Nickel Oxide NiO Evaporation Powder 99.5%, 3 μm ATOMFAIR®

Price range: $340.00 through $2,400.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

Research-grade NiO evaporation powder with 99.5% purity and 3 μm particle size for E-beam thin-film deposition; 25g-1kg packs. Order now.

Nickel Oxide (NiO) Evaporation Material, Powder, 99.5%, 3 µm
Product Type: Compound Evaporation Material
Research-grade laboratory product
Product Overview

Nickel Oxide (NiO) Evaporation Material, Powder, 99.5%, 3 µm is a research-grade compound evaporation material supplied as Powder with 99.5% material specification and Powder 3 µm size range for vacuum thin-film deposition workflows.

This evaporation material is prepared for laboratory procurement where material identity, purity, physical form, pack size and deposition hardware must be confirmed before ordering. The listed configuration supports selection for E-beam evaporation preferred; thermal evaporation by RFQ using E-beam hearth with graphite/Al2O3/BN liner or W/Mo/Ta boat | Sheet2 hardware: – | – | – | – | Al2O3.

Available pack sizes are 25g / 100g / 500g / 1kg. Buyers should confirm deposition source geometry, required quantity, certificate requirements and shipment conditions before quotation.

Performance Features
  • Defined material identity: Nickel Oxide (NiO) for clear procurement and deposition-process matching.
  • Specified physical form: Powder with Powder 3 µm sizing to support source loading and evaporation review.
  • Purity or composition listed as 99.5%, allowing comparison between standard, high-purity and RFQ-controlled grades.
Technical Specifications
Parameter Specification / Available Values
Atomfair Model AF-NIOPWD-9953UM
Material Nickel Oxide
Formula NiO
Product Type Compound Evaporation Material
Form Powder
Purity / Composition 99.5%
Particle Size / Dimensions Powder 3 µm
Minimum Order Quantity 25g
Available Pack Sizes 25g / 100g / 500g / 1kg
Indicative Price Tiers 25g: USD 340; 100g: USD 750; 500g: USD 1850; 1kg: USD 2400
Evaporation Source E-beam hearth with graphite/Al2O3/BN liner or W/Mo/Ta boat | Sheet2 hardware: – | – | – | – | Al2O3
Evaporation Method E-beam evaporation preferred; thermal evaporation by RFQ
Melting Point 1,984
Density 6.67
Z-Ratio **1.00
PROCUREMENT CHECK: Confirm model, purity, form, size range, pack size and deposition-source compatibility before quotation.
DOCUMENTATION REVIEW: Certificate, safety data sheet, shipment condition and export requirements can be reviewed against laboratory use requirements.
APPLICATION MATCHING: Evaporation source hardware and process route should be matched to material behavior, melting point and film requirements.
INQUIRY NOTE: Include the required model, purity, form, size range and quantity when requesting quotation support.
LABORATORY PROCUREMENT SUPPORT
For material selection, deposition-source matching, pack-size confirmation or quotation support, contact our technical sales team.
INQUIRY: inquiry@atomfair.com
Manufacturer: Atomfair LLC
Brand: ATOMFAIR®

This Nickel Oxide evaporation material requires specific source hardware and process conditions to achieve reliable thin-film deposition. The powder form and purity grade necessitate careful handling and compatibility verification to avoid contamination and equipment damage.

  • Source Hardware Compatibility: Use E-beam hearth with graphite, Al2O3, or BN liner, or W/Mo/Ta boat for thermal evaporation.
  • Evaporation Method Preference: E-beam evaporation is preferred; thermal evaporation requires RFQ confirmation.
  • Powder Handling: The 3 µm powder form requires careful loading to maintain uniform particle distribution in the source.
  • Temperature Constraints: Melting point at 1984°C necessitates high-temperature source materials and stable power control.
  • Deposition Monitoring: Z-ratio of 1.00 allows direct crystal monitor calibration without correction factor.

Proper preparation and verification steps are required before using this evaporation material in vacuum deposition. Follow these procurement and matching steps to ensure successful integration into the deposition workflow.

Required Equipment: E-beam evaporation source, Graphite/Al2O3/BN liner or W/Mo/Ta boat

  1. Confirm material specifications
    Verify the model, purity, form, particle size, and pack size against the deposition requirements.
  2. Review documentation
    Obtain and review the certificate of analysis, safety data sheet, and shipment conditions for laboratory compliance.
  3. Match source hardware
    Select the appropriate evaporation source liner or boat material based on the recommended hardware list.

Is E-beam or thermal evaporation preferred for NiO powder (3 µm, 99.5%)?

E-beam evaporation is the preferred method for this Nickel Oxide powder due to its high melting point of 1,984 °C. Thermal evaporation is available only by RFQ and requires using an E-beam hearth with a graphite, Al2O3, or BN liner, or a W/Mo/Ta boat.

What does a Z-Ratio of 1.00 indicate for NiO evaporation material?

A Z-Ratio of 1.00 indicates perfect acoustic impedance matching between the evaporant and the quartz crystal sensor, which simplifies film thickness monitoring and eliminates the need for tooling factor corrections. This value is explicitly listed in the product specifications for this NiO powder.

How does the melting point of 1,984 °C affect evaporation source selection for NiO?

The high melting point of 1,984 °C requires the use of refractory liners or boats during evaporation. Compatible source hardware includes graphite, Al2O3, or BN liners for E-beam evaporation, as well as tungsten, molybdenum, or tantalum boats for thermal evaporation by RFQ.

Atomfair's Nickel Oxide (NiO) evaporation material (99.5% purity, 3 µm powder) is designed for E-beam evaporation with a high melting point (1,984°C) and density (6.67 g/cm³), requiring careful source matching and RFQ for thermal evaporation routes.

Positive

  • Defined purity and particle size: 99.5% purity and 3 µm powder size provide a controlled source material for reproducible thin-film deposition in vacuum processes.
  • Flexible deposition source compatibility: Compatible with E-beam evaporation using graphite, Al2O3, or BN liners, and thermal evaporation via W/Mo/Ta boats, enabling adaptation to various lab setups.

Trade-offs

  • High melting point requires robust heating: A melting point of 1,984°C demands high-power E-beam or thermal evaporation systems, potentially increasing energy consumption and equipment wear.
  • Thermal evaporation requires quotation: While E-beam evaporation is standard, thermal evaporation requires a request for quotation, adding lead time and potential custom setup.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).

Package

25g, 100g, 500g, 1kg

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