Plasma-Assisted CVD System 1700 °C for Thin Films ATOMFAIR®

The system requires confirmation of tube size, heating-zone layout, gas-flow range, vacuum package, RF power, and power supply before quotation. Operational suitability depends on matching the configured gas-flow, vacuum, and RF capabilities to the intended deposition process.

• Pre-quotation configuration verification: Confirm the usable tube size, heating-zone layout, gas-flow range, vacuum package, RF power, and power supply with the supplier before ordering.
• Atmosphere and vacuum package dependency: The gas supply, vacuum, and tube-furnace configuration must be confirmed by quotation to ensure the system meets the required process conditions.
• Gas-flow range selection: Select the gas-flow range (100, 200, or 500 sccm) that matches the intended deposition or growth process, as specified in the standard-equipment manual.

This procedure outlines the steps to verify system configuration and prepare the CVD system for controlled-atmosphere processing. It ensures that all required components are confirmed and correctly set before operation.

Required Equipment: Standard-equipment manual, Quotation document

1. Verify system configuration
   Confirm the tube size, heating-zone layout, gas-flow range, vacuum package, RF power, and power supply with the supplier before proceeding.
2. Select gas-flow range
   Choose the gas-flow range (100, 200, or 500 sccm) that matches your intended deposition process from the standard-equipment manual.
3. Confirm atmosphere and vacuum package
   Verify that the gas supply, vacuum, and tube-furnace configuration are correctly specified in the quotation for your process requirements.
4. Prepare the system for operation
   Set up the system according to the confirmed configuration, ensuring all gas, vacuum, and power connections are properly established.

The Atomfair Plasma-Assisted CVD System (CV-1700-1W) offers a 1700°C temperature class and gas flow options up to 500 sccm for thin-film and 2D material growth, but requires configuration confirmation for tube size, vacuum, and RF source before deployment.

Positive

• High-temperature capability for CVD: The 1700°C temperature class enables chemical vapor deposition and controlled-atmosphere processing of refractory materials and advanced thin films.
• Adjustable gas flow range: Gas flow options of 100, 200, and 500 sccm provide flexibility for different deposition rates and precursor delivery requirements.

Trade-offs

• Custom configuration required: Tube size, heating-zone arrangement, gas-flow channels, vacuum pump package, RF source, and power supply must be confirmed before quotation, indicating the system is not a fully standardized turnkey solution.
• Unspecified vacuum and atmosphere package: The atmosphere/vacuum package is not pre-defined; gas supply, vacuum, and tube-furnace configuration must be specified by the buyer, adding engineering lead time and integration effort.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).