Single-Zone Sliding PECVD System 1200°C PV-1200-20 ATOMFAIR®

$29,000.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

PV-1200-20 single-zone sliding PECVD system rated to 1200 °C, integrating vacuum, gas supply, RF source and automatic propulsion for R&D. Order now.

SKU: AF-PV-P-1200-K47K-0020
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Single-Zone Sliding PECVD System, 1200 °C
PLASMA-ENHANCED DEPOSITION EQUIPMENT
Product Overview

Single-Zone Sliding PECVD System, 1200 °C is configured for chemical vapor deposition and controlled-atmosphere materials processing in laboratory R&D workflows.

The product identity is distinguished by its 1200 °C temperature class and process configuration.

Confirm the usable tube size, heating-zone layout, gas-flow range, vacuum package, RF power where applicable and power supply before quotation.

Technical Specifications
Parameter Specification / Available Values
Atomfair Model PV-1200-20
Product Family Combined sliding PECVD system
Temperature Class 1200 °C
RF Source sliding heat-field configuration
Integrated Modules Vacuum unit, gas supply system, RF source, automatic propulsion and heating furnace configuration.
Control Interface Touch-screen integrated control is indicated for intelligent PECVD configurations.
Configuration Highlights
  • Latest PECVD brochure reviewed for row-level product identity.
  • PECVD configurations are distinguished by rotational, sliding, double-zone, three-zone, compact or preheating-assisted process layout.
  • RF source class and intelligent control notes are shown only as quotation-critical configuration points.
APPLICATION SCOPE: Thin-film deposition, two-dimensional material growth, semiconductor-material preparation and atmosphere-controlled laboratory process development.
PACKAGING: The equipment is prepared with protective inner materials and reinforced outer packaging for handling, storage and delivery.
IMPORTANT NOTICE: Please confirm tube size, heating-zone arrangement, gas-flow channels, vacuum pump package, RF source where applicable, power supply and required accessories before quotation.
LABORATORY PROCUREMENT SUPPORT
For model selection, configuration matching, power supply confirmation or quotation review, contact our technical sales team.
E-MAIL: inquiry@atomfair.com
Manufacturer: Atomfair LLC
Brand: ATOMFAIR®

This system operates at temperatures up to 1200°C and utilizes RF plasma, requiring thermal management and electromagnetic shielding. Proper ventilation, gas monitoring, and vacuum integrity are essential to prevent thermal hazards, gas leaks, and electrical risks.

  • Thermal Hazard: Surface temperatures exceed 1200°C; use appropriate personal protective equipment and thermal barriers.
  • RF Radiation: RF source emits electromagnetic radiation; ensure shielding and avoid exposure during operation.
  • Vacuum Integrity: Vacuum system requires proper sealing and leak testing before use.
  • Gas Handling: Process gases may be toxic or flammable; use gas detection and exhaust systems.
  • Electrical Safety: High-voltage components require qualified personnel and proper grounding.

What is the maximum operating temperature of the Atomfair PV-1200-20 single-zone sliding PECVD system?

The PV-1200-20 is rated for a 1200 °C temperature class and is configured for chemical vapor deposition and controlled-atmosphere materials processing in laboratory R&D workflows.

Which deposition applications does the PV-1200-20 support?

The system supports thin-film deposition, two-dimensional material growth, semiconductor-material preparation and atmosphere-controlled laboratory process development.

What configuration details must be confirmed before ordering the PV-1200-20?

Before quotation, the tube size, heating-zone arrangement, gas-flow channels, vacuum pump package, RF source where applicable, power supply and required accessories must be confirmed.

This single-zone sliding PECVD system integrates vacuum, gas, RF, and heating modules for 1200 °C operation, enabling thin-film deposition and 2D material growth. However, its single-zone heating and requirement for pre-quotation specification confirmation introduce operational constraints.

Positive

  • Integrated modular system design: Combines vacuum unit, gas supply system, RF source, automatic propulsion, and heating furnace in one sliding configuration, reducing lab footprint and integration complexity.
  • High-temperature 1200 °C capability: The 1200 °C temperature rating enables a wide range of CVD processes including those requiring elevated thermal budgets for thin-film and 2D material growth.

Trade-offs

  • Pre-quotation specification verification required: Multiple critical parameters including tube size, heating-zone layout, gas flow, vacuum package, and RF power must be confirmed before quotation, indicating that the system is not fully standardized.
  • Single-zone heating configuration: The single-zone sliding design may limit temperature uniformity for long substrates compared to multi-zone alternatives, affecting deposition consistency in certain applications.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).