Silicon Nitride Evaporation Pieces 99.6% 760 nm ATOMFAIR®

Price range: $320.00 through $2,200.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

Research-grade Si3N4 evaporation pieces, 99.6% purity and 760 nm size, for E-beam thin-film deposition; 25g-1kg packs. Order now.

Silicon Nitride (Si3N4) Evaporation Material, Pieces, 99.6%, 760 nm
Product Type: Compound Evaporation Material
Research-grade laboratory product
Product Overview

Silicon Nitride (Si3N4) Evaporation Material, Pieces, 99.6%, 760 nm is a research-grade compound evaporation material supplied as Pieces with 99.6% material specification and Pieces 760 nm size range for vacuum thin-film deposition workflows.

This evaporation material is prepared for laboratory procurement where material identity, purity, physical form, pack size and deposition hardware must be confirmed before ordering. The listed configuration supports selection for E-beam evaporation preferred; RFQ for thermal feasibility using E-beam hearth with compatible liner; high-temperature crucible by RFQ | Sheet2 hardware: – | – | – | – | -.

Available pack sizes are 25g / 100g / 500g / 1kg. Buyers should confirm deposition source geometry, required quantity, certificate requirements and shipment conditions before quotation.

Performance Features
  • Defined material identity: Silicon Nitride (Si3N4) for clear procurement and deposition-process matching.
  • Specified physical form: Pieces with Pieces 760 nm sizing to support source loading and evaporation review.
  • Purity or composition listed as 99.6%, allowing comparison between standard, high-purity and RFQ-controlled grades.
Technical Specifications
Parameter Specification / Available Values
Atomfair Model AF-SI3N4PCS-996760NM
Material Silicon Nitride
Formula Si3N4
Product Type Compound Evaporation Material
Form Pieces
Purity / Composition 99.6%
Particle Size / Dimensions Pieces 760 nm
Minimum Order Quantity 25g
Available Pack Sizes 25g / 100g / 500g / 1kg
Indicative Price Tiers 25g: USD 320; 100g: USD 650; 500g: USD 1700; 1kg: USD 2200
Evaporation Source E-beam hearth with compatible liner; high-temperature crucible by RFQ | Sheet2 hardware: – | – | – | – | –
Evaporation Method E-beam evaporation preferred; RFQ for thermal feasibility
Melting Point 1,900
Density 3.44
Z-Ratio **1.00
PROCUREMENT CHECK: Confirm model, purity, form, size range, pack size and deposition-source compatibility before quotation.
DOCUMENTATION REVIEW: Certificate, safety data sheet, shipment condition and export requirements can be reviewed against laboratory use requirements.
APPLICATION MATCHING: Evaporation source hardware and process route should be matched to material behavior, melting point and film requirements.
INQUIRY NOTE: Include the required model, purity, form, size range and quantity when requesting quotation support.
LABORATORY PROCUREMENT SUPPORT
For material selection, deposition-source matching, pack-size confirmation or quotation support, contact our technical sales team.
INQUIRY: inquiry@atomfair.com
Manufacturer: Atomfair LLC
Brand: ATOMFAIR®

This material requires specific E-beam or thermal evaporation hardware and process matching. Pre-quotation verification of deposition source geometry, purity, form, size, and documentation is mandatory.

  • Hardware Compatibility: Use an E-beam hearth with a compatible liner or a high-temperature crucible (by RFQ) for evaporation.
  • Process Matching: Confirm that the evaporation method (E-beam or thermal) aligns with the material's melting point and film requirements.
  • Pre-Quotation Verification: Verify deposition source geometry, purity, form, size range, and pack size before requesting a quotation.
  • Documentation Review: Review the certificate, safety data sheet, shipment conditions, and export requirements for laboratory use.
  • Application Matching: Match the evaporation source hardware and process route to the material behavior, melting point, and desired film properties.

What is the significance of the 760 nm particle size and 99.6% purity for Si3N4 evaporation in e-beam deposition?

The 760 nm particle size (Pieces) is optimized for controlled source loading and consistent evaporation rate in e-beam hearths. The 99.6% purity ensures minimal contamination in thin films, though higher purity grades may be available via RFQ. The product's melting point of 1,900°C and density of 3.44 g/cm³ are standard for Si3N4 evaporation.

Can this Si3N4 evaporation material be used with thermal evaporation, or is it strictly for e-beam?

The product is preferred for e-beam evaporation using a compatible hearth liner. Thermal evaporation feasibility requires a request for quotation (RFQ) and may require a high-temperature crucible. The material's Z-ratio of 1.00 suggests it is compatible with quartz crystal monitoring, but process validation is recommended.

What handling and storage precautions are required for Si3N4 pieces in a laboratory environment?

The product is supplied as research-grade pieces. Buyers should review the safety data sheet and confirm shipment conditions. Storage should be in a dry, inert environment to prevent moisture absorption. The material is brittle; handle with care to avoid fragmentation. Certificate and export requirements should be reviewed against laboratory protocols.

Silicon Nitride (Si3N4) evaporation material in pieces form at 99.6% purity and 760 nm particle size is evaluated for E-beam evaporation deposition, with a melting point of 1,900°C and density of 3.44 g/cm³, requiring compatible hearth liners and high-temperature crucibles for thermal feasibility.

Positive

  • High purity for consistent films: 99.6% purity specification supports reproducible thin-film stoichiometry in vacuum deposition, reducing batch-to-batch variability for research-grade coatings.
  • Defined particle size for source loading: Pieces at 760 nm size range facilitates controlled evaporation rate and uniform source feeding in E-beam hearths, minimizing spitting or uneven melt.

Trade-offs

  • E-beam preferred; thermal limited: Evaporation method is specified as E-beam preferred, with thermal feasibility requiring RFQ and high-temperature crucible, adding process validation steps for alternative deposition routes.
  • High melting point requires robust hardware: Melting point of 1,900°C demands compatible hearth liners and crucible materials, increasing infrastructure requirements and potential for thermal stress on deposition equipment.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).

Package

25g, 100g, 500g, 1kg

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