Two-Dimensional Materials Growth System 1200°C 4kW

$6,500.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

TD-1200-2I two-dimensional growth system with dual 230 mm heating zones, 100–1100 °C working range, 1200 °C maximum, and 4 kW rated power for CVD workflows.

SKU: AF-TD-T-1200-2DMG-002I
Category:
Brands:

Advanced Multi-Function Two-Dimensional Materials Growth System, Dual 230 mm Heating Zones, 1200 °C
TWO-DIMENSIONAL MATERIAL GROWTH EQUIPMENT
Product Overview

Advanced Multi-Function Two-Dimensional Materials Growth System, Dual 230 mm Heating Zones, 1200 °C is configured for two-dimensional material growth and low-vacuum CVD-style laboratory preparation workflows.

This product is distinguished by advanced multi-function two-dimensional growing system and its process-specific configuration.

Confirm the tube size, heating-zone layout, gas-flow range, vacuum pump package, temperature-control configuration and accessories before quotation.

Technical Specifications
Parameter Specification / Available Values
Atomfair Model TD-1200-2I
Product Family Advanced Multi-Function Two-Dimensional Growing System
Tube Size Outer diameter 50 mm, optional.
Heating Zone Length 230 mm + 230 mm.
Constant Zone Length 80 mm + 80 mm, ±1 °C.
Working Temperature 100-1100 °C.
Maximum Temperature 1200 °C.
Rated Power 4 kW.
Gas Flow Range 100 sccm, 200 sccm and 500 sccm nitrogen options.
Configuration Highlights
  • Two independent sliding temperature-control sections provide two quick heating and cooling positions.
  • Vertical vacuum-flange structure and multi-joint layout support flexible configuration changes.
  • Aircraft-aluminum flange support is designed for installation convenience and corrosion resistance.
APPLICATION SCOPE: Thin-film deposition, two-dimensional material growth, semiconductor-material preparation and atmosphere-controlled laboratory process development.
PACKAGING: The equipment is prepared with protective inner materials and reinforced outer packaging for handling, storage and delivery.
IMPORTANT NOTICE: Please confirm tube size, heating-zone arrangement, gas-flow channels, vacuum pump package, power supply and required accessories before quotation.
LABORATORY PROCUREMENT SUPPORT
For model selection, configuration matching, power supply confirmation or quotation review, contact our technical sales team.
E-MAIL: inquiry@atomfair.com
Manufacturer: Atomfair LLC
Brand: ATOMFAIR®

What is the constant zone temperature uniformity for the TD-1200-2I dual-zone two-dimensional material growth system?

Each of the two 230 mm heating zones provides a constant zone length of 80 mm with a temperature uniformity of ±1 °C. This specification is critical for achieving uniform thin-film deposition and two-dimensional material growth across the substrate within the constant zone.

Can the gas flow range be configured for different precursor chemistries in this CVD system?

Yes, the system offers nitrogen-based gas flow options of 100 sccm, 200 sccm, and 500 sccm, which must be confirmed before quotation. This flexibility allows the user to select a mass flow controller range appropriate for the specific precursor delivery rates required in low-vacuum CVD-style two-dimensional material growth processes.

What infrastructure considerations are required for installing the TD-1200-2I with dual sliding heating zones?

The system requires a 4 kW power supply and confirmation of tube size (outer diameter 50 mm optional), heating-zone layout, gas-flow channels, and vacuum pump package before installation. The vertical vacuum-flange structure and multi-joint layout support flexible configuration changes, but the aircraft-aluminum flange support and sliding sections demand adequate laboratory bench space and clearance for the two independent quick heating and cooling positions.

The TD-1200-2I two-dimensional material growth system features dual independent 230 mm heating zones with sliding temperature control for rapid thermal cycling, but its 1100 °C working limit and nitrogen-only gas flow options impose constraints on high-temperature and multi-gas applications.

Positive

  • Dual independent sliding temperature zones: Two independent 230 mm heating zones with sliding capability enable rapid heating and cooling at separate positions, providing flexible process control for two-dimensional material growth.
  • Corrosion-resistant aircraft-aluminum flange support: The vertical vacuum flange uses aircraft-aluminum supports designed for corrosion resistance and ease of installation, enhancing long-term durability in reactive environments.

Trade-offs

  • Limited maximum working temperature: Working temperature range is 100-1100 °C with a maximum of 1200 °C, which may not be sufficient for high-temperature synthesis processes exceeding 1100 °C.
  • Restricted gas flow options: Gas flow is limited to nitrogen with selectable rates of 100, 200, or 500 sccm, constraining processes that require higher flow rates or alternative gas chemistries.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).