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Off-Cut Sapphire Substrate – 2 inch (50.8 mm) C/M off-cut 2 degree Single-Side Polished
Product Type: Off-cut sapphire substrate
Research-grade laboratory product
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PRODUCT SELECTION SUPPORT
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E-MAIL: inquiry@atomfair.com
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Manufacturer: Atomfair LLC
Brand: ATOMFAIR®
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How does the 2° off-cut angle on a C/M sapphire substrate affect thin film growth quality?
The 2° off-cut angle on the C/M orientation introduces atomic steps that promote step-flow growth and reduce defect density in epitaxial films. The source specifies a 2° off-cut angle on C/M orientation, which is critical for controlling nucleation and lattice mismatch strain in heteroepitaxy.
What surface roughness specifications make this substrate suitable for epi-ready applications?
The front-side surface is polished to epi-ready condition with Ra <0.3 nm, ensuring a smooth, defect-free surface for epitaxial layer deposition. The back-side is fine ground to Ra <1.2 μm, which provides sufficient handling robustness while maintaining front-side integrity.
What are the critical handling requirements for a single-side polished off-cut sapphire substrate?
The substrate is single-side polished with an epi-ready front surface (Ra <0.3 nm) that requires careful handling to avoid scratches and contamination. The substrate is packaged as 1 piece/set, and standard thickness is 430±25 μm, making it delicate. The back-side is fine ground, so the substrate should be held by edges or using cleanroom-compatible tweezers.
This 2-inch off-cut sapphire substrate features high-purity monocrystalline Al2O3 with epi-ready front-side roughness, making it suitable for epitaxial growth. The single-side polished finish and fixed 2-degree off-cut angle are key application considerations.
Positive
- High-purity monocrystalline Al2O3: Material purity >99.99% ensures minimal contamination for sensitive epitaxial processes.
- Epi-ready front-side roughness: Front-side Ra <0.3 nm provides a surface suitable for direct epitaxial growth without additional preparation.
Trade-offs
- Single-side polished only: Back-side roughness Ra <1.2 um limits use in double-sided optical or thermal management applications.
- Fixed 2-degree off-cut angle: The off-cut angle is fixed at 2 degrees, which may not be optimal for all thin film growth conditions; alternatives require different product selection.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
