ITO Indium Tin Oxide Powder 99.99% 18-65 nm ATOMFAIR®

Store the powder in a sealed container under dry, inert atmosphere to prevent moisture absorption and oxidation. Use only in vacuum deposition systems equipped with graphite, Al2O3, or BN crucibles or e-beam hearths with compatible liners.

• Moisture Sensitivity: Exposure to ambient humidity may cause agglomeration or degradation of the nanopowder, compromising evaporation uniformity.
• Crucible Compatibility: Select crucible or liner material (graphite, Al2O3, or BN) that withstands the 1,800 °C melting point without contamination.
• Evaporation Method Constraint: E-beam or thermal evaporation requires RFQ confirmation to match source geometry and power density to the powder form and particle size.

Load the powder into a compatible crucible or e-beam hearth under clean, low-humidity conditions. Evacuate the chamber to deposition vacuum before ramping to the melting point.

Required Equipment: Graphite, Al2O3, or BN crucible, E-beam evaporation system or thermal evaporation source

1. Inspect powder condition
   Inspect the powder for clumping or discoloration before opening the sealed container.
2. Transfer powder to crucible
   Transfer the required mass of powder into a clean graphite, Al2O3, or BN crucible using a dry, inert-atmosphere glovebox.
3. Load crucible into deposition source
   Load the filled crucible into the e-beam hearth or thermal evaporation source, ensuring secure contact for heat transfer.
4. Evacuate deposition chamber
   Evacuate the chamber to the required base pressure (typically below 1×10⁻⁵ Torr) before initiating heating.
5. Ramp temperature to melting point
   Ramp the source temperature gradually to 1,800 °C while monitoring chamber pressure for outgassing.
6. Deposit film to target thickness
   Deposit the film at a controlled rate until the target thickness is achieved, then allow the source to cool under vacuum.

Indium Tin Oxide (In2O3/SnO2 90/10wt%) evaporation material in powder form with 99.99% purity and 18-65 nm particle size is evaluated for vacuum thin-film deposition. The defined composition and nanoscale powder support controlled evaporation rates in E-beam or thermal processes, but the high melting point (1,800 °C) and specific crucible requirements (Graphite/Al2O3/BN) impose infrastructure and handling constraints for laboratory deployment.

Positive

• High-purity nanoscale powder: 99.99% purity and 18-65 nm particle size enable consistent evaporation behavior and film uniformity in vacuum deposition, reducing contamination risk for sensitive thin-film applications.
• Defined composition for process matching: Explicit In2O3/SnO2 90/10wt% formulation allows direct correlation with target film stoichiometry, simplifying procurement and deposition-process validation.

Trade-offs

• High melting point requires robust hardware: Melting point of 1,800 °C necessitates use of Graphite, Al2O3, or BN crucibles or e-beam hearths with compatible liners, adding infrastructure cost and limiting compatibility with standard thermal evaporation systems.
• Powder form requires careful handling: Nanoscale powder (18-65 nm) presents handling challenges including airborne dispersion, moisture sensitivity, and potential for agglomeration, requiring controlled environment and proper safety protocols during loading and storage.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).