|
Boron Nitride (BN) Evaporation Material, Powder, 99.9%, <250 nm Purity: 99.5%
Product Type: Compound Evaporation Material
Research-grade laboratory product
|
|||||||||||||||||||||||||||||||||||||
|
|||||||||||||||||||||||||||||||||||||
|
LABORATORY PROCUREMENT SUPPORT
For material selection, deposition-source matching, pack-size confirmation or quotation support, contact our technical sales team.
INQUIRY: inquiry@atomfair.com
|
|||||||||||||||||||||||||||||||||||||
|
Manufacturer: Atomfair LLC
Brand: ATOMFAIR®
|
Boron nitride powder for e-beam evaporation requires a compatible liner and high-temperature crucible due to poor e-beam performance. Deposition-source hardware and process route must be matched to the material's melting point and film requirements.
- Evaporation Method Constraint: E-beam evaporation is the preferred method; thermal evaporation feasibility requires an RFQ.
- E-beam Performance: The material exhibits poor e-beam performance, necessitating a compatible liner and high-temperature crucible.
- Source Compatibility: Deposition-source hardware and process route must be matched to the material's melting point and film requirements.
- Procurement Verification: Model, purity, form, size range, pack size, and deposition-source compatibility must be confirmed before quotation.
What is the e-beam evaporation performance rating for Boron Nitride (BN) powder, and what deposition method is recommended?
E-beam evaporation performance for this BN powder is rated as 'Poor'. E-beam evaporation is still listed as the preferred method, but the source advises requesting a quotation (RFQ) to assess thermal evaporation feasibility. An e-beam hearth with a compatible liner is required for e-beam use.
What is the particle size specification and its associated purity for this BN evaporation material?
The particle size is specified as '<250 nm' with a purity of 99.5%, interpreted as 99.5% of particles below 250 nm. The overall material purity is 99.9% for Boron Nitride.
What are the melting point and density of Boron Nitride (BN) evaporation material?
The melting point is approximately 3,000°C and the density is 2.25 g/cm³. These parameters are critical for matching the material to deposition source hardware and process conditions.
Boron Nitride (BN) powder with 99.9% purity and <250 nm particle size is evaluated for thin-film evaporation. While the fine particle size and high purity are advantageous for uniform deposition, the material's poor E-beam performance and high melting point (~3000°C) require specialized hardware and thermal management.
Positive
- High Purity (99.9%): The 99.9% purity ensures minimal contamination in thin-film deposition, critical for reproducible electronic and optical properties.
- Fine Particle Size (<250 nm): The sub-250 nm powder size promotes uniform evaporation and consistent film thickness in vacuum deposition processes.
Trade-offs
- Poor E-beam Evaporation Performance: The material exhibits poor compatibility with standard E-beam evaporation, requiring alternative thermal methods or custom RFQ for feasibility.
- High Melting Point (~3000°C): The extremely high melting point necessitates specialized high-temperature crucibles and robust thermal management, adding infrastructure complexity.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
