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Sapphire Substrate – 2 inch (50.8 mm) C-Plane Single-Side Polished
Product Type: Sapphire substrate
Research-grade laboratory product
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PRODUCT SELECTION SUPPORT
For model selection, material matching or specification support, contact our technical sales team.
E-MAIL: inquiry@atomfair.com
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Manufacturer: Atomfair LLC
Brand: ATOMFAIR®
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Why is this 2-inch C-plane sapphire substrate single-side polished instead of double-side polished?
Single-side polishing reduces cost and processing time while maintaining the required epi-ready front surface (Ra <0.3 nm) for epitaxial deposition. The back side is fine ground to Ra <1.2 μm, which provides sufficient mechanical stability and handling durability without the expense of a second polish.
What is the purpose of the A-plane 16 mm primary flat on this sapphire substrate?
The A-plane 16 mm primary flat indicates the crystallographic orientation and is used for wafer alignment during photolithography, deposition, and other processing steps. This flat ensures consistent orientation across wafers in automated equipment, which is critical for device fabrication.
How should the epi-ready front surface of this substrate be handled to avoid damage?
The front surface has a roughness of Ra <0.3 nm (epi-ready) and must be protected from scratches, particles, and contamination. Use cleanroom gloves, vacuum tweezers, and a clean storage container. The back side, with fine ground finish (Ra <1.2 μm), is more robust and can be handled with less caution.
This 2-inch C-plane sapphire substrate provides >99.99% high-purity monocrystalline Al2O3 with an epi-ready front-side roughness (Ra <0.3 nm) and tight geometric tolerances (TTV, BOW, WARP <10 μm), making it suitable for epitaxial growth. The single-side polished surface limits back-side finish to fine ground (Ra <1.2 μm), which may require additional processing for double-side applications.
Positive
- High-purity monocrystalline Al2O3: Material purity >99.99% ensures minimal contamination for sensitive epitaxial and device fabrication processes.
- Epi-ready front-side surface: Front-side roughness Ra <0.3 nm meets epi-ready standards, enabling direct use for thin-film deposition without additional polishing.
Trade-offs
- Single-side polished back surface: Back side is fine ground with Ra <1.2 μm, not polished; applications requiring double-side polish or optical back-side quality will need additional processing.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
