96% Alumina Ceramic Substrate, 100 mm x 100 mm x 2 mm, Pack of 10Product Type: Technical ceramic substrate
Research-grade laboratory product
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LABORATORY PROCUREMENT SUPPORT
For model selection, accessory matching, platform compatibility or configuration confirmation, contact our technical sales team.
E-MAIL: inquiry@atomfair.com
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Manufacturer: Atomfair LLC
Brand: ATOMFAIR?
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What is the surface roughness and flexural strength of the 96% alumina ceramic substrate 100 mm x 100 mm x 2 mm?
The substrate has a surface roughness of Ra 0.15–0.30 µm and a flexural strength greater than 350 MPa. These specifications support its use in applications requiring a smooth, high-strength ceramic base for thin-film deposition or precision mounting.
Can this 96% alumina substrate be customized with polishing, coating, or metallization?
Yes, the product description explicitly states that polishing, coating, metallization, or custom-shape options can be confirmed with the supplier when required for the application. This allows integration into specific device architectures or bonding processes.
What are the dielectric and thermal performance limits of this 96% alumina ceramic substrate?
The substrate exhibits a low dielectric constant and low dielectric loss, with a thermal conductivity greater than 24 W/(m·K) and a breakdown voltage of at least 15 kV/mm. These properties make it suitable for high-voltage insulation and moderate heat dissipation in electronic substrates.
The 96% alumina ceramic substrate (AF-MA-C-AL96-S100-P200) offers high flexural strength (>350 MPa), electrical insulation (breakdown voltage ≥15 kV/mm), and thermal conductivity (>24 W/(m·K)), making it suitable for demanding laboratory and thin-film substrate applications, though its surface roughness (Ra 0.15-0.30 µm) may require post-processing for precision metallization.
Positive
- High mechanical and thermal robustness: Flexural strength >350 MPa and thermal conductivity >24 W/(m·K) provide structural stability and heat dissipation under moderate thermal loads, beneficial for power electronics or high-temperature process environments.
- Excellent electrical insulation and chemical stability: Breakdown voltage ≥15 kV/mm ensures reliable electrical isolation, while corrosion resistance and chemical stability support use in aggressive chemical or high-voltage laboratory setups.
Trade-offs
- Surface roughness constraints for thin-film use: As-fired surface roughness of Ra 0.15-0.30 µm may necessitate additional polishing or planarization for applications requiring smooth interfaces, such as thin-film deposition or photolithography.
- Infrastructure requirements for post-processing: Customization options like polishing, coating, or metallization require external processing infrastructure and expertise, adding lead time and cost for application-specific adaptation.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
