|
Gallium Nitride (GaN) Evaporation Material, Pieces, 99.4%, 35 µm
Product Type: Compound Evaporation Material
Research-grade laboratory product
|
|||||||||||||||||||||||||||||||||||||
|
|||||||||||||||||||||||||||||||||||||
|
LABORATORY PROCUREMENT SUPPORT
For material selection, deposition-source matching, pack-size confirmation or quotation support, contact our technical sales team.
INQUIRY: inquiry@atomfair.com
|
|||||||||||||||||||||||||||||||||||||
|
Manufacturer: Atomfair LLC
Brand: ATOMFAIR®
|
Gallium Nitride evaporation material requires e-beam deposition with a compatible hearth liner to prevent contamination. The material's melting point of 800°C and density of 6.1 g/cm³ dictate evaporation parameters and source loading.
- Evaporation Source Compatibility: Use e-beam hearth with compatible liner, preferably Al2O3, and confirm crucible material for high-temperature operation.
- Process Parameter Guidance: Melting point of 800°C and density of 6.1 g/cm³ require calibration of e-beam power and deposition rate.
Confirm material specifications and deposition source compatibility before processing. Match the evaporation hardware and process parameters to the material's melting point and film requirements.
Required Equipment: E-beam hearth, High-temperature crucible
- Confirm Material Specifications
Confirm the model, purity, form, size range, pack size, and deposition-source compatibility before placing an order. - Review Documentation
Review the certificate, safety data sheet, shipment conditions, and export requirements against laboratory use requirements. - Match Hardware and Process
Match the evaporation source hardware and process route to the material's melting point and film requirements.
Why is E-beam evaporation preferred over thermal evaporation for this Gallium Nitride (GaN) material, and under what conditions can thermal evaporation be considered?
E-beam evaporation is preferred due to GaN's high melting point (800 °C) and the need to control decomposition during deposition. Thermal evaporation may be feasible only by RFQ, requiring a high-temperature crucible and compatible liner, as the material's density (6.1 g/cm³) and physical form (pieces, 35 µm) further influence source loading and evaporation behavior.
What liner material is compatible with E-beam evaporation of this GaN evaporation material, and is alumina (Al2O3) a suitable option?
Alumina (Al2O3) is listed as a compatible liner material for E-beam hearth evaporation of GaN. For thermal evaporation via RFQ, a high-temperature crucible is required. The product specification explicitly includes Al2O3 in the hardware compatibility list, making it a recommended liner for this 99.4% purity GaN material.
What safety documentation is provided with this GaN evaporation material, and what handling precautions apply to the 35 µm pieces?
A certificate of analysis and safety data sheet (SDS) are available upon request for review against laboratory use requirements. The material is supplied as pieces with a 35 µm dimension, which can generate fine dust; standard precautions for handling fine particulate solids—such as using gloves, eye protection, and working in a fume hood—should be followed as advised in the SDS.
Gallium Nitride (GaN) evaporation material in pieces (99.4% purity, 35 µm) is optimized for E-beam deposition with a melting point of 800°C and density of 6.1 g/cm³, requiring careful source geometry and crucible compatibility for reliable film formation.
Positive
- Defined purity and form: Specified 99.4% purity and 35 µm pieces ensure clear procurement and consistent source loading for vacuum deposition processes.
- E-beam evaporation compatibility: Directly specified for E-beam hearth with compatible liner, with high-temperature crucible options available by RFQ, supporting high-rate deposition of GaN.
Trade-offs
- Pre-quote compatibility check required: Buyer must confirm deposition source geometry, pack size, certificate requirements, and shipment conditions before quotation to avoid process mismatch.
- Thermal evaporation feasibility uncertain: E-beam is preferred; thermal evaporation requires RFQ review, and high-temperature crucible handling is needed due to the 800°C melting point and reactive nature of GaN.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).






