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Sliding CVD System, 1600 °C, PECVD-Compatible
PLASMA-ENHANCED DEPOSITION EQUIPMENT
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LABORATORY PROCUREMENT SUPPORT
For model selection, configuration matching, power supply confirmation or quotation review, contact our technical sales team.
E-MAIL: inquiry@atomfair.com
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Manufacturer: Atomfair LLC
Brand: ATOMFAIR®
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The unit requires confirmation of tube size, heating-zone layout, gas-flow range, vacuum package, RF power, and power supply before operation. All configuration parameters must be verified through quotation to ensure compatibility with intended process conditions.
- Atmosphere and vacuum requirements: Gas supply, vacuum package, and tube-furnace configuration must be specified during procurement to support controlled-atmosphere material growth.
- Gas flow calibration constraint: The gas-flow range of 100, 200, or 500 sccm must be matched to the process recipe during system setup.
This procedure guides the user through pre-operation verification and configuration of the sliding CVD system. It assumes all infrastructure utilities (cooling water, exhaust, power) are already installed and compliant with local codes.
Required Equipment: Propane torch or tube furnace alignment fixture, Leak detection kit (helium or electronic leak detector), Process gas cylinders with appropriate regulators
- Confirm tube and heating-zone dimensions
Verify that the installed process tube matches the specified diameter and that the heating-zone layout corresponds to the intended sample size and deposition uniformity requirements. - Set gas-flow controllers to target range
Configure the mass flow controllers to the selected range (100, 200, or 500 sccm) and zero them against the calibrated standard before starting any gas flow. - Check vacuum package integrity
Evacuate the system to base pressure and perform a rate-of-rise test to confirm that the vacuum package (pump, valves, seals) meets the specified leak-tightness criteria. - Confirm RF power supply compatibility
Configure the RF power source to the required frequency and power level for PECVD operation, then verify reflected power is below 5% using a directional coupler. - Validate power supply ratings
Ensure the mains supply voltage and current ratings match the equipment nameplate and that a dedicated circuit breaker is installed.
What gas flow rate options are available on the Atomfair Sliding CVD System 1600°C and how do they influence thin-film deposition uniformity?
The system offers gas flow rate options of 100, 200, and 500 sccm as specified in the standard-equipment manual. The appropriate flow rate should be selected based on the desired deposition rate and film uniformity for the specific precursor chemistry and tube size, which must be confirmed during quotation.
Is the Sliding CVD System 1600°C compatible with plasma-enhanced chemical vapor deposition (PECVD) and what RF power configurations are supported?
Yes, the system is explicitly labeled as PECVD-compatible. RF power source configuration is available as a selectable option and must be confirmed before quotation along with the vacuum package and other process parameters.
What infrastructure requirements (power supply, vacuum, and gas connections) are needed to install the Atomfair Sliding CVD System 1600°C?
The system requires a confirmed power supply specification, a vacuum pump package, and gas supply connections. The exact tube size, heating-zone layout, and gas-flow channels must be determined during the quotation process to ensure proper installation and operation.
The Atomfair Sliding CVD System CV-1600-1T provides a 1600 °C temperature class suitable for high-temperature thin-film and 2D material growth, with PECVD compatibility for plasma-enhanced deposition. However, the system requires detailed specification of tube size, heating-zone layout, gas flow channels, vacuum pump package, RF source, and power supply before final quotation, necessitating close technical consultation.
Positive
- 1600 °C temperature class: This system achieves a maximum temperature of 1600 °C, enabling high-temperature chemical vapor deposition processes such as graphene growth and semiconductor material preparation.
- PECVD-compatible configuration: The system is designed for plasma-enhanced chemical vapor deposition, allowing lower-temperature thin-film deposition and improved control over film properties.
Trade-offs
- Pre-quotation subsystem confirmation: Tube size, heating-zone layout, gas flow channels, vacuum pump package, RF source, power supply, and required accessories must be confirmed before quotation, adding upfront engineering effort.
- RF source not included by default: The RF power source for PECVD operation is not part of the base configuration and must be specified and sourced separately, increasing system complexity.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
