Silicon Nitride Evaporation Powder 99.5%, 760 nm ATOMFAIR®

Price range: $420.00 through $3,300.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

Research-grade Si3N4 evaporation powder, 99.5% purity and 760 nm particle size, for E-beam thin-film deposition; 25g-1kg packs. Order now.

Silicon Nitride (Si3N4) Evaporation Material, Powder, 99.5%, 760 nm
Product Type: Compound Evaporation Material
Research-grade laboratory product
Product Overview

Silicon Nitride (Si3N4) Evaporation Material, Powder, 99.5%, 760 nm is a research-grade compound evaporation material supplied as Powder with 99.5% material specification and Powder 760 nm size range for vacuum thin-film deposition workflows.

This evaporation material is prepared for laboratory procurement where material identity, purity, physical form, pack size and deposition hardware must be confirmed before ordering. The listed configuration supports selection for E-beam evaporation preferred; RFQ for thermal feasibility using E-beam hearth with compatible liner; high-temperature crucible by RFQ | Sheet2 hardware: – | – | – | – | -.

Available pack sizes are 25g / 100g / 500g / 1kg. Buyers should confirm deposition source geometry, required quantity, certificate requirements and shipment conditions before quotation.

Performance Features
  • Defined material identity: Silicon Nitride (Si3N4) for clear procurement and deposition-process matching.
  • Specified physical form: Powder with Powder 760 nm sizing to support source loading and evaporation review.
  • Purity or composition listed as 99.5%, allowing comparison between standard, high-purity and RFQ-controlled grades.
Technical Specifications
Parameter Specification / Available Values
Atomfair Model AF-SI3N4PWD-995760NM
Material Silicon Nitride
Formula Si3N4
Product Type Compound Evaporation Material
Form Powder
Purity / Composition 99.5%
Particle Size / Dimensions Powder 760 nm
Minimum Order Quantity 25g
Available Pack Sizes 25g / 100g / 500g / 1kg
Indicative Price Tiers 25g: USD 420; 100g: USD 950; 500g: USD 2500; 1kg: USD 3300
Evaporation Source E-beam hearth with compatible liner; high-temperature crucible by RFQ | Sheet2 hardware: – | – | – | – | –
Evaporation Method E-beam evaporation preferred; RFQ for thermal feasibility
Melting Point 1,900
Density 3.44
Z-Ratio **1.00
PROCUREMENT CHECK: Confirm model, purity, form, size range, pack size and deposition-source compatibility before quotation.
DOCUMENTATION REVIEW: Certificate, safety data sheet, shipment condition and export requirements can be reviewed against laboratory use requirements.
APPLICATION MATCHING: Evaporation source hardware and process route should be matched to material behavior, melting point and film requirements.
INQUIRY NOTE: Include the required model, purity, form, size range and quantity when requesting quotation support.
LABORATORY PROCUREMENT SUPPORT
For material selection, deposition-source matching, pack-size confirmation or quotation support, contact our technical sales team.
INQUIRY: inquiry@atomfair.com
Manufacturer: Atomfair LLC
Brand: ATOMFAIR®

This material requires e-beam evaporation with a compatible liner and high-temperature crucible for processing. Deposition source geometry and material melting point (1900°C) must be matched to avoid film quality issues.

  • Processing Method: Use e-beam evaporation as the preferred method; thermal feasibility requires quotation.
  • Crucible Requirement: High-temperature crucible is required for thermal evaporation and must be specified by RFQ.
  • Compatibility Check: Confirm deposition source geometry and liner compatibility before use.
  • Material Behavior: Material melting point and Z-ratio must be matched to the evaporation process parameters.
  • Particle Size Consideration: Powder form with 760 nm particle size requires appropriate source loading and evaporation review.

What are the melting point and density of this Silicon Nitride powder and how do they influence E-beam deposition parameters?

The melting point is 1,900°C and density is 3.44 g/cm³. These values determine the required E-beam power and the selection of a compatible hearth liner material that can withstand high temperatures without contamination. The powder form (760 nm) also requires careful source loading to ensure consistent evaporation rates.

Can this Si3N4 powder be used in thermal evaporation systems, or is E-beam the only option?

E-beam evaporation is the preferred method. Thermal evaporation feasibility requires a custom request for quotation (RFQ) and the use of a high-temperature crucible. The powder form and 760 nm particle size may affect source loading and evaporation behavior in thermal boats, so process compatibility must be evaluated per application.

What crucible or hearth liner is required for E-beam evaporation of this Si3N4 powder?

The material requires an E-beam hearth with a compatible liner. For high-temperature applications, a high-temperature crucible may be needed, which can be requested via RFQ. The source also advises confirming deposition source geometry and liner compatibility before quotation to ensure proper performance.

Silicon Nitride (Si3N4) evaporation material in powder form (99.5% purity, 760 nm particle size) is evaluated for E-beam evaporation deposition, requiring a compatible hearth liner and high-temperature crucible for thermal processing, with a melting point of 1,900°C and density of 3.44 g/cm³.

Positive

  • Defined material identity and purity: Silicon Nitride (Si3N4) with 99.5% purity enables clear procurement matching for vacuum thin-film deposition workflows, supporting comparison against standard or high-purity grades.
  • Specified particle size for source loading: Powder form with 760 nm sizing facilitates source loading and evaporation review, aiding in deposition-process matching for E-beam evaporation.

Trade-offs

  • E-beam evaporation preferred; thermal feasibility requires RFQ: Evaporation method is E-beam evaporation preferred, with thermal feasibility requiring RFQ, necessitating confirmation of deposition-source compatibility before ordering.
  • High-temperature crucible required for thermal processing: High-temperature crucible is required by RFQ for thermal evaporation, adding infrastructure dependency and procurement lead time for laboratory deployment.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).

Package

25g, 100g, 500g, 1kg

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