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Five-Zone High-Vacuum CVD System 1200 °C

Five-Zone High-Vacuum CVD System 1200 °C

$15,000.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

Five-zone high-vacuum CVD system for thin-film deposition and 2D material growth, with a 1200 °C temperature class and 100-500 sccm gas-flow options.

SKU: AF-CV-C-1200-657F-001R
Category:
Brands:

Five-Zone High-Vacuum CVD System, 1200 °C
CHEMICAL VAPOR DEPOSITION EQUIPMENT
Product Overview

Five-Zone High-Vacuum CVD System, 1200 °C is configured for chemical vapor deposition and controlled-atmosphere materials processing in laboratory R&D workflows.

The product identity is distinguished by its 1200 °C temperature class and process configuration.

Confirm the usable tube size, heating-zone layout, gas-flow range, vacuum package, RF power where applicable and power supply before quotation.
Technical Specifications
Parameter Specification / Available Values
Atomfair Model CV-1200-1R
Product Family CVD and related standard thermal-processing equipment
Temperature Class 1200 °C
Gas Flow Range 100 sccm, 200 sccm and 500 sccm options are shown in the updated standard-equipment manual.
Atmosphere/Vacuum Package Gas supply, vacuum and tube-furnace configuration should be confirmed by quotation.
Process Use CVD, thin-film preparation and controlled-atmosphere material growth.
Configuration Highlights
  • Latest standard-equipment brochure reviewed for CVD-family replacement and naming consistency.
  • The public product name keeps Atomfair branding and uses temperature, zone count or process role to distinguish similar CVD systems.
  • Factory model strings and supplier branding are kept out of public title and HTML.
APPLICATION SCOPE: Thin-film deposition, two-dimensional material growth, semiconductor-material preparation and atmosphere-controlled laboratory process development.
PACKAGING: The equipment is prepared with protective inner materials and reinforced outer packaging for handling, storage and delivery.
IMPORTANT NOTICE: Please confirm tube size, heating-zone arrangement, gas-flow channels, vacuum pump package, RF source where applicable, power supply and required accessories before quotation.
LABORATORY PROCUREMENT SUPPORT
For model selection, configuration matching, power supply confirmation or quotation review, contact our technical sales team.
E-MAIL: inquiry@atomfair.com
Manufacturer: Atomfair LLC
Brand: ATOMFAIR®

What gas flow ranges are available for the Five-Zone High-Vacuum CVD System 1200°C and how do they affect thin-film deposition processes?

The system offers gas flow range options of 100 sccm, 200 sccm, and 500 sccm as stated in the standard-equipment manual. The selection should be matched to the specific CVD process, precursor delivery requirements, and desired film uniformity. These options allow flexibility for laboratory R&D workflows ranging from low-flow sensitive material growth to higher-throughput depositions.

What auxiliary components must be confirmed before purchasing the Five-Zone High-Vacuum CVD System 1200°C?

Before quotation, the tube size, heating-zone arrangement, gas-flow channels, vacuum pump package, RF source (where applicable), power supply, and required accessories must be confirmed. This ensures the system is correctly configured for the intended application, such as thin-film deposition or two-dimensional material growth, and avoids integration issues during installation.

The Five-Zone High-Vacuum CVD System (model CV-1200-1R) provides 1200 °C temperature capability with configurable gas flow ranges (100-500 sccm) for thin-film deposition and controlled-atmosphere growth, but requires buyer specification of tube size, heating-zone layout, vacuum pump package, and accessories before quotation.

Positive

  • 1200 °C temperature class: The system supports processing up to 1200 °C, enabling a wide range of CVD and thin-film deposition chemistries.
  • Multiple gas flow options: Gas flow ranges of 100, 200, and 500 sccm are available, allowing flexible precursor delivery for different process recipes.

Trade-offs

  • Configuration-dependent ordering: Tube size, heating-zone arrangement, vacuum pump package, RF source, and power supply must be confirmed before quotation, adding lead time and requiring detailed specification from the buyer.
  • Infrastructure and expertise needed: The system requires appropriate laboratory infrastructure (gas supply, vacuum, and possibly RF power) and technical expertise to configure correctly for intended processes.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).

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