Indium Tin Oxide Evaporation Pieces 99.99% 1-10 mm ATOMFAIR®

This material requires controlled storage in a dry, inert atmosphere to prevent moisture absorption and oxidation that can alter evaporation behavior. Deposition must be performed using a compatible crucible material (graphite, Al2O3, or BN) or e-beam hearth with liner to avoid chemical reaction or contamination at the 1,800°C melting point.

• Crucible Compatibility: Use only graphite, Al2O3, or BN crucibles or an e-beam hearth with compatible liner to prevent melt contamination or crucible degradation.
• Moisture Sensitivity: Store pieces in a sealed container under dry inert gas to avoid hydration that can cause spitting or outgassing during evaporation.
• Particle Size Constraint: The 1-10 mm piece size must be verified against source crucible geometry to ensure uniform loading and consistent evaporation rate.

This procedure describes loading ITO pieces into a compatible evaporation source and performing e-beam or thermal evaporation under vacuum. Proper source preparation and chamber conditions are critical to achieve uniform film stoichiometry.

Required Equipment: Graphite, Al2O3, or BN crucible or e-beam hearth with liner, Vacuum deposition chamber with e-beam or thermal evaporation source

1. Inspect Pieces
   Inspect the ITO pieces for any visible discoloration, moisture, or fines that could indicate contamination or degradation.
2. Load Crucible
   Load the pieces into a clean graphite, Al2O3, or BN crucible, ensuring even distribution and that piece size does not exceed crucible depth.
3. Set Chamber Vacuum
   Evacuate the deposition chamber to a base pressure below 1×10⁻⁵ Torr to minimize residual gas incorporation into the film.
4. Preheat Source
   Preheat the source gradually to outgas adsorbed moisture and organics before reaching the 1,800°C melting point.
5. Evaporate Material
   Apply power to the source to melt and evaporate the ITO at a controlled rate, monitoring deposition rate with a quartz crystal microbalance.

This Indium Tin Oxide (In2O3/SnO2 90/10wt%) evaporation material in pieces (1-10 mm, 99.99% purity) is evaluated for E-beam or thermal evaporation in vacuum thin-film deposition, with a high melting point of 1,800°C requiring compatible crucible hardware (Graphite/Al2O3/BN) and careful process matching.

Positive

• High purity for film quality: The 99.99% purity specification minimizes contamination in deposited films, supporting reproducible optical and electrical properties in transparent conductive oxide applications.
• Defined physical form for loading: The 1-10 mm piece size range facilitates consistent source loading and controlled evaporation rates in both E-beam and thermal evaporation systems.

Trade-offs

• High melting point requires robust hardware: With a melting point of 1,800°C, this material demands compatible crucible materials (Graphite, Al2O3, or BN) and e-beam hearth liners, increasing infrastructure and setup complexity.
• Process route must be confirmed by RFQ: Thermal evaporation requires RFQ confirmation, and deposition-source compatibility must be verified before ordering, adding a procurement step for lab planning.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).