Dual-Independent-Zone Sliding CVD System 1200 °C ATOMFAIR®

$5,000.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

1200 °C dual-independent-zone sliding CVD system for thin-film deposition, 100, 200 or 500 sccm gas flow, 2D material growth and research. Order now.

SKU: AF-CV-C-1200-4PZW-001M
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Dual-Independent-Zone Sliding CVD System, 1200 °C
CHEMICAL VAPOR DEPOSITION EQUIPMENT
Product Overview

Dual-Independent-Zone Sliding CVD System, 1200 °C is configured for chemical vapor deposition and controlled-atmosphere materials processing in laboratory R&D workflows.

The product identity is distinguished by its 1200 °C temperature class and process configuration.

Confirm the usable tube size, heating-zone layout, gas-flow range, vacuum package, RF power where applicable and power supply before quotation.

Technical Specifications
Parameter Specification / Available Values
Atomfair Model CV-1200-1M
Product Family CVD and related standard thermal-processing equipment
Temperature Class 1200 °C
Gas Flow Range 100 sccm, 200 sccm and 500 sccm options are shown in the updated standard-equipment manual.
Atmosphere/Vacuum Package Gas supply, vacuum and tube-furnace configuration should be confirmed by quotation.
Process Use CVD, thin-film preparation and controlled-atmosphere material growth.
Configuration Highlights
  • Latest standard-equipment brochure reviewed for CVD-family replacement and naming consistency.
  • The public product name keeps Atomfair branding and uses temperature, zone count or process role to distinguish similar CVD systems.
  • Factory model strings and supplier branding are kept out of public title and HTML.
APPLICATION SCOPE: Thin-film deposition, two-dimensional material growth, semiconductor-material preparation and atmosphere-controlled laboratory process development.
PACKAGING: The equipment is prepared with protective inner materials and reinforced outer packaging for handling, storage and delivery.
IMPORTANT NOTICE: Please confirm tube size, heating-zone arrangement, gas-flow channels, vacuum pump package, RF source where applicable, power supply and required accessories before quotation.
LABORATORY PROCUREMENT SUPPORT
For model selection, configuration matching, power supply confirmation or quotation review, contact our technical sales team.
E-MAIL: inquiry@atomfair.com
Manufacturer: Atomfair LLC
Brand: ATOMFAIR®

Does the dual-independent-zone sliding CVD system support both 100 sccm and 500 sccm gas flows without hardware modification?

Yes, the system offers selectable gas flow ranges of 100 sccm, 200 sccm, and 500 sccm as stated in the standard-equipment manual, but the exact configuration must be confirmed during quotation to ensure the mass flow controllers and gas channels match the intended process. Tube size, heating-zone layout, and vacuum package also require verification before ordering.

Can this 1200 °C CVD system be integrated with an existing laboratory vacuum pump package, or must the pump be ordered with the system?

The atmosphere and vacuum package configuration, including the vacuum pump, must be confirmed by quotation, meaning both integrated and customer-supplied pump options may be available but are not automatically supported without prior specification. The product description requires explicit confirmation of vacuum pump package and power supply before quotation.

What are the key configuration variables that must be specified before the dual-zone sliding CVD system can be quoted?

Before a quotation can be issued, the user must confirm the usable tube size, heating-zone arrangement, gas-flow channels, vacuum pump package, RF power where applicable, power supply, and required accessories. These variables directly affect system compatibility, performance, and delivery lead time.

The Dual-Independent-Zone Sliding CVD System provides a 1200°C temperature class with configurable gas flow up to 500 sccm for thin-film and controlled-atmosphere deposition. However, critical parameters such as tube size, heating-zone layout, and vacuum package must be specified by the buyer, adding procurement complexity.

Positive

  • 1200°C Temperature Class for CVD: The system is rated for 1200°C, enabling thermal decomposition and chemical vapor deposition of a wide range of precursor materials.
  • Multiple Gas Flow Range Options: Gas flow controllers available in 100, 200, and 500 sccm allow flexible process gas delivery for thin-film and 2D material growth.

Trade-offs

  • Configuration Requires Buyer Specification: Key parameters such as tube size, heating-zone arrangement, and vacuum pump package must be confirmed before quotation, requiring detailed user input.
  • Atmosphere/Vacuum Package Not Pre-Integrated: Gas supply, vacuum, and tube furnace configuration are not fixed and must be specified, adding procurement complexity.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).