Sliding CVD System Graphene Growth 1200 °C ATOMFAIR®

$5,000.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

Sliding CVD system for graphene growth supports 1200 °C processing, 100, 200, or 500 sccm gas-flow options, and controlled-atmosphere thin-film deposition.

Sliding CVD System for Graphene Growth, 1200 °C

CHEMICAL VAPOR DEPOSITION EQUIPMENT

Product Overview

Sliding CVD System for Graphene Growth, 1200 °C is configured for chemical vapor deposition and controlled-atmosphere materials processing in laboratory R&D workflows.

The product identity is distinguished by its 1200 °C temperature class and process configuration.

Confirm the usable tube size, heating-zone layout, gas-flow range, vacuum package, RF power where applicable and power supply before quotation.

Technical Specifications

Parameter	Specification / Available Values
Atomfair Model	CV-1200-1L
Product Family	CVD and related standard thermal-processing equipment
Temperature Class	1200 °C
Gas Flow Range	100 sccm, 200 sccm and 500 sccm options are shown in the updated standard-equipment manual.
Atmosphere/Vacuum Package	Gas supply, vacuum and tube-furnace configuration should be confirmed by quotation.
Process Use	CVD, thin-film preparation and controlled-atmosphere material growth.

Configuration Highlights

Latest standard-equipment brochure reviewed for CVD-family replacement and naming consistency.
The public product name keeps Atomfair branding and uses temperature, zone count or process role to distinguish similar CVD systems.
Factory model strings and supplier branding are kept out of public title and HTML.

APPLICATION SCOPE: Thin-film deposition, two-dimensional material growth, semiconductor-material preparation and atmosphere-controlled laboratory process development.

PACKAGING: The equipment is prepared with protective inner materials and reinforced outer packaging for handling, storage and delivery.

IMPORTANT NOTICE: Please confirm tube size, heating-zone arrangement, gas-flow channels, vacuum pump package, RF source where applicable, power supply and required accessories before quotation.

LABORATORY PROCUREMENT SUPPORT

For model selection, configuration matching, power supply confirmation or quotation review, contact our technical sales team.

E-MAIL: inquiry@atomfair.com

Manufacturer: Atomfair LLC

Brand: ATOMFAIR®

The system requires confirmation of tube size, heating-zone layout, gas-flow range, vacuum package, and power supply before use. Operational safety depends on verifying these parameters to prevent process failure or equipment damage.

Pre-Operation Configuration Verification: Confirm the usable tube size, heating-zone layout, gas-flow range, vacuum package, and power supply before initiating any process.
Atmosphere and Vacuum Integrity: Ensure the gas supply, vacuum, and tube-furnace configuration are correctly matched to the intended process to maintain controlled-atmosphere conditions.

HowTo

This procedure outlines the essential steps to configure and operate the CVD system for controlled-atmosphere materials processing. Follow these steps to ensure safe and reproducible thin-film deposition or material growth.

Required Equipment: CVD system with sliding furnace, Gas supply and flow controller, Vacuum pump package

Verify System Configuration
Confirm the tube size, heating-zone layout, gas-flow range, vacuum package, and power supply match the intended process requirements.
Set Up Gas and Vacuum Lines
Connect the gas supply and vacuum pump to the system, ensuring all fittings are sealed and leak-free.
Load Substrate and Close System
Place the substrate in the tube furnace and seal the system to establish a controlled atmosphere.
Purge and Establish Process Atmosphere
Purge the system with inert gas and evacuate to the desired vacuum level before introducing process gases.
Set Temperature and Gas Flow
Program the furnace to the target temperature and set the gas flow rates within the confirmed range.
Initiate Deposition Process
Start the deposition or growth process and monitor the temperature, pressure, and gas flow throughout the run.
Cool and Vent System
After the process, cool the furnace to a safe temperature and vent the system before removing the sample.

FAQ

What is the maximum operating temperature and gas flow range of the Atomfair Sliding CVD System for Graphene Growth, 1200 °C?

The system operates at a 1200 °C temperature class, suitable for graphene CVD and controlled-atmosphere processing. The gas flow range offers selectable options of 100 sccm, 200 sccm, and 500 sccm as specified in the updated standard-equipment manual. These parameters must be confirmed during quotation to match the intended deposition chemistry.

Does the Atomfair CV-1200-1L Sliding CVD System require a custom vacuum package and tube size configuration for graphene growth?

Yes, the atmosphere and vacuum package, along with the usable tube size and heating-zone layout, must be confirmed by quotation and are not pre-configured as a single standard option. The product listing explicitly notes that the gas supply, vacuum, and tube-furnace configuration require customer-specific matching before ordering to ensure proper thin-film and two-dimensional material growth results.

Assessment

The Sliding CVD System for Graphene Growth, 1200 °C provides a 1200°C maximum temperature suitable for chemical vapor deposition of thin films and two-dimensional materials, with user-selectable gas flow rates up to 500 sccm. However, critical system components such as tube size, heating-zone arrangement, and vacuum package are not standardized and must be confirmed with the supplier, adding a configuration step to procurement.

Positive

1200°C temperature class: The 1200 °C maximum operating temperature enables growth of graphene and other 2D materials requiring high-temperature CVD processing.
Adjustable gas flow options: Gas flow range options of 100, 200, or 500 sccm allow the system to be tailored for different precursor delivery rates and process chemistries.

Trade-offs

Custom configuration required: Tube size, heating-zone layout, and gas-flow channel details must be confirmed with the supplier before purchase, as no standard configuration is defined.
Vacuum package unspecified: The atmosphere/vacuum package is not included as a standard item; the buyer must confirm the vacuum pump and related infrastructure separately.

Quality Standards & Performance Verification

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Shipping & Returns

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).