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Silicon Nitride (Si3N4) Evaporation Material, Powder, 99.6%, 760 nm
Product Type: Compound Evaporation Material
Research-grade laboratory product
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LABORATORY PROCUREMENT SUPPORT
For material selection, deposition-source matching, pack-size confirmation or quotation support, contact our technical sales team.
INQUIRY: inquiry@atomfair.com
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Manufacturer: Atomfair LLC
Brand: ATOMFAIR®
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This material requires E-beam evaporation with a compatible liner and high-temperature crucible. Process parameters must be matched to the material's melting point of 1900°C and target film properties.
- Evaporation Method Preference: E-beam evaporation is preferred; thermal evaporation requires RFQ feasibility confirmation.
- Crucible and Liner Requirement: Use a high-temperature crucible suitable for 1900°C with a compatible liner in the E-beam hearth.
- Hardware and Process Matching: Deposition-source hardware and process parameters must be matched to the material's melting point and film requirements.
- Particle Size Consideration: The 760 nm powder size supports source loading and evaporation review, influencing source geometry selection.
Why is e-beam evaporation preferred for Silicon Nitride (Si3N4) powder, and under what conditions can thermal evaporation be considered?
E-beam evaporation is preferred because Si3N4 has a high melting point of 1,900 °C and low vapor pressure, making resistive thermal evaporation inefficient without specialized high-temperature crucibles. The product specifies e-beam hearth with compatible liner as the primary source; thermal feasibility requires a separate RFQ to assess hardware compatibility and process viability, including the need for a high-temperature crucible.
What crucible and liner materials are recommended for evaporating Si3N4 powder at 1,900 °C without contamination?
The product description recommends using an e-beam hearth with a compatible liner, but does not specify the liner material. For thermal evaporation, a high-temperature crucible is required and must be requested via RFQ. Buyers should confirm liner and crucible compatibility (e.g., tungsten, molybdenum, or pyrolytic graphite) with the supplier before ordering to avoid contamination or crucible failure.
How does the 760 nm particle size of Si3N4 powder affect deposition uniformity and source loading in e-beam systems?
The 760 nm particle size influences powder flowability and packing density in the crucible, which can affect evaporation rate stability and film uniformity. Finer powders may require careful tamping or pre-compaction to avoid spitting during e-beam heating. The product's specified 760 nm size is consistent with standard e-beam powder feed, but users should validate source loading with their specific hearth geometry and consider the 3.44 g/cm³ density for mass calculation.
Silicon Nitride (Si3N4) evaporation material in powder form with 99.6% purity and 760 nm particle size, optimized for E-beam evaporation using a compatible hearth liner; requires confirmation of deposition source geometry and high-temperature crucible compatibility for thermal evaporation via RFQ.
Positive
- Defined purity and particle size: 99.6% purity and 760 nm powder sizing enable reproducible deposition process matching and source loading for thin-film workflows.
- Multiple pack size options: Available in 25g, 100g, 500g, and 1kg packs, allowing flexible procurement scaling from R&D to pilot production without re-qualification.
Trade-offs
- E-beam evaporation preferred: Thermal evaporation requires RFQ feasibility assessment; users must verify deposition source hardware compatibility before ordering.
- High-temperature crucible needed: Melting point of 1,900 °C necessitates high-temperature crucible by RFQ for thermal evaporation, adding procurement lead time and cost.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
