Indium Tin Oxide ITO Powder 99.99% 18-73 nm ATOMFAIR®

Price range: $310.00 through $2,100.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

99.99% research-grade indium tin oxide (In2O3/SnO2 90/10wt%) evaporation powder, 18-73 nm, for e-beam or thermal evaporation; 25g-1kg packs. Order now.

Indium Tin Oxide (In2O3/SnO2 90/10wt%) Evaporation Material, Powder, 99.99%, 18-73 nm
Product Type: Alloy Evaporation Material
Research-grade laboratory product
Product Overview

Indium Tin Oxide (In2O3/SnO2 90/10wt%) Evaporation Material, Powder, 99.99%, 18-73 nm is a research-grade alloy evaporation material supplied as Powder with 99.99% material specification and Powder 18-73 nm size range for vacuum thin-film deposition workflows.

This evaporation material is prepared for laboratory procurement where material identity, purity, physical form, pack size and deposition hardware must be confirmed before ordering. The listed configuration supports selection for E-beam evaporation or thermal evaporation by RFQ using Graphite/Al2O3/BN crucible or e-beam hearth with compatible liner | Sheet hardware: Graphite | – | – | – | -.

Available pack sizes are 25g / 100g / 500g / 1kg. Buyers should confirm deposition source geometry, required quantity, certificate requirements and shipment conditions before quotation.

Performance Features
  • Defined material identity: Indium Tin Oxide (In2O3/SnO2 90/10wt%) for clear procurement and deposition-process matching.
  • Specified physical form: Powder with Powder 18-73 nm sizing to support source loading and evaporation review.
  • Purity or composition listed as 99.99%, allowing comparison between standard, high-purity and RFQ-controlled grades.
Technical Specifications
Parameter Specification / Available Values
Atomfair Model AF-IN2O3SNO29PWD-4N1873NM
Material Indium Tin Oxide
Formula In2O3/SnO2 90/10wt%
Product Type Alloy Evaporation Material
Form Powder
Purity / Composition 99.99%
Particle Size / Dimensions Powder 18-73 nm
Minimum Order Quantity 25g
Available Pack Sizes 25g / 100g / 500g / 1kg
Indicative Price Tiers 25g: USD 310; 100g: USD 650; 500g: USD 1650; 1kg: USD 2100
Evaporation Source Graphite/Al2O3/BN crucible or e-beam hearth with compatible liner | Sheet hardware: Graphite | – | – | – | –
Evaporation Method E-beam evaporation or thermal evaporation by RFQ
Melting Point 1,800
PROCUREMENT CHECK: Confirm model, purity, form, size range, pack size and deposition-source compatibility before quotation.
DOCUMENTATION REVIEW: Certificate, safety data sheet, shipment condition and export requirements can be reviewed against laboratory use requirements.
APPLICATION MATCHING: Evaporation source hardware and process route should be matched to material behavior, melting point and film requirements.
INQUIRY NOTE: Include the required model, purity, form, size range and quantity when requesting quotation support.
LABORATORY PROCUREMENT SUPPORT
For material selection, deposition-source matching, pack-size confirmation or quotation support, contact our technical sales team.
INQUIRY: inquiry@atomfair.com
Manufacturer: Atomfair LLC
Brand: ATOMFAIR®

This powder is sensitive to moisture and atmospheric contamination, which can alter its evaporation behavior and film stoichiometry. Storage in a dry, inert atmosphere is required to maintain particle integrity and prevent agglomeration.

  • Moisture Sensitivity: Exposure to ambient humidity may cause particle caking or surface hydration, compromising evaporation uniformity.
  • Crucible Compatibility: Use only graphite, alumina, or boron nitride crucibles or e-beam hearths with compatible liners to avoid chemical reaction or contamination at high temperature.
  • Melting Point Constraint: The 1,800 °C melting point requires evaporation source hardware capable of sustained high-temperature operation without degradation.

This procedure describes the safe loading and evaporation of ITO powder using e-beam or thermal evaporation. Proper source preparation and chamber conditions are critical to achieve consistent film composition.

