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Silicon Nitride (Si3N4) Evaporation Material, Pieces, 99.5%, 20-35 nm
Product Type: Compound Evaporation Material
Research-grade laboratory product
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LABORATORY PROCUREMENT SUPPORT
For material selection, deposition-source matching, pack-size confirmation or quotation support, contact our technical sales team.
INQUIRY: inquiry@atomfair.com
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Manufacturer: Atomfair LLC
Brand: ATOMFAIR®
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This material requires E-beam evaporation with a compatible liner and high-temperature crucible. Process route must be matched to material behavior and film requirements.
- Evaporation Source Compatibility: Use an E-beam hearth with a compatible liner, and high-temperature crucible by RFQ.
- Processing Method: E-beam evaporation is preferred, and thermal feasibility requires RFQ confirmation.
- Material Matching: Match the evaporation source hardware and process route to the material's melting point and film requirements.
What is the advantage of the 20–35 nm particle size range for Si₃N₄ evaporation material?
The 20–35 nm particle size ensures controlled source loading and consistent evaporation behavior in E-beam deposition. The product description states that the specified sizing supports "source loading and evaporation review," enabling uniform melting and vaporization when used with an E-beam hearth and compatible liner.
Can this Si₃N₄ evaporation material be used with thermal evaporation, or is it only for E-beam?
E-beam evaporation is the preferred method, but thermal feasibility is available by RFQ (request for quotation). The product description explicitly notes "E-beam evaporation preferred; RFQ for thermal feasibility" and, for thermal processes, a high-temperature crucible may be required, also by RFQ.
What are the key pre-order procurement checks for this Si₃N₄ evaporation material?
Buyers must confirm deposition source geometry, required quantity, certificate requirements, and shipment conditions before quotation. The product includes a designated "PROCUREMENT CHECK" to verify model, purity, form, size range, and deposition-source compatibility, and recommends review of the certificate, safety data sheet, and shipment/export conditions against laboratory use requirements.
Silicon Nitride (Si3N4) evaporation material in pieces form with 99.5% purity and 20-35 nm particle size is specified for E-beam evaporation using a compatible liner or high-temperature crucible, with a melting point of 1,900°C and density of 3.44 g/cm³, requiring careful deposition-source matching and thermal feasibility review for laboratory thin-film applications.
Positive
- High-purity compound for thin films: 99.5% purity and defined Si3N4 composition enable consistent film stoichiometry in E-beam evaporation, supporting research-grade dielectric or passivation layer deposition.
- Controlled particle size for source loading: Pieces sized 20-35 nm facilitate uniform packing in E-beam hearths, reducing void formation and improving evaporation rate stability during deposition runs.
Trade-offs
- E-beam preferred; thermal requires RFQ: Thermal evaporation feasibility is not guaranteed and requires a request for quotation, adding lead time and process validation steps for alternative deposition methods.
- High melting point limits crucible options: With a melting point of 1,900°C, the material necessitates high-temperature crucibles or compatible liners, increasing hardware cost and procurement complexity for standard E-beam systems.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
