Deposition & Thin-Film Materials
All materials you need for CVD, ALD, Sputtering, Evaporation, Substrates
Showing 65–80 of 1311 results
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Atomfair High Purity 4N Bismuth Telluride Sputtering Target (Bi38Te62) – Bi2Te3 Alloy
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Atomfair High Purity 4N Copper (Cu) Block, 99.99% Pure, 10mm Diameter x 15mm Length
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Atomfair High Purity 4N Copper (Cu) Sputtering Target – 99.95% Pure
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Atomfair High Purity 4N Copper Plate (99.95% Cu) – 100x100x10mm
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Atomfair High Purity 4N Copper Sheet (99.97% Cu) – 10x10x1mm, Pack of 30
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Atomfair High Purity 4N Crystalline Zirconium (Zr) Sputtering Target
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Atomfair High Purity 4N Electrolytic Iron Flakes (99.98%, 3-20mm, Japan Imported)
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Atomfair High Purity 4N Gadolinium Gallium Oxide (Gd3Ga5O12) Sputtering Target
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Atomfair High Purity 4N Gadolinium-doped Ceria (Gd0.2Ce0.8O1.90) Sputtering Target
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Atomfair High Purity 4N Ge2Sb2Te5 (GST225) Sputtering Target for Phase Change Memory Applications
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Atomfair High Purity 4N Germanium Sulfide (GeS) Sputtering Target
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Atomfair High Purity 4N Germanium Telluride (GeTe) Sputtering Target
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Atomfair High Purity 4N Gold (Au) Sputtering Target for SEM – 99.99% Pure
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Atomfair High Purity 4N Gold-Germanium-Nickel Alloy (AuGeNi) Particles – 83.6/11.4/5 wt%
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Atomfair High Purity 4N Hafnium Oxide (HfO2) Sputtering Target
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Atomfair High Purity 4N Indium Antimony Telluride (In3SbTe2) Sputtering Target