Ag Nanowire Dispersion 50 nm, 20 mg/mL, 500 mg ATOMFAIR®

$391.00

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Research-grade Ag nanowire dispersion for spin coating/spraying, 50 nm diameter, 20-50 μm length, 20 mg/mL in water/IPA, >99.5% purity, 500 mg. Order now.

Ag Nanowire-50nm (for spin coating and spraying) – diameter 50 nm; Length 20-50 um; Concentration 20 mg/mL; Solvent Water,IPA; Package 500 mg

Product Type: Nanowire dispersion material
Research-grade laboratory product

Product Overview

Ag Nanowire-50nm (for spin coating and spraying) is offered as nanowire dispersion material with listed specifications including 500 mg. The page identity is defined by the selected material form, measurable dimensions or concentration, and package size.

Use the listed diameter, length, concentration, solvent, appearance, purity, product code, or sample size values to confirm the exact material before procurement.

Performance Features

  • Product form is listed as nanowire dispersion material for quotation and material selection.
  • Length: 20-50 um.
  • Average diameter: 50 nm.
  • Concentration: 20 mg/mL.
  • Purity: >99.5%.
  • Solvent: Water,IPA.
  • Orderable package: 500 mg.

Technical Specifications

Parameter Specification / Available Values
Atomfair Model AF-AGNW-L2050umD50nm500MG
Package size 500 mg
Length 20-50 um
Average diameter 50 nm
Concentration 20 mg/mL
Purity >99.5%
Solvent Water,IPA
MATERIAL MATCHING: Confirm Ag Nanowire-50nm (for spin coating and spraying) as nanowire dispersion material with 50 nm and package 500 mg.
SPECIFICATION REVIEW: Review 20-50 um, 20 mg/mL, >99.5%, Water,IPA against the requested batch quantity before quotation.
QUOTATION NOTE: Include Atomfair model AF-AGNW-L2050umD50nm500MG, package 500 mg, and required quantity when requesting support.
LABORATORY PROCUREMENT SUPPORT
For material selection, specification review, package confirmation, and quotation support, contact our technical sales team.
E-MAIL: inquiry@atomfair.com
Manufacturer: Atomfair LLC
Brand: ATOMFAIR®

How does the solvent composition (Water/IPA) impact the drying kinetics and uniformity when spin coating Ag nanowires of 50 nm diameter and 20-50 um length?

The product is supplied in a water/IPA solvent mixture at 20 mg/mL concentration, specifically formulated for spin coating and spraying. The source does not provide comparative drying kinetics data. Users must optimize spin speed and acceleration based on the 50 nm diameter and 20-50 um length to achieve uniform coverage.

Can this Ag nanowire dispersion be integrated with standard photoresist processing for transparent conductive electrode fabrication?

The product is a research-grade nanowire dispersion material with >99.5% purity and water/IPA solvent. The description does not address compatibility with photoresist chemistries. Users should conduct compatibility tests, as the 50 nm diameter and 20-50 um length may affect subsequent lithography steps.

What infrastructure is required to handle and store this Ag nanowire dispersion to maintain its specified concentration and prevent settling?

The product is a dispersion at 20 mg/mL in water/IPA. The description does not specify storage or handling requirements. Standard lab infrastructure for handling nanoparticles in volatile solvents (fume hood, inert atmosphere for long-term storage) is recommended. For specific shelf life, contact the manufacturer.

This Ag nanowire dispersion (50 nm diameter, 20-50 µm length, 20 mg/mL in water/IPA, >99.5% purity) is optimized for spin coating and spraying applications, providing high aspect ratio suitable for transparent conductive films, but requires careful solvent handling and may need process optimization for uniform coating.

Positive

  • High aspect ratio nanowires: 50 nm diameter and 20-50 µm length provide aspect ratio >400, enabling efficient percolation networks at low loading for transparent conductive electrodes.
  • High purity >99.5%: Minimizes ionic contamination and resistive losses, critical for semiconductor and optoelectronic device integration.

Trade-offs

  • Mixed solvent volatility: Water/IPA mixture requires controlled drying conditions to avoid coffee-ring defects and ensure uniform film morphology during spin coating or spraying.
  • Fixed concentration constraint: 20 mg/mL concentration may necessitate multiple deposition passes or dilution for specific target sheet resistance, affecting process throughput.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).