required?
While e-beam evaporation is preferred for this 99.9% Si3N4 powder due to its high melting point of 1900°C, thermal evaporation may be feasible by request for quotation (RFQ). The evaporation source must use an e-beam hearth with a compatible liner, or a high-temperature crucible for thermal processes. Users should confirm deposition source geometry and process compatibility before ordering.
Why is the Z-Ratio of 1.00 important for process control when depositing Silicon Nitride films?
A Z-Ratio of 1.00 indicates that the acoustic impedance of Silicon Nitride matches the quartz crystal sensor, allowing direct film thickness monitoring without correction factors. This simplifies process calibration and improves deposition repeatability for the 99.9% pure Si3N4 powder.
This Silicon Nitride (Si3N4) evaporation material in powder form with 99.9% purity and 760 nm particle size is evaluated for E-beam evaporation deposition, requiring careful matching of source hardware and process parameters due to its high melting point of 1,900 °C and density of 3.44 g/cm³.
Positive
- High purity for consistent films: The 99.9% purity specification supports reproducible thin-film stoichiometry and reduces contamination risk in dielectric or passivation layer deposition.
- Defined particle size for loading: The 760 nm powder form facilitates uniform source loading and controlled evaporation behavior in E-beam hearths, aiding process stability.
Trade-offs
- High melting point requires specialized hardware: With a melting point of 1,900 °C, this material necessitates E-beam evaporation with a compatible liner or a high-temperature crucible by RFQ, limiting direct use in standard thermal evaporation systems.
- Powder form requires careful handling: The powder form may generate airborne particulates during transfer, requiring proper ventilation and containment procedures to maintain laboratory safety and prevent cross-contamination.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
