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Yttria-Stabilized Zirconia Single Crystal Substrate, (111), DSP (10 pcs/box)
Product Type: YSZ single crystal substrate
Research-grade laboratory product
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LABORATORY PROCUREMENT SUPPORT
For material matching, specification review, model selection or configuration confirmation, contact our technical sales team.
E-MAIL: inquiry@atomfair.com
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Manufacturer: Atomfair LLC
Brand: ATOMFAIR®
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How does the lattice constant of 5.125 Å and cubic structure of the YSZ (111) substrate influence its suitability for epitaxial growth of oxide thin films?
The YSZ (111) substrate has a lattice constant of 5.125 Å and cubic crystal structure, which are critical parameters for epitaxial matching. The high purity (99.99%) and low surface roughness (<5 Å) ensure minimal defect nucleation. The orientation tolerance of ±0.5° provides precise alignment for thin-film deposition.
What are the available size options and thickness for the YSZ (111) DSP substrate, and how do they affect experimental setup?
The YSZ (111) DSP substrate is available in two sizes: 10×10×0.5 mm and 5×5×0.5 mm, both with a thickness of 0.5 mm. The smaller size may be suited for high-throughput screening or limited-space chambers, while the larger area supports more extensive device fabrication. The 0.5 mm thickness provides adequate mechanical stability for typical handling and thermal contact in deposition systems.
What is the surface finish specification (DSP) for the YSZ (111) substrate, and why is it important for thin-film applications?
DSP stands for double-side polished, yielding a surface roughness of less than 5 Å as specified. This ultra-smooth finish is essential for reducing scattering and ensuring uniform film nucleation in epitaxial deposition. Combined with the (111) orientation and ±0.5° tolerance, the polished surfaces enable high-quality interfaces and reproducible device performance.
The Atomfair YSZ (111) single crystal substrate combines 99.99% purity, <5Å surface roughness, and a cubic lattice constant of 5.125Å, making it suitable for high-quality epitaxial thin-film growth of complex oxides requiring thermal stability up to 2800°C.
Positive
- High purity and low roughness: 99.99% crystal purity and surface roughness <5Å enable high-quality epitaxial interfaces for thin-film deposition.
- Exceptional thermal stability: Melting point of 2800°C and thermal expansion coefficient of 10.3×10⁻⁶/°C support high-temperature processing without substrate degradation.
Trade-offs
- Orientation tolerance of ±0.5°: The (111) orientation tolerance may require precise alignment verification for applications demanding exact crystallographic orientation.
- Limited standard size options: Only two available sizes (10×10×0.5 mm and 5×5×0.5 mm) may necessitate custom ordering for non-standard substrate dimensions.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