Required Equipment: Graphite, Al2O3, or BN crucible or e-beam hearth with compatible liner, Vacuum deposition chamber with base pressure below 1e-5 Torr, Inert gas glovebox or dry nitrogen purge station

  1. Prepare Powder
    Transfer the ITO powder from its sealed container to the crucible inside a dry inert atmosphere to prevent moisture adsorption.
  2. Load Crucible
    Fill the crucible or e-beam hearth to no more than two-thirds of its volume to allow for thermal expansion and outgassing.
  3. Evacuate Chamber
    Pump the deposition chamber to a base pressure below 1e-5 Torr to minimize residual gas incorporation into the film.
  4. Preheat Source
    Apply a gradual ramp of electron beam or thermal power to outgas the powder without causing sudden spitting or particle ejection.
  5. Deposit Film
    Increase power to achieve a stable evaporation rate between 0.5 and 2.0 Å/s while monitoring film thickness with a quartz crystal microbalance.
  6. Cool and Vent
    Allow the crucible to cool below 100 °C before venting the chamber to avoid oxidation of the remaining material.

What is the significance of the 18-73 nm particle size range for ITO powder in evaporation applications, and how does it influence film uniformity and stoichiometry?

The 18-73 nm particle size range is specified for the powder form to ensure controlled evaporation behavior. Finer nanoparticles (18 nm) offer higher surface area and can lead to more uniform film deposition, but may also increase the risk of agglomeration. The specified range (18-73 nm) allows for consistent source loading and evaporation rate control, which is critical for maintaining the desired 90/10 wt% In2O3/SnO2 stoichiometry in the deposited film. The product's 99.99% purity further ensures minimal contamination, preserving the electrical and optical properties of the ITO layer.

Which crucible or liner materials are recommended for the evaporation of this ITO powder, and are there specific constraints for e-beam versus thermal evaporation?

The product description specifies that the ITO powder can be used with Graphite, Al2O3, or BN crucibles, or an e-beam hearth with a compatible liner. The sheet hardware is specifically Graphite. For e-beam evaporation, a graphite liner is typically used to avoid contamination. For thermal evaporation, an Al2O3 or BN crucible is recommended. The melting point of 1,800 °C requires that the crucible material withstands high temperatures without reacting with the ITO. The evaporation method (e-beam or thermal) should be selected based on the required film properties and deposition rate, and must be confirmed by RFQ for the specific hardware configuration.

What pre-purchase checks are necessary to ensure this ITO powder is compatible with my existing evaporation system?

Before ordering, you must confirm the following: model (AF-IN2O3SNO29PWD-4N1873NM), purity (99.99%), form (Powder), particle size range (18-73 nm), pack size (25g, 100g, 500g, or 1kg), and deposition-source compatibility. The evaporation source hardware must match the recommended crucible or liner materials (Graphite, Al2O3, BN, or e-beam hearth with compatible liner, with sheet hardware of Graphite). The product supports both e-beam and thermal evaporation, but the exact method and hardware configuration should be reviewed via RFQ. Additionally, review the certificate, safety data sheet, shipment conditions, and export requirements to ensure the material meets your laboratory's handling and regulatory standards.

This Indium Tin Oxide (In2O3/SnO2 90/10wt%) evaporation material is supplied as a 99.99% pure powder with a particle size range of 18-73 nm, optimized for e-beam or thermal evaporation in vacuum thin-film deposition. The high melting point of 1,800°C and specified crucible compatibility (Graphite/Al2O3/BN) define clear infrastructure requirements for lab deployment.

Positive

  • High purity and defined composition: The 99.99% purity and fixed 90/10wt% In2O3/SnO2 ratio ensure consistent film stoichiometry and reduce batch-to-batch variability in optical and electrical properties for transparent conductive oxide applications.
  • Nanoscale particle size for evaporation: The 18-73 nm powder form facilitates uniform source loading and controlled evaporation rates in e-beam or thermal processes, supporting reproducible thin-film thickness and morphology.

Trade-offs

  • High melting point requires robust hardware: With a melting point of 1,800°C, the material demands compatible crucible materials (Graphite, Al2O3, or BN) and high-temperature e-beam or thermal evaporation systems, limiting use to labs with appropriate deposition infrastructure.
  • Powder form requires careful handling: The nanoscale powder is prone to airborne dispersion and moisture adsorption, necessitating controlled storage in inert or dry conditions and proper safety protocols during loading to avoid contamination or inhalation.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).

Package

25g, 100g, 500g, 1kg

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