Deposition & Thin-Film Materials
All materials you need for CVD, ALD, Sputtering, Evaporation, Substrates
Showing 193–208 of 346 results
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Atomfair High Purity Molybdenum Boat (Type 310, V-Shaped Bottom) – 0.3mm Thickness
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Atomfair High Purity Molybdenum Carbide (Mo2C) Sputtering Target 99.5%
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Atomfair High Purity Molybdenum Disulfide (MoS2) Sputtering Target 99.9% (4N)
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Atomfair High Purity Molybdenum Rod (4N, 99.95%) – Precision Machined
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Atomfair High Purity Molybdenum Trioxide (MoO3) Sputtering Target – 99.9% (3N) Pure
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Atomfair High Purity Neodymium Praseodymium Alloy (NdPr) Lump – 80/20 at% Ratio
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Atomfair High Purity Nickel (Ni) Particles – 2N5 to 5N Grade, Various Sizes
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Atomfair High Purity Nickel (Ni) Sputtering Target – 3N to 5N Grade for Thin Film Deposition
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Atomfair High Purity Nickel Aluminum Alloy Sputtering Target (NiAl, 90/10 wt%, 99.5%)
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Atomfair High Purity Nickel Chromium Alloy (NiCr) Pellets & Discs – 80/20, 90/10, 44/56 wt%/at% (99.9%-99.95%)
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Atomfair High Purity Nickel Chromium Alloy (NiCr) Pellets & Discs for Industrial Applications
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Atomfair High Purity Nickel Chromium Alloy (NiCr8020) Pellets & Discs
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Atomfair High Purity Nickel Chromium Alloy Sputtering Target (NiCr 80:20 wt% & 1:1 at%)
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Atomfair High Purity Nickel Cobalt Chromium Aluminum Yttrium (NiCoCrAlY) Alloy Sputtering Target
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Atomfair High Purity Nickel Iron Alloy (NiFe) Granules – 80/20 & 2/3 Ratio, 99.9% Pure
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Atomfair High Purity Nickel Iron Alloy (NiFe) Granules – 80/20 & 2/3 Ratio, 99.9% Purity