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Boron Oxide (B2O3) Evaporation Material, Pieces, 99.99%, 50 nm
Product Type: Compound Evaporation Material
Research-grade laboratory product
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LABORATORY PROCUREMENT SUPPORT
For material selection, deposition-source matching, pack-size confirmation or quotation support, contact our technical sales team.
INQUIRY: inquiry@atomfair.com
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Manufacturer: Atomfair LLC
Brand: ATOMFAIR®
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This material requires specific evaporation source hardware and process parameter matching. Deposition-source compatibility must be confirmed before use to ensure proper film formation.
- Evaporation Source Compatibility: Use an E-beam hearth with a graphite, Al2O3, or BN liner, or a W, Mo, or Ta boat for thermal evaporation.
- Evaporation Method Preference: E-beam evaporation is the preferred method; thermal evaporation is available by request for quotation.
- Melting Point Constraint: The melting point of approximately 450°C must be considered when setting deposition parameters and matching to source hardware.
- Density Consideration: The material density of 1.81 g/cm³ influences loading volume and deposition rate estimation.
- Pre-Order Compatibility Verification: Confirm model, purity, form, size range, pack size, and deposition-source compatibility before quotation.
What is the optimal evaporation method and liner material for depositing Boron Oxide (B2O3) pieces with 99.99% purity?
E-beam evaporation is preferred with good performance using a graphite, Al2O3, or BN liner in an E-beam hearth, or a W/Mo/Ta boat. The source also specifies molybdenum sheet hardware for the deposition source. Thermal evaporation is available by RFQ.
What are the implications of the 50 nm particle size and 99.99% purity for Boron Oxide (B2O3) evaporation material?
The 50 nm particle size ensures controlled loading and uniform evaporation, while the 99.99% purity minimizes contamination in thin films. The material's melting point of ~450°C and density of 1.81 g/cm³ are critical parameters for matching deposition source conditions.
What deposition source hardware is compatible with Boron Oxide (B2O3) pieces for vacuum thin-film deposition?
The product is compatible with E-beam hearths using graphite, Al2O3, or BN liners, or W/Mo/Ta boats. Additionally, molybdenum sheet hardware is specified for the deposition source. Buyers should confirm their source geometry before ordering.
Boron Oxide (B2O3) evaporation material in 50 nm pieces with 99.99% purity is suitable for E-beam deposition with good performance, but its low melting point (~450°C) and requirement for RFQ for thermal evaporation impose process constraints.
Positive
- High purity 99.99%: The 99.99% purity specification minimizes contamination in vacuum-deposited films, critical for optical or electronic applications.
- Good E-beam evaporation performance: Compatible with E-beam hearth using graphite, Al2O3, or BN liners, or W/Mo/Ta boats, offering flexibility in deposition hardware.
Trade-offs
- Low melting point ~450°C: The relatively low melting point may require careful thermal management to avoid uncontrolled evaporation or decomposition during E-beam or thermal processes.
- Thermal evaporation requires RFQ: Thermal evaporation is not a standard option; it must be requested via RFQ, which may delay procurement for labs needing that deposition method.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
