Silicon Nitride Evaporation Pieces 99.6% 20-35 nm ATOMFAIR®

Price range: $320.00 through $2,200.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

Research-grade Si3N4 evaporation pieces, 99.6% purity and 20-35 nm size, for E-beam thin-film deposition; packs 25g-1kg. Order now.

Silicon Nitride (Si3N4) Evaporation Material, Pieces, 99.6%, 20-35 nm
Product Type: Compound Evaporation Material
Research-grade laboratory product
Product Overview

Silicon Nitride (Si3N4) Evaporation Material, Pieces, 99.6%, 20-35 nm is a research-grade compound evaporation material supplied as Pieces with 99.6% material specification and Pieces 20-35 nm size range for vacuum thin-film deposition workflows.

This evaporation material is prepared for laboratory procurement where material identity, purity, physical form, pack size and deposition hardware must be confirmed before ordering. The listed configuration supports selection for E-beam evaporation preferred; RFQ for thermal feasibility using E-beam hearth with compatible liner; high-temperature crucible by RFQ | Sheet2 hardware: – | – | – | – | -.

Available pack sizes are 25g / 100g / 500g / 1kg. Buyers should confirm deposition source geometry, required quantity, certificate requirements and shipment conditions before quotation.

Performance Features
  • Defined material identity: Silicon Nitride (Si3N4) for clear procurement and deposition-process matching.
  • Specified physical form: Pieces with Pieces 20-35 nm sizing to support source loading and evaporation review.
  • Purity or composition listed as 99.6%, allowing comparison between standard, high-purity and RFQ-controlled grades.
Technical Specifications
Parameter Specification / Available Values
Atomfair Model AF-SI3N4PCS-9962035NM
Material Silicon Nitride
Formula Si3N4
Product Type Compound Evaporation Material
Form Pieces
Purity / Composition 99.6%
Particle Size / Dimensions Pieces 20-35 nm
Minimum Order Quantity 25g
Available Pack Sizes 25g / 100g / 500g / 1kg
Indicative Price Tiers 25g: USD 320; 100g: USD 650; 500g: USD 1700; 1kg: USD 2200
Evaporation Source E-beam hearth with compatible liner; high-temperature crucible by RFQ | Sheet2 hardware: – | – | – | – | –
Evaporation Method E-beam evaporation preferred; RFQ for thermal feasibility
Melting Point 1,900
Density 3.44
Z-Ratio **1.00
PROCUREMENT CHECK: Confirm model, purity, form, size range, pack size and deposition-source compatibility before quotation.
DOCUMENTATION REVIEW: Certificate, safety data sheet, shipment condition and export requirements can be reviewed against laboratory use requirements.
APPLICATION MATCHING: Evaporation source hardware and process route should be matched to material behavior, melting point and film requirements.
INQUIRY NOTE: Include the required model, purity, form, size range and quantity when requesting quotation support.
LABORATORY PROCUREMENT SUPPORT
For material selection, deposition-source matching, pack-size confirmation or quotation support, contact our technical sales team.
INQUIRY: inquiry@atomfair.com
Manufacturer: Atomfair LLC
Brand: ATOMFAIR®

This material requires specific evaporation source hardware, including an E-beam hearth with a compatible liner or a high-temperature crucible by RFQ, to process the 20–35 nm pieces. The listed melting point, density, and Z-ratio must be verified against the deposition system's capabilities to avoid equipment damage or film defects.

  • Source Compatibility: Use an E-beam hearth with a compatible liner or request a high-temperature crucible via RFQ for thermal evaporation.
  • Evaporation Method: Confirm that E-beam evaporation is available or request a feasibility quote for thermal evaporation.
  • Material Properties: The melting point, density, and Z-ratio must be cross-checked with the deposition system's parameters to ensure proper evaporation.
  • Procurement Verification: Verify the material model, purity, form, size range, and pack size against the deposition source requirements before ordering.
  • Documentation Review: Review the certificate of analysis, safety data sheet, and shipment conditions to confirm compliance with laboratory handling protocols.

What is the Z-ratio of 1.00 for this Si3N4 evaporation material and why does it matter for thin-film deposition monitoring?

The Z-ratio is listed as 1.00, indicating that Silicon Nitride has the same acoustic impedance as the quartz crystal sensor, simplifying thickness monitoring during e-beam evaporation. This eliminates the need for a tooling factor adjustment, making it a straightforward material for process control. The Z-ratio value is a key parameter for accurate film thickness measurement in vacuum deposition systems.

Is this Si3N4 evaporation material compatible with thermal evaporation or only e-beam evaporation?

E-beam evaporation is the preferred method for this Silicon Nitride material, as stated in the product specifications. Thermal evaporation may be feasible but requires a request for quotation (RFQ) to confirm hardware compatibility. The material requires an e-beam hearth with a compatible liner or a high-temperature crucible by RFQ, reflecting its high melting point of 1,900°C.

What crucible or liner material is required to handle the high melting point of Si3N4 during evaporation?

The product specifies that a high-temperature crucible is required, available by RFQ, and an e-beam hearth with a compatible liner is standard. Given the melting point of 1,900°C, standard crucibles may not be suitable, and buyers should confirm hardware compatibility before ordering. The density of 3.44 g/cm³ also influences hearth loading and material behavior during evaporation.

Silicon Nitride (Si3N4) evaporation material in pieces (20-35 nm, 99.6% purity) is optimized for E-beam evaporation using a compatible liner or high-temperature crucible, with a melting point of 1,900°C and density of 3.44 g/cm³, requiring careful source geometry and thermal feasibility confirmation before deployment.

Positive

  • High-purity Si3N4 for thin-film deposition: The 99.6% purity and defined particle size range (20-35 nm pieces) enable consistent evaporation behavior and film stoichiometry for research-grade vacuum deposition workflows.
  • Multiple pack sizes for scalability: Available in 25g, 100g, 500g, and 1kg packs, allowing researchers to match quantity to experimental scale without over-procurement.

Trade-offs

  • E-beam evaporation preferred; thermal limited: The material is specified for E-beam evaporation with a compatible liner; thermal evaporation requires a feasibility RFQ, adding process validation steps for alternative methods.
  • High melting point requires robust hardware: With a melting point of 1,900°C, the material demands high-temperature crucibles or specialized hearth liners, increasing infrastructure and compatibility checks before use.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).

Package

25g, 100g, 500g, 1kg

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