Magnetic Push-Pull 2D Materials System 1200°C

$6,500.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

Magnetic push-pull 2D materials preparation system with double-zone heating, 1200 °C maximum, 1100 °C working temperature and 5 kW rated power. Order now.

SKU: AF-TD-T-1200-MAGP-002L
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Magnetic Push-Pull Two-Dimensional Materials Preparation System, Double-Zone 1200 °C
TWO-DIMENSIONAL MATERIAL GROWTH EQUIPMENT
Product Overview

Magnetic Push-Pull Two-Dimensional Materials Preparation System, Double-Zone 1200 °C is configured for two-dimensional material growth and low-vacuum CVD-style laboratory preparation workflows.

This product is distinguished by magnetic push-pull type two-dimensional preparation equipment and its process-specific configuration.

Confirm the tube size, heating-zone layout, gas-flow range, vacuum pump package, temperature-control configuration and accessories before quotation.

Technical Specifications
Parameter Specification / Available Values
Atomfair Model TD-1200-2L
Product Family Magnetic Push-Pull Type Two-Dimensional Preparation Equipment
Rated Power 5 kW.
Maximum Temperature 1200 °C.
Working Temperature 1100 °C.
Maximum Heating/Cooling Rate 10 °C/min.
Tube Size High-purity quartz tube, 50 mm x 1000 mm; customized tube options should be confirmed.
Heating Zone Length 200 mm + 200 mm.
Constant Zone Length 200 mm.
Configuration Highlights
  • Magnetic pull-rod configuration supports timed movement of solid source into the heating zone.
  • Quartz boat and built-in thermocouple arrangement helps coordinate sulfur-source timing during growth.
  • The double-zone sulfur-furnace configuration is intended for two-dimensional compound material preparation.
APPLICATION SCOPE: Thin-film deposition, two-dimensional material growth, semiconductor-material preparation and atmosphere-controlled laboratory process development.
PACKAGING: The equipment is prepared with protective inner materials and reinforced outer packaging for handling, storage and delivery.
IMPORTANT NOTICE: Please confirm tube size, heating-zone arrangement, gas-flow channels, vacuum pump package, power supply and required accessories before quotation.
LABORATORY PROCUREMENT SUPPORT
For model selection, configuration matching, power supply confirmation or quotation review, contact our technical sales team.
E-MAIL: inquiry@atomfair.com
Manufacturer: Atomfair LLC
Brand: ATOMFAIR®

The system operates at temperatures up to 1200 °C with a maximum heating/cooling rate of 10 °C/min to prevent thermal shock to the quartz tube. The double-zone configuration requires precise coordination of source timing and vacuum level for successful two-dimensional material growth.

  • Temperature Limit: The maximum operating temperature is 1200 °C with a recommended working temperature of 1100 °C.
  • Heating Rate Limit: The maximum heating and cooling rate is 10 °C/min to avoid thermal stress on the quartz tube.
  • Tube Material Constraint: The system uses a high-purity quartz tube (50 mm x 1000 mm) that is susceptible to thermal and mechanical shock.
  • Vacuum Requirement: The system is intended for low-vacuum CVD processes and requires a compatible vacuum pump package to be confirmed before operation.
  • Source Timing Coordination: The magnetic push-pull mechanism supports timed movement of the solid source into the heating zone, requiring precise coordination with the double-zone temperature profile.

What is the maximum working temperature and heating rate for the Atomfair TD-1200-2L magnetic push-pull two-dimensional materials preparation system?

The system has a maximum temperature of 1200 °C and a recommended working temperature of 1100 °C, with a maximum heating and cooling rate of 10 °C/min. These parameters are specified for the double-zone configuration using a high-purity quartz tube (50 mm x 1000 mm) and a rated power of 5 kW.

How does the magnetic push-pull mechanism and double-zone furnace configuration support two-dimensional material growth?

The magnetic pull-rod enables timed movement of a solid source into the heating zone, while the quartz boat and built-in thermocouple coordinate sulfur-source timing during growth. The double-zone sulfur-furnace layout (200 mm + 200 mm heating zones, 200 mm constant zone) is specifically designed for two-dimensional compound material preparation, such as thin-film deposition and semiconductor-material synthesis under low-vacuum CVD conditions.

What are the key configuration parameters that must be confirmed before purchasing this system?

Before quotation, the tube size, heating-zone layout, gas-flow range, vacuum pump package, temperature-control configuration, and required accessories must be confirmed. The standard tube is a high-purity quartz tube (50 mm x 1000 mm), but customized options are available. The system operates at 5 kW rated power and requires appropriate power supply and protective packaging for handling and delivery.

This double-zone 1200°C system integrates magnetic push-pull source delivery for precise timing in two-dimensional material CVD growth, with a dedicated sulfur-furnace zone for compound preparation.

Positive

  • Magnetic push-pull source delivery: Magnetic pull-rod enables timed movement of solid source into the heating zone, allowing precise control of precursor introduction during two-dimensional material growth.
  • Double-zone sulfur furnace configuration: Dedicated double-zone layout with separate heating zones for sulfur source and substrate is specifically designed for two-dimensional compound semiconductor preparation.

Trade-offs

  • Working temperature limited to 1100°C: The maximum working temperature is 1100°C, constraining sustained operation below the 1200°C peak, which may limit high-temperature applications.
  • Requires pre-quotation configuration confirmation: Tube size, heating-zone layout, gas-flow range, vacuum pump, and accessories must be confirmed before ordering, adding lead time and requiring buyer specification.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).