Tantalum Nitride TaN Evaporation Powder 99.9% 50μm ATOMFAIR®

Price range: $420.00 through $3,900.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

Research-grade TaN evaporation powder, 99.9% purity and 50μm size, for E-beam thin-film deposition in 25g-1kg packs. Order now.

Tantalum Nitride (TaN) Evaporation Material, Powder, 99.9%, 50 µm
Product Type: Compound Evaporation Material
Research-grade laboratory product
Product Overview

Tantalum Nitride (TaN) Evaporation Material, Powder, 99.9%, 50 µm is a research-grade compound evaporation material supplied as Powder with 99.9% material specification and Powder 50 µm size range for vacuum thin-film deposition workflows.

This evaporation material is prepared for laboratory procurement where material identity, purity, physical form, pack size and deposition hardware must be confirmed before ordering. The listed configuration supports selection for E-beam evaporation preferred; RFQ for thermal feasibility using E-beam hearth with compatible liner; high-temperature crucible by RFQ | Sheet2 hardware: – | – | – | – | -.

Available pack sizes are 25g / 100g / 500g / 1kg. Buyers should confirm deposition source geometry, required quantity, certificate requirements and shipment conditions before quotation.

Performance Features
  • Defined material identity: Tantalum Nitride (TaN) for clear procurement and deposition-process matching.
  • Specified physical form: Powder with Powder 50 µm sizing to support source loading and evaporation review.
  • Purity or composition listed as 99.9%, allowing comparison between standard, high-purity and RFQ-controlled grades.
Technical Specifications
Parameter Specification / Available Values
Atomfair Model AF-TANPWD-3N50UM
Material Tantalum Nitride
Formula TaN
Product Type Compound Evaporation Material
Form Powder
Purity / Composition 99.9%
Particle Size / Dimensions Powder 50 µm
Minimum Order Quantity 25g
Available Pack Sizes 25g / 100g / 500g / 1kg
Indicative Price Tiers 25g: USD 420; 100g: USD 1000; 500g: USD 2700; 1kg: USD 3900
Evaporation Source E-beam hearth with compatible liner; high-temperature crucible by RFQ | Sheet2 hardware: – | – | – | – | –
Evaporation Method E-beam evaporation preferred; RFQ for thermal feasibility
Melting Point 3,360
Density 16.3
Z-Ratio **1.00
PROCUREMENT CHECK: Confirm model, purity, form, size range, pack size and deposition-source compatibility before quotation.
DOCUMENTATION REVIEW: Certificate, safety data sheet, shipment condition and export requirements can be reviewed against laboratory use requirements.
APPLICATION MATCHING: Evaporation source hardware and process route should be matched to material behavior, melting point and film requirements.
INQUIRY NOTE: Include the required model, purity, form, size range and quantity when requesting quotation support.
LABORATORY PROCUREMENT SUPPORT
For material selection, deposition-source matching, pack-size confirmation or quotation support, contact our technical sales team.
INQUIRY: inquiry@atomfair.com
Manufacturer: Atomfair LLC
Brand: ATOMFAIR®

The material requires high-temperature crucible or compatible liner for e-beam evaporation due to its melting point of 3,360°C. The powder size of 50 μm demands careful handling to maintain uniform deposition and prevent source contamination.

  • Deposition Source Compatibility: E-beam evaporation is preferred for this material; thermal feasibility requires RFQ confirmation.
  • Crucible and Liner Requirements: Use an e-beam hearth with a compatible liner, or a high-temperature crucible by RFQ, to withstand the material's high melting point.
  • Powder Handling Constraint: The 50 μm powder form must be loaded into the crucible or liner without spillage to avoid particle ejection during evaporation.
  • Z-Ratio Calibration: The Z-Ratio of 1.00 allows direct quartz crystal monitor calibration without correction for film thickness measurement.
  • Density Influence on Loading: A density of 16.3 g/cm³ should be used to calculate the fill factor and source loading volume for consistent deposition.

Can Tantalum Nitride (TaN) powder with 50 µm particle size be used for thermal evaporation, or is e-beam evaporation required?

E-beam evaporation is the preferred method for this TaN powder according to the product specification. Thermal feasibility requires a formal RFQ (request for quotation). The melting point of 3360 °C, density of 16.3 g/cm³, and Z-ratio of 1.00 influence the process; the powder form and 50 µm sizing may affect thermal evaporation compatibility. Contact technical sales to discuss your specific deposition system requirements.

What crucible or liner material is recommended for evaporating TaN powder in an e-beam system?

The product specification recommends using an e-beam hearth with a compatible liner for standard evaporation. For high-temperature applications, a crucible can be sourced by RFQ. The exact liner material is not specified in the product description; confirm compatibility with your specific e-beam system and liner material by contacting technical sales before ordering.

What safety and storage considerations are required for Tantalum Nitride (TaN) powder with 99.9% purity?

The product description states that a safety data sheet, certificate of analysis, and shipment condition review are available upon request for laboratory use. Store the powder in a dry, sealed container to avoid moisture and contamination. Buyers should confirm export requirements and handling protocols before quotation. No specific storage temperature or hazard statements are provided in the product listing.

Tantalum Nitride (TaN) evaporation powder at 99.9% purity and 50 µm particle size is specified for e-beam evaporation, with a high melting point of 3360°C and density of 16.3 g/cm³. The material requires careful verification of source compatibility and is supplied in pack sizes from 25g to 1kg for research-scale use.

Positive

  • High-purity 99.9% composition: The 99.9% purity minimizes contamination in deposited thin films, critical for research-grade and device-quality applications.
  • Controlled particle size of 50 µm: The powder form with 50 µm particle size facilitates uniform source loading and stable evaporation rates in e-beam systems.

Trade-offs

  • E-beam evaporation preferred: This material is optimized for e-beam evaporation; thermal evaporation requires a feasibility RFQ, limiting direct process compatibility with standard thermal boats.
  • Source geometry verification required: Buyers must confirm deposition source geometry, liner compatibility, and crucible requirements before ordering to ensure proper integration with existing hardware.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).

Package

25g, 100g, 500g, 1kg

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