Description
High purity Hafnium Carbide (HfC) sputtering target with 99.5% purity, available in both bonded (with copper backing) and unbonded configurations. Ideal for thin film deposition in semiconductor and coating applications. Precision-engineered for consistent performance in vacuum environments.
| Product Type | Purity | Dimensions | Configuration | Packing | Pack Size |
|---|---|---|---|---|---|
| Hafnium Carbide (HfC) Target | 99.5% (2N5) | φ60 × 3mm | Unbonded | Piece | 1 |
| Hafnium Carbide (HfC) Target | 99.5% (2N5) | φ60 × 3mm (bonded to 2mm copper backing) | Bonded | Piece | 1 |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
