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Magnetic Push-Pull Two-Dimensional Materials Preparation System, Double-Zone 1200 °C

Magnetic Push-Pull Two-Dimensional Materials Preparation System, Double-Zone 1200 °C

$6,500.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

Magnetic Push-Pull Two-Dimensional Materials Preparation System, Double-Zone 1200 °C is configured for two-dimensional material growth and low-vacuum CVD-style laboratory preparation workflows. This product is distinguished by magnetic push-pull type two-dimensional preparation equipment and its process-specific configuration.

SKU: AF-TD-T-1200-MAGP-002L
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Magnetic Push-Pull Two-Dimensional Materials Preparation System, Double-Zone 1200 °C
TWO-DIMENSIONAL MATERIAL GROWTH EQUIPMENT
Product Overview

Magnetic Push-Pull Two-Dimensional Materials Preparation System, Double-Zone 1200 °C is configured for two-dimensional material growth and low-vacuum CVD-style laboratory preparation workflows.

This product is distinguished by magnetic push-pull type two-dimensional preparation equipment and its process-specific configuration.

Confirm the tube size, heating-zone layout, gas-flow range, vacuum pump package, temperature-control configuration and accessories before quotation.
Technical Specifications
Parameter Specification / Available Values
Atomfair Model TD-1200-2L
Product Family Magnetic Push-Pull Type Two-Dimensional Preparation Equipment
Rated Power 5 kW.
Maximum Temperature 1200 °C.
Working Temperature 1100 °C.
Maximum Heating/Cooling Rate 10 °C/min.
Tube Size High-purity quartz tube, 50 mm x 1000 mm; customized tube options should be confirmed.
Heating Zone Length 200 mm + 200 mm.
Constant Zone Length 200 mm.
Configuration Highlights
  • Magnetic pull-rod configuration supports timed movement of solid source into the heating zone.
  • Quartz boat and built-in thermocouple arrangement helps coordinate sulfur-source timing during growth.
  • The double-zone sulfur-furnace configuration is intended for two-dimensional compound material preparation.
APPLICATION SCOPE: Thin-film deposition, two-dimensional material growth, semiconductor-material preparation and atmosphere-controlled laboratory process development.
PACKAGING: The equipment is prepared with protective inner materials and reinforced outer packaging for handling, storage and delivery.
IMPORTANT NOTICE: Please confirm tube size, heating-zone arrangement, gas-flow channels, vacuum pump package, power supply and required accessories before quotation.
LABORATORY PROCUREMENT SUPPORT
For model selection, configuration matching, power supply confirmation or quotation review, contact our technical sales team.
E-MAIL: inquiry@atomfair.com
Manufacturer: Atomfair LLC
Brand: ATOMFAIR®

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).

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