Deposition & Thin-Film Materials
All materials you need for CVD, ALD, Sputtering, Evaporation, Substrates
Showing 177–192 of 346 results
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Atomfair High Purity Iron Sheet (Fe) 99.9% – 100x100x1mm
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Atomfair High Purity Iron-Zirconium Alloy Lump (FeZr, Fe/Zr=1/1 wt%, 4N-5N Purity)
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Atomfair High Purity Lanthanum Fluoride (LaF3) Sputtering Target 99.9% (4N) for Thin Film Deposition
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Atomfair High Purity Lanthanum Titanate (LaTiO3) Sputtering Target, 99.9% (3N)
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Atomfair High Purity Lanthanum-Copper Alloy Lump (LaCu 4/96 wt%) – 4N Copper Base
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Atomfair High Purity Lead (Pb) Powder – 99.9% Pure, 300 Mesh
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Atomfair High Purity Lithium Niobate (LiNbO3) Sputtering Target, 99.9% (3N), 25mm Diameter x 6mm Thickness
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Atomfair High Purity Lithium Tantalate (LiTaO3) Sputtering Target 4N (99.9%) – Various Sizes with Optional Copper Backing
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Atomfair High Purity Lithium Titanate (LiTiO3) Sputtering Target 99.9% (4N)
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Atomfair High Purity Magnesium Oxide (MgO) Crystalline & Sintered Granules – 4N/5N Grade
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Atomfair High Purity Manganese (Mn) Sputtering Target 99.7% – Various Sizes
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Atomfair High Purity Manganese Cobalt Nickel Alloy Sputtering Target (MnCoNi, 99.5%)
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Atomfair High Purity Manganese Powder (99.8%) – 300 Mesh & 500 Mesh
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Atomfair High Purity Manganese Rod (Mn) 99.7% – 12mm Diameter x 50mm Length
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Atomfair High Purity Manganese-Aluminum Alloy Sputtering Target (AlMn 90/10 wt%, 99.5% purity)
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Atomfair High Purity Molybdenum (Mo) Powder, 99.95% (4N), 2-3 Micron Particle Size