Single-Zone Sliding CVD System 1200 °C CV-1200-1P ATOMFAIR®

$5,000.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

Single-zone sliding CVD system rated to 1200 °C for thin-film deposition, 2D material growth and controlled-atmosphere laboratory R&D. Model CV-1200-1P.

SKU: AF-CV-C-1200-IAKV-001P
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Single-Zone Sliding CVD System, 1200 °C
CHEMICAL VAPOR DEPOSITION EQUIPMENT
Product Overview

Single-Zone Sliding CVD System, 1200 °C is configured for chemical vapor deposition and controlled-atmosphere materials processing in laboratory R&D workflows.

The product identity is distinguished by its 1200 °C temperature class and process configuration.

Confirm the usable tube size, heating-zone layout, gas-flow range, vacuum package, RF power where applicable and power supply before quotation.

Technical Specifications
Parameter Specification / Available Values
Atomfair Model CV-1200-1P
Product Family CVD and related standard thermal-processing equipment
Temperature Class 1200 °C
Gas Flow Range 100 sccm, 200 sccm and 500 sccm options are shown in the updated standard-equipment manual.
Atmosphere/Vacuum Package Gas supply, vacuum and tube-furnace configuration should be confirmed by quotation.
Process Use CVD, thin-film preparation and controlled-atmosphere material growth.
Configuration Highlights
  • Latest standard-equipment brochure reviewed for CVD-family replacement and naming consistency.
  • The public product name keeps Atomfair branding and uses temperature, zone count or process role to distinguish similar CVD systems.
  • Factory model strings and supplier branding are kept out of public title and HTML.
APPLICATION SCOPE: Thin-film deposition, two-dimensional material growth, semiconductor-material preparation and atmosphere-controlled laboratory process development.
PACKAGING: The equipment is prepared with protective inner materials and reinforced outer packaging for handling, storage and delivery.
IMPORTANT NOTICE: Please confirm tube size, heating-zone arrangement, gas-flow channels, vacuum pump package, RF source where applicable, power supply and required accessories before quotation.
LABORATORY PROCUREMENT SUPPORT
For model selection, configuration matching, power supply confirmation or quotation review, contact our technical sales team.
E-MAIL: inquiry@atomfair.com
Manufacturer: Atomfair LLC
Brand: ATOMFAIR®

What gas flow ranges are available for the Atomfair CV-1200-1P single-zone sliding CVD system?

The CV-1200-1P offers gas flow range options of 100 sccm, 200 sccm, and 500 sccm as specified in the updated standard-equipment manual. These options allow flexibility for different CVD precursor delivery rates and process conditions.

Can the Atomfair CV-1200-1P be configured for vacuum-assisted CVD processes?

Yes, the system supports an atmosphere/vacuum package that is configurable for controlled-atmosphere processing. The exact vacuum pump package and tube-furnace configuration must be confirmed by quotation to match the required process pressure and gas handling.

What types of materials and processes are suitable for the Atomfair CV-1200-1P CVD system?

The system is designed for thin-film deposition, two-dimensional material growth, semiconductor-material preparation, and atmosphere-controlled laboratory process development. Its 1200 °C temperature class and gas flow options make it suitable for a range of CVD and controlled-atmosphere material synthesis applications.

Single-zone sliding CVD system rated for 1200°C, with selectable gas flow ranges (100–500 sccm) and configurable atmosphere/vacuum package, suitable for thin-film deposition and 2D material growth in R&D labs.

Positive

  • 1200°C temperature capability: The 1200°C temperature class enables processing of high-temperature materials such as semiconductors and two-dimensional materials, as specified in the application scope.
  • Configurable gas flow range: Gas flow options of 100, 200, and 500 sccm allow adjustment of precursor delivery rates for different CVD processes.

Trade-offs

  • Configuration dependency before quotation: Multiple parameters (tube size, heating zone, gas channels, vacuum pump, RF source, power supply) must be confirmed with the supplier before quotation, requiring detailed technical consultation.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).

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