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Silicon Nitride (Si3N4) Evaporation Material, Powder, 99.9%, 20-35 nm
Product Type: Compound Evaporation Material
Research-grade laboratory product
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LABORATORY PROCUREMENT SUPPORT
For material selection, deposition-source matching, pack-size confirmation or quotation support, contact our technical sales team.
INQUIRY: inquiry@atomfair.com
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Manufacturer: Atomfair LLC
Brand: ATOMFAIR®
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This material requires e-beam evaporation hardware with a compatible liner or high-temperature crucible. Process parameters must be matched to the material's melting point (1900°C) and Z-ratio for consistent film deposition.
- Hardware Compatibility: Confirm the evaporation source uses an e-beam hearth with a compatible liner or a high-temperature crucible suitable for silicon nitride.
- Process Route Matching: Match the deposition hardware and process route to the material's melting point and film requirements to avoid incomplete evaporation or contamination.
What evaporation method is recommended for this Si3N4 powder (20–35 nm, 99.9% purity) and what hardware is required?
E-beam evaporation using a hearth with compatible liner is the preferred method; thermal evaporation is feasible by RFQ. The material has a melting point of 1,900°C and density of 3.44 g/cm³, so high-temperature crucible options are available by RFQ. Buyers must confirm deposition source geometry and liner compatibility before ordering.
What is the Z-ratio of this Si3N4 evaporation material and how does it affect process monitoring?
The Z-ratio is 1.00, indicating that the acoustic impedance of Si3N4 matches that of quartz. This allows direct film thickness measurement using a quartz crystal microbalance without a tooling factor correction, simplifying calibration for E-beam evaporation.
What pack sizes and purity options are available for this Si3N4 powder, and what procurement checks are required?
Available pack sizes are 25g, 100g, 500g, and 1kg, with indicative prices ranging from USD 460 to USD 3600. The standard purity is 99.9%; RFQ-controlled grades are available. Buyers must confirm model, purity, form, size range, pack size, and deposition-source compatibility before quotation.
Silicon Nitride (Si3N4) evaporation material in powder form with 99.9% purity and 20-35 nm particle size is evaluated for E-beam evaporation deposition, requiring compatible hearth liners and high-temperature crucibles for thermal processing, with a melting point of 1,900°C and density of 3.44 g/cm³.
Positive
- High purity for consistent films: The 99.9% purity specification supports reproducible thin-film stoichiometry and minimizes contamination in vacuum deposition processes.
- Nanoscale particle size for loading: The 20-35 nm powder form facilitates uniform source loading and controlled evaporation rates in E-beam systems.
Trade-offs
- E-beam preferred, thermal limited: E-beam evaporation is preferred; thermal feasibility requires RFQ, indicating potential constraints for standard thermal evaporation setups.
- High melting point requires robust hardware: With a melting point of 1,900°C, compatible high-temperature crucibles and hearth liners are necessary, adding infrastructure requirements.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
